Vacuum plasma processor having coil with minimum magnetic field in its center

• US 5,800,619 A
• Filed: 06/10/1996
• Issued: 09/01/1998
• Est. Priority Date: 06/10/1996
• Status: Expired due to Term

• Current Assignee: Lam Research Corporation
• Original Assignee: Lam Research Corporation
• Inventors: Barnes, Michael S., Holland, John Patrick
• Primary Examiner(s): Niebling, John
• Assistant Examiner(s): CHANG, JONI YUK YING
• Application Number:
  US08/661,203
• Time in Patent Office: 813 Days
• Field of Search: 118/723 I, 118/723 IR, 118/723 E, 118/723 ER, 118/723 MP, 156/345, 156/643.1, 216/68
• US Class Current: 118/723.00I
• CPC Class Codes: H01J 37/321 the radio frequency energy being inductively coupled to the plasma

Abstract

A substantially planar coil of a vacuum plasma processor has plural turns for exciting gas in the processor to a plasma state in response to r.f. coil energization. The coil is located outside the processor and surrounded by a shield tending to cause magnetic flux coupled from peripheral portions of the coil to the gas to be less than magnetic flux coupled from interior portions of the coil to the gas. The coil is arranged so magnetic flux derived from a center portion of an area circumscribed by the coil is less than the magnetic flux derived from all other areas circumscribed by the coil. The magnetic flux is such that the density of the plasma in the processor on a processed substrate is relatively uniform even though the coil exhibits transmission line properties so there are substantial peak-to-peak current variations along the length of the coil.

Claims

1. A vacuum plasma processor for treating a workpiece in a vacuum chamber comprising a sealed window transparent to electromagnetic energy, a coil having plural arcuate turns for exciting gas in the processor to a plasma state in response to r.f. energization of the coil, the turns of the coil being arranged so the coil extends radially outward from an interior turn to an exterior turn, the coil being located outside the processor and positioned to couple energy to plasma in the chamber through the window, the coil being surrounded by a shield which tends to cause magnetic flux coupled from peripheral portions of the coil to the gas to be less than magnetic flux coupled from interior portions of the coil to the gas, the coil being arranged so magnetic flux derived from a center portion of an area circumscribed by the coil is less than the magnetic flux derived from all other areas circumscribed by the coil so plasma flux across the workpiece is substantially the same.

2. The vacuum plasma processor of claim 1 wherein the coil includes plural parallel windings driven in parallel by r.f. current from a source of the r.f. energization, each winding including plural arcuate portions on diametrically opposite sides of a center point of the area, each of the arcuate portions being removed from the area center point, the winding segments being arranged and connected to the r.f. source so instantaneous r.f. current flows in the same direction in spatially adjacent portions of the different parallel segments.

3. The vacuum plasma processor of claim 2 wherein a common terminal for connection of said windings to the source is in the center portion of the area.

4. The vacuum plasma processor of claim 2 wherein the parallel windings are surrounded by a further winding connected in series to the parallel windings so the sum of the currents flowing in the parallel windings flows in the further winding.

5. The vacuum plasma processor of claim 4 wherein there are first and second parallel windings each having a different spacing from the center point and an arcuate length of at least about one circumference and approximately diametrically opposed terminations.

6. The vacuum plasma processor of claim 2 wherein there are N parallel windings each having a different spacing from the center point and an arcuate length of at least about one circumference and terminations arcuately spaced from each other by about 360°

/N, where N is an integer greater than 1.

7. The vacuum plasma processor of claim 6 wherein each of the arcuate windings has approximately the same separation from the center point throughout its length.

8. The vacuum plasma processor of claim 6 wherein each of the windings includes an arcuate turn portion having an arcuate extent of about 360°

/N, each arcuate turn portion of each parallel winding having approximately the same separation from the center point throughout its length, the different arcuate turn portions of each parallel winding having a different separation from the common point.

9. The vacuum plasma processor of claim 8 wherein N=4.

10. The vacuum plasma processor of claim 1 wherein the coil includes (i) first and second terminals at opposite ends thereof coupled to opposite terminals of a source of the r.f. excitation and (ii) plural turns in proximity to the shield and removed from the center of the window.

11. The vacuum plasma processor of claim 10 wherein the plural turns have substantially circular patterns substantially concentric with the center of the window, each of the turns having first and second closely spaced ends, the first ends of a first and a second of the turns being respectively coupled to opposite terminals of the r.f. source, the second ends of the first and second turns being electrically connected together.

