Method for integrating microelectromechanical devices with electronic circuitry
First Claim
Patent Images
1. A method for integrating at least one microelectromechanical (MEM) device with electronic circuitry on a substrate comprising the steps of:
- (a) etching a cavity within the substrate extending below a device surface of the substrate;
(b) forming the MEM device within the cavity by depositing a plurality of material layers in the cavity and patterning at least one of the material layers, the MEM device being entirely below the device surface of the substrate;
(c) encapsulating the MEM device with at least one sacrificial material, and planarizing the substrate;
(d) fabricating electronic circuitry comprising a plurality of transistors on the device surface of the substrate, including forming electrical interconnections to the encapsulated MEM device; and
(e) removing the sacrificial material at least in part for releasing the MEM device for operation thereof.
1 Assignment
0 Petitions
Accused Products
Abstract
A method for integrating one or more microelectromechanical (MEM) devices with electronic circuitry. The method comprises the steps of forming each MEM device within a cavity below a device surface of the substrate; encapsulating the MEM device prior to forming electronic circuitry on the substrate; and releasing the MEM device for operation after fabrication of the electronic circuitry. Planarization of the encapsulated MEM device prior to formation of the electronic circuitry allows the use of standard processing steps for fabrication of the electronic circuitry.
197 Citations
34 Claims
-
1. A method for integrating at least one microelectromechanical (MEM) device with electronic circuitry on a substrate comprising the steps of:
-
(a) etching a cavity within the substrate extending below a device surface of the substrate; (b) forming the MEM device within the cavity by depositing a plurality of material layers in the cavity and patterning at least one of the material layers, the MEM device being entirely below the device surface of the substrate; (c) encapsulating the MEM device with at least one sacrificial material, and planarizing the substrate; (d) fabricating electronic circuitry comprising a plurality of transistors on the device surface of the substrate, including forming electrical interconnections to the encapsulated MEM device; and (e) removing the sacrificial material at least in part for releasing the MEM device for operation thereof. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
-
-
20. A method for integrating at least one microelectromechanical (MEM) device with electronic circuitry comprising the steps of:
-
(a) providing a substrate having a cavity extending below a device surface of the substrate; (b) forming the MEM device within the cavity by depositing a plurality of material layers in the cavity and patterning at least one of the material layers, the MEM device being entirely below the device surface of the substrate; (c) encapsulating the MEM device with sacrificial material and planarizing the substrate prior to fabricating electronic circuitry comprising a plurality of transistors on the device surface of the substrate, including forming electrical interconnections to the encapsulated MEM device; and (d) removing, at least in part, the sacrificial material and releasing the MEM device for operation thereof after fabricating the electronic circuitry. - View Dependent Claims (21, 22, 23, 24, 25, 26, 27, 28, 29)
-
-
30. A method for integrating at least one microelectromechanical (MEM) device with electronic circuitry on a substrate having an epitaxial layer thereon, comprising the steps of:
-
(a) etching a cavity below a device surface of the epitaxial layer on the substrate; (b) forming the MEM device within the cavity by depositing a plurality of material layers in the cavity and patterning at least one of the material layers, with the MEM device being entirely below the device surface of the epitaxial layer; (c) encapsulating the MEM device with sacrificial material and planarizing the substrate prior to fabricating electronic circuitry comprising a plurality of transistors on the epitaxial layer; and (d) removing, at least in part, the sacrificial material and releasing the MEM device for operation after fabricating the electronic circuitry. - View Dependent Claims (31, 32, 33, 34)
-
Specification