Plasma source for HDP-CVD chamber

• US 5,800,621 A
• Filed: 02/10/1997
• Issued: 09/01/1998
• Est. Priority Date: 02/10/1997
• Status: Expired due to Term

• Current Assignee: Public Patent
• Original Assignee: Applied Materials Incorporated
• Inventors: Redeker, Fred C., Ishikawa, Tetsuya
• Primary Examiner(s): Breneman, R. Bruce
• Assistant Examiner(s): ALEJANDRO MULERO, LUZ L
• Application Number:
  US08/795,169
• Time in Patent Office: 568 Days
• Field of Search: 118/723 R, 118/723 I, 118/723 IR, 118/723 AN, 156/345, 204/298.31, 204/298.34, 204/298.06, 315/111.21, 315/111.51, 315/111.71
• US Class Current: 118/723.0AN
• CPC Class Codes: H01J 37/321 the radio frequency energy being inductively coupled to the plasma
• CPC Class Codes: H05H 1/46 using applied electromagnetic fields, e.g. high frequency or microwave energy H05H1/26 takes precedence
• CPC Class Codes: H05H 1/4652 using inductive coupling means, e.g. coils

Abstract

A plasma system is disclosed for processing a substrate and includes a chamber body defining a plasma cavity therein and having a centrally located gas inlet, and a top antenna configured in position relative to the plasma cavity to produce a center-peaked plasma density profile above the substrate during operation. The top antenna has a central passage which surrounds the centrally located gas inlet. A side antenna is preferably configured and positioned relative to the plasma chamber to produce a hollow-center plasma density profile above the substrate during operation. Together, the top and side antennas and the centrally located gas inlet provide a uniform plasma directly over the surface of the substrate to be processed.

Claims

1. A chamber for processing a substrate, comprising:

a) a chamber body comprising a top and sidewalls defining a plasma cavity and a gas inlet centrally located in the top of the chamber; and

b) a top antenna mounted in the top of the chamber body, the top antenna comprising a central coil turn defining a central passage in the top antenna, an outer coil turn concentrically aligned with the central coil turn, and a plurality of inductors extending between the central coil turn and the outer coil turn.

2. The chamber of claim 1, wherein the gas inlet passes through the central passage in the top antenna.

3. The chamber of claim 1, wherein the inductors extend in a radial path between the central coil turn and the outer coil turn.

4. The chamber of claim 1, wherein the inductors extend in an arcuate path between the central coil turn and the outer coil turn.

5. The chamber of claim 1, further comprising:

c) a side antenna configured and positioned relative to the plasma cavity to produce a hollow-center plasma density profile above a substrate during operation.

6. The chamber of claim 5, further comprising:

d) an RF power generator; and

e) an RF power splitter connected to the RF generator.

7. A chamber for processing a substrate, comprising:

a) a chamber body comprising a top and sidewalls defining a plasma cavity and, a gas inlet centrally located in the top of the chamber;

b) a top antenna mounted in the top of the chamber body, the top antenna comprising a central coil turn defining a central passage in the top antenna, an outer coil turn concentrically aligned with the central coil turn, and a plurality of inductors extending between the central coil turn and the outer coil turn;

c) a side antenna configured and positioned relative to the plasma cavity to produce a hollow-center plasma density profile above a substrate during operation;

d) an RF power generator; and

e) an RF power splitter connecting the RF generator to the top and the side antennas.

8. The chamber of claim 7, wherein the inductors extend in a radial path between the central coil turn and the outer coil turn.

9. The chamber of claim 7, wherein the inductors extend in an arcuate path between the central coil turn and the outer coil turn.