12. The vacuum plasma processor of claim 10 wherein the plural turns have substantially circular patterns substantially concentric with the center of the window, one of the turns being a peripheral turn, another of the turns being a turn interior to all other turns, each of the turns having first and second closely spaced ends, the first end of the peripheral turn being at the first terminal, the first end of the turn interior to all other turns being at the second terminal, the turns having remaining ends connected together so the turns are connected in series with each other as a result of the second end of the peripheral turn being connected to a terminal of an interior turn next to the peripheral turn and the second end of the turn interior to all other turns being connected to an end of the turn next to the turn interior to all other turns.

13. The vacuum plasma processor of claim 1 wherein the coil has sufficient length for the frequency of the r.f. excitation to have transmission line type effects so that at least one current maximum and minimum exist in the coil at different locations along the coil length, the coils being positioned and arranged so the magnetic fluxes from at least some pairs of adjacent turns are additive, and the different locations are adjacent each other.

14. The vacuum plasma processor of claim 13 wherein the coil is arranged to have a lower electromagnetic field coupling coefficient to the plasma at a region of maximum peak-to-peak current than at a region of minimum peak-to-peak current.

15. The vacuum plasma processor of claim 14 wherein the coil is arranged to have a lower self inductance at the region of maximum peak-to-peak current than at the region of minimum peak-to-peak current.

16. The vacuum plasma processor of claim 14 further including a sealed window transparent to electromagnetic energy, the coil being located outside the processor and positioned to couple energy to plasma in the chamber through the window, wherein the coil is arranged so it is farther from a plane of the window at the region of maximum current than at the region of minimum current.

17. The vacuum plasma processor of claim 16 wherein the coil is positioned in a plane tilted at an angle with respect to a place of the workpiece.

18. The vacuum plasma processor of claim 1 wherein the coil is an equilateral spiral having an interior terminal connected to one side of a source of the r.f. excitation and substantially spaced from a center point of the area circumscribed by the coil and an exterior terminal connected to a second side of the source.

19. The vacuum plasma processor of claim 1 wherein the coil includes plural substantially coaxial turns spaced by different radii from a common center point of the coil, the plural portions having adjacent ends lying along different radii from the common center point, the adjacent pairs of ends of the different turns being connected to each other by substantially straight leads that extend radially with respect to the common center point and circumferentially with respect to the substantially coaxial portions.

20. The vacuum plasma processor of claim 19 wherein each substantially coaxial portion has an extent of about 360°

.

21. The vacuum plasma processor of claim 19 wherein each substantially coaxial portion has an extent of about 360°

/N, where N is an integer greater than 1.

22. The vacuum plasma processor of claim 21 wherein N=4.

37. The vacuum plasma processor of claim 1 wherein the coil is substantially planar.

23. Apparatus for treating a workpiece with a plasma comprising a vacuum chamber in which the plasma is formed and the workpiece is adapted to be located, the vacuum chamber being at a pressure of at least 35 milliTorr while the workpiece is being treated, the chamber having a sealed window transparent to electromagnetic energy, a substantially planar coil positioned outside the chamber for coupling a magnetic field through the window, the coil being responsive to an r.f. source so an r.f. magnetic field is derived from the coil being excited by the r.f. source, the field being coupled through the window to excite the plasma, the coil being surrounded by a metal shield so some energy from the coil is coupled to the shield instead of being coupled through the window to excite the plasma and there is a tendency for a substantial decrease in energy from the coil as coupled to a peripheral region of the chamber approximately aligned with the shield relative to the energy coupled from the coil to a region of the chamber approximately aligned with the center of the window, the coil having a geometry and position relative to the plasma and workpiece to cause the plasma to have an approximately uniform density across a surface of the workpiece exposed to the plasma.

24. The apparatus of claim 23 wherein the coil includes at least one peripheral turn in proximity to the shield and at least one further turn inside the peripheral turn, the coil having a geometry such that magnetic flux derived from the center of the coil is substantially less than magnetic flux derived from peripheral portions of the coil.

