Long-wavelength infra-red vertical cavity surface-emitting laser on a gallium arsenide substrate

• US 5,805,624 A
• Filed: 07/30/1996
• Issued: 09/08/1998
• Est. Priority Date: 07/30/1996
• Status: Expired due to Term

• Current Assignee: Avago Technologies General IP PTE Limited (Broadcom, Inc.)
• Original Assignee: Hewlett-Packard Company (HP Inc.)
• Inventors: Yang, Long, Mars, Danny E.
• Primary Examiner(s): Bovernick, Rodney B.
• Assistant Examiner(s): Leung, Quyen Phan
• Application Number:
  US08/688,338
• Time in Patent Office: 770 Days
• Field of Search: 372/45, 372/46, 372/92, 372/96, 372/50, 372/4, 372/99, 257/13, 257/97, 257/98, 257/103, 257/201
• US Class Current: 372/45.01
• CPC Class Codes: B82Y 20/00 Nanooptics, e.g. quantum optics or photonic crystals
• CPC Class Codes: H01S 2302/00 Amplification / lasing wavelength
• CPC Class Codes: H01S 5/18308 having a special structure for lateral current or light confinement
• CPC Class Codes: H01S 5/2063 obtained by particle bombardment
• CPC Class Codes: H01S 5/3095 Tunnel junction
• CPC Class Codes: H01S 5/32366 (In)GaAs with small amount of N
• CPC Class Codes: H01S 5/34306 emitting light at a wavelength longer than 1000nm, e.g. InP based 1300 and 1500nm lasers

Abstract

A vertical cavity surface emitting laser (VCSEL) that generates light having a desired wavelength, greater than one micron. The laser comprises a substrate, a lower mirror region, an active region and an upper mirror region. The substrate consists essentially of GaAs. The lower mirror region is adjacent the substrate and is lattice matched to the substrate. The active region is sandwiched between the upper and lower mirror regions, and includes a central quantum well region and a gallium arsenide layer sandwiched between the quantum well region and each of the lower mirror region and the upper mirror region. The central quantum well region includes a quantum well layer consisting essentially of GaN_x As.sub.(1-x). The GaN_x As.sub.(1-x) of the quantum well layer has a lattice constant and a band gap dependent on x. The value of x sets the bandgap of the GaN_x As.sub.(1-x) of the quantum well layer to a value corresponding to light generation at the desired wavelength, greater than one micron. Each gallium arsenide layer is a layer of a material consisting essentially of GaAs or AlGaAs, and is lattice matched to the substrate. The quantum well layer may additionally include a fraction of indium to lattice match the quantum well layer to the substrate.

Claims

1. A vertical cavity surface emitting laser (VCSEL), comprising:

a substrate consisting essentially of GaAs;

a lower mirror region adjacent the substrate and lattice matched thereto;

an upper mirror region; and

an active region sandwiched between the upper and lower mirror regions, the active region including;

a central quantum well region including a quantum well layer consisting essentially of GaN_x As.sub.(1-x), the GaN_x As.sub.(1-x) of the quantum well layer having a lattice constant and a band gap dependent on x, x having a value of approximately 0.04 that sets the bandgap of the GaN_x As.sub.(1-x) of the quantum well layer to a value corresponding to light generation at a wavelength of 1.55 microns, and

a gallium arsenide layer sandwiched between the quantum well region and each of the lower mirror region and the upper mirror region, each gallium arsenide layer being a layer of a material consisting essentially of one of GaAs and AlGaAs, having a lattice constant, and being lattice matched to the substrate.

2. The VCSEL of claim 1, in which:

the GaN_x As.sub.(1-x) of the quantum well layer has a critical thickness dependent on the value of x; and

the quantum well layer has a thickness of less than the critical thickness.

