Electrostatic chuck having a unidirectionally conducting coupler layer

• US 5,801,915 A
• Filed: 03/28/1997
• Issued: 09/01/1998
• Est. Priority Date: 01/31/1994
• Status: Expired due to Term

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Kholodenko, Arnold, Shamouilian, Shamouil, Veytser, Alexander M.
• Primary Examiner(s): FLEMING, FRITZ M
• Application Number:
  US08/829,711
• Time in Patent Office: 522 Days
• Field of Search: 361/230, 361/233, 361/234, 361/235, 279/128
• US Class Current: 361/234
• CPC Class Codes: C23C 16/45521 the gas, other than thermal contact gas, being introduced the rear of the substrate to flow around its periphery
• CPC Class Codes: C23C 16/4586 Elements in the interior of the support, e.g. electrodes, heating or cooling devices
• CPC Class Codes: H01L 21/6831 using electrostatic chucks
• CPC Class Codes: H01L 21/6833 Details of electrostatic chucks
• CPC Class Codes: H02N 13/00 Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect
• CPC Class Codes: Y10T 279/23 with magnetic or electrostatic means

Abstract

An electrostatic chuck (20) for holding a substrate (45) in a process chamber (80) having a voltage supply terminal (65) for charging the chuck (20). The chuck includes an electrostatic member (25) comprising at least one electrode (30), an electrically insulated holding surface (40) for holding a substrate (45) thereon, and an electrical contact surface (48) for providing charge to the electrode. A unidirectionally conducting coupler layer (70) electrically couples the contact surface (48) of the electrostatic member to the voltage supply terminal to conduct charge substantially only in a single direction from the terminal to the contact surface. Preferably, an electrical connector (50) having a junction surface (55) bonded to the contact surface (55) of the electrode, and a terminal surface (60) for electrically contacting the voltage supply terminal (65), is used to electrically couple the unidirectionally conducting coupler layer (70) to the voltage supply terminal (65).

Claims

1. An electrostatic chuck for holding a substrate in a process chamber having a voltage supply terminal for charging the chuck, the electrostatic chuck comprising:

(a) an electrostatic member including (i) an electrode, (ii) an electrically insulated holding surface, and (iii) an electrical contact surface for conducting charge to the electrode; and

(b) a unidirectionally conducting coupling layer bonded to the contact surface to conduct a charge in substantially only a single direction from the voltage supply terminal to the contact surface to charge the electrode.

2. The electrostatic chuck of claim 1, wherein the unidirectionally conducting coupler layer comprises an anisotropic conducting layer having a primary conduction axis substantially orthogonal to the contact surface of the electrode.

3. The electrostatic chuck of claim 2, wherein the unidirectionally conducting coupler layer comprises a first conductivity of at least about 0.1 milliohm in the direction substantially perpendicular to the contact surface of the electrode, and a second conductivity of at least about 1×

10⁸ milliohm in the plane parallel to the contact surface of the electrode.

4. The electrostatic chuck of claim 1, wherein the unidirectionally conducting coupler layer comprises a current carrying capacity of at least about 25 amps.

5. The electrostatic chuck of claim 1, further comprising a connector having (i) a junction surface bonded to the unidirectionally conducting coupler layer, and (ii) a terminal surface for electrically coupling to the voltage supply terminal in the process chamber.

6. The electrostatic chuck of claim 5, wherein the unidirectionally conducting coupler layer comprises adhesive for bonding the contact surface of the electrode to the junction surface of the connector.

7. The electrostatic chuck of claim 5, further comprising a base for supporting the electrostatic member, the base having an opening for the connector to extend therethrough.

8. The electrostatic chuck of claim 1, wherein the electrostatic member comprises a plurality of electrodes each having at least one contact surface.

9. A method of fabricating an electrostatic chuck for holding a substrate in a process chamber having a voltage supply terminal for charging the chuck, the method comprising the steps of:

(a) forming an electrode having an electrically insulated holding surface and an electrical contact surface; and

(b) bonding a unidirectionally conducting coupler layer to the contact surface to conduct a charge in substantially only a single direction from the voltage supply terminal to the contact surface to charge the electrode.

10. The method of claim 9, wherein in step (b) comprises applying an anisotropic conducting layer to the contact surface of the electrode, the anisotropic conducting layer having a primary conduction axis substantially orthogonal to the contact surface of the electrode.

11. The method of claim 9, wherein in step (b) the unidirectionally conducting coupler layer comprises a first conductivity of at least about 0.1 milliohm in the direction substantially orthogonal to the contact surface of the electrode, and a second conductivity of at least about 1×

10⁸ milliohm parallel to the plane of the contact surface.

12. The method of claim 9, wherein step (b) includes the step of bonding a junction surface of a connector to the contact surface of the electrode.

13. The method of claim 9 wherein step (b) comprises the steps of:

(i) applying a layer of unidirectional-conducting material on the contact surface of the electrode;

(ii) positioning a junction surface of a connector on the unidirectional-conducting layer; and

(iii) applying a pressure on the unidirectional-conducting material and heating the material to a temperature sufficiently high to bond the unidirectional-conducting material to both the contact surface of the electrode and the junction surface of the connector.

14. The method of claim 9, wherein step (a) comprises the steps of (i) forming a laminate insulator having an electrode embedded therein, and (ii) stripping off a portion of the laminate insulator to expose a portion of the electrode to form the contact surface.