25. A vacuum plasma processor for treating a workpiece in a vacuum chamber comprising a coil having plural arcuate turns for exciting gas in the processor to a plasma state in response to r.f. energization of the coil, the turns of the coil being arranged so the coil extends radially outward from an interior turn to an exterior turn, the coil including plural electrically parallel windings driven in parallel by r.f. current from a source of the r.f. energization, each winding including plural arcuate portions on diametrically opposite sides of a center point of the area, each of the arcuate portions being removed from the area center point, the windings being arranged and connected to the r.f. source so instantaneous r.f. current flows in the same direction in spatially adjacent portions of the different parallel windings.

26. The vacuum plasma processor of claim 25 wherein a common terminal for connection of said windings to the source is in a center portion of the area.

27. The vacuum plasma processor of claim 25 wherein the parallel windings are surrounded by a further winding connected in series to the parallel windings so the sum of the currents flowing in the parallel windings flows in the further winding.

28. The vacuum plasma processor of claim 27 wherein there are first and second parallel windings each having a different spacing from the center point and an arcuate length of at least about one circumference and approximately diametrically opposed terminations.

29. The vacuum plasma processor of claim 26 wherein there are N parallel windings each having a different spacing from the center point and an arcuate length of at least about one circumference and terminations arcuately spaced from each other by about 360°

/N, where N is an integer greater than 1.

30. The vacuum plasma processor of claim 25 wherein there are N parallel windings each having a different spacing from the center point and an arcuate length of at least about one circumference and terminations arcuately spaced from each other by about 360°

/N, where N is an integer greater than 1.

31. The vacuum plasma processor of claim 29 wherein each of the arcuate portions has an arcuate extent of about 360°

/N, each arcuate portion of each parallel segment having approximately the same separation from the center point throughout its length, the different arcuate portion of each parallel segment having a different separation from the common point.

32. The vacuum plasma processor of claim 31 wherein N=4.

38. The vacuum plasma processor of claim 25 wherein the coil is substantially planar.

33. A vacuum plasma processor for treating a workpiece in a vacuum chamber comprising a coil having plural turns for exciting gas in the processor to a plasma state in response to r.f. energization of the coil, the turns of the coil being arranged so the coil extends radially outward from an interior turn to an exterior turn, the coil having sufficient length for the frequency of the r.f. excitation to have transmission line type effects so that at least one current maximum and minimum exist in the coil at different locations along the coil length, the coil being positioned and arranged so the magnetic fluxes from at least some pairs of adjacent turns are additive and the different locations are adjacent each other, the coil being arranged to have a lower electromagnetic field coupling coefficient to the plasma at a region of maximum peak-to-peak current than at a region of minimum peak-to-peak current.

34. The vacuum plasma processor of claim 33 wherein the coil is arranged to have a lower self inductance at the region of maximum peak-to-peak current than at the region of minimum peak-to-peak current.

35. The vacuum plasma processor of claim 33 further including a sealed window transparent to electromagnetic energy, the coil being located outside the processor and positioned to couple energy to plasma in the chamber through the window, wherein the coil is arranged so it is farther from a plane of the window at the region of maximum current than at the region of minimum current.

36. The vacuum plasma processor of claim 35 wherein the coil is positioned in a plane tilted at an angle with respect to the plane of the window.

39. The vacuum plasma processor of claim 33 wherein the coil is substantially planar.

40. A vacuum plasma processor for treating a workpiece in a vacuum chamber comprising a coil having plural arcuate turns for exciting gas in the processor to a plasma state in response to r.f. energization of the coil, the turns of the coil being arranged so the coil extends radially outward from an interior turn to an exterior turn, the coil including plural electrically parallel windings driven in parallel by r.f. current from a source of the r.f. energization, each winding including plural arcuate portions on diametrically opposite sides of a center point of the area, each of the arcuate portions being removed from the area center point, the windings being arranged and connected to the r.f. source so the parallel windings are surrounded by a further winding connected in series to the parallel windings so the sum of the currents flowing in the parallel windings flows in the further winding.

41. A vacuum plasma processor for treating a workpiece in a vacuum chamber comprising a coil having plural substantially coaxial turns spaced by different radii from a common center part of the coil, reactively coupled to the gas for exciting gas in the processor to a plasma state in response to r.f. energization of the coil, the turns of the coil being arranged so the coil extends radially outward from an interior turn to an exterior turn, the plural portions having adjacent ends lying along different radii from the common center point, characterized by each pair of the adjacent ends of the different turns being connected to each other by a substantially straight lead that extends radially with respect to the common center point and circumferentially with respect to the substantially coaxial turns.