3. A vertical cavity surface emitting laser (VCSEL), comprising:

a substrate consisting essentially of GaAs;

a lower mirror region adjacent the substrate and lattice matched thereto;

an upper mirror region;

an active region sandwiched between the upper and lower mirror regions, the active region including;

a central quantum well region including a quantum well layer of a Group III-V semiconductor material that comprises a fraction y of a first Group III element, a second Group III element, a fraction x of nitrogen and a fraction (1-x) of arsenic, in which y>

0, the semiconductor material of the quantum well layer having a lattice constant and a band gap dependent on x and y, and

a gallium arsenide layer sandwiched between the quantum well region and each of the lower mirror region and the upper mirror region, each gallium arsenide layer being a layer of a material consisting essentially of one of GaAs and AlGaAs, having a lattice constant, and being lattice matched to the substrate;

in which

x and y have values that set the lattice constant of the semiconductor material of the quantum well layer to match the lattice constant of the material of the gallium arsenide layers, and set the bandgap of the semiconductor material of the quantum well layer to a value corresponding to light generation at a wavelength of greater than one micron.

4. The VCSEL of claim 3, in which:

the semiconductor material of the quantum well layer additionally comprises a fraction z of a third Group III element, in which y>

0 and z>

0, the semiconductor material of the quantum well layer having a lattice constant and a band gap dependent on x, y and z; and

x, y and z have values that set the lattice constant of the semiconductor material of the quantum well layer to match the lattice constant of the material of the gallium arsenide layers, and set the bandgap of the semiconductor material of the quantum well layer to a value corresponding to light generation at a wavelength greater than one micron.

5. The VCSEL of claim 8, in which:

the first Group III element is indium;

the second Group III element is gallium; and

the third Group III element is aluminum.

6. The VCSEL of claim 3, in which:

the first Group III element is indium; and

the second Group III element is gallium.

7. The VCSEL of claim 3, in which:

the first Group III element is aluminum; and

the second Group element is gallium.

8. The VCSEL of claim 3, in which:

the first Group III element is indium; and

the second Group III element is aluminum.

9. A vertical cavity surface emitting laser (VCSEL), comprising:

a substrate consisting essentially of GaAs;

a lower mirror region adjacent the substrate and lattice matched thereto;

an upper mirror region; and

an active region sandwiched between the upper and lower mirror regions, the active region including;

a central quantum well region including a quantum well layer consisting essentially of InN_x As.sub.(1-x), the InN_x As.sub.(1-x) of the quantum well layer having a lattice constant and a band gap dependent on x, and

a gallium arsenide layer sandwiched between the quantum well region and each of the lower mirror region and the upper mirror region, each gallium arsenide layer being a layer of a material consisting essentially of one of GaAs and AlGaAs, having a lattice constant, and being lattice matched to the substrate;

in which

x has a value that sets the lattice constant of the InN_x As.sub.(1-x) of the quantum well layer to match the lattice constant of the material of the gallium arsenide layers and that sets the bandgap of the InN_x As.sub.(1-x) of the quantum well layer to a value corresponding to light generation at a wavelength of greater than one micron.

10. A vertical cavity surface emitting laser (VCSEL), comprising:

a substrate consisting essentially of GaAs;

a lower mirror region adjacent the substrate and lattice matched thereto;

an upper mirror region; and

an active region sandwiched between the upper and lower mirror regions, the active region including;

a central quantum well region including a quantum well layer consisting essentially of Ga.sub.(1-y) In_y N_x As.sub.(1-x), the Ga.sub.(1-y) In_y N_x As.sub.(1-x) of the quantum well layer having a lattice constant and a band gap dependent on x and y;

x and y having values that set the lattice constant of the Ga.sub.(1-y) In_y N_x As.sub.(1-x) of the quantum well layer to match the lattice constant of the substrate, and set the bandgap of the Ga.sub.(1-y) In_y N_x As.sub.(1-x) of the quantum well layer to a value corresponding to light generation at a wavelength in the range of 1.1 to 1.6 micron, x having a value in the range 0.01≦

x≦

0.1, and

a gallium arsenide layer sandwiched between the quantum well region and each of the lower mirror region and the upper mirror region, each gallium arsenide layer being a layer of a material consisting essentially of one of GaAs and AlGaAs, having a lattice constant, and being lattice matched to the substrate.

11. The VCSEL of claim 10, in which:

the desired wavelength is 1.3 μ

m; and

the value of x is about 0.03.

12. The VCSEL of claim 10, in which:

the desired wavelength is 1.55 μ

m; and

the value of x is about 0.04.