Method and apparatus for cryogenically cooling a deposition chamber
First Claim
1. A method of depositing a gas onto a surface of a substrate, the substrate being disposed within an interior of a deposition chamber, the method comprising the steps of:
- (a) introducing a cryogenic fluid into the interior of the deposition chamber to cool the surface of the substrate; and
(b) introducing the gas into the interior of the chamber to deposit the gas onto the surface of the substrate.
3 Assignments
0 Petitions
Accused Products
Abstract
A method and apparatus for depositing parylene monomer within the interior of a deposition chamber of a parylene deposition system. In certain embodiments, the method comprises the steps of: (a) introducing a cryogenic fluid into the interior of the deposition chamber to cool the surface of the substrate; and (b) introducing the parylene monomer into the interior of the chamber to deposit the parylene monomer onto the surface of the substrate. In some embodiments, the apparatus comprises: a deposition chamber; a pumping system, a source of cryogenic fluid, a gas source and at least one support mount disposed within the interior of the deposition chamber. The pumping system reduces the pressure of the interior of the deposition chamber, and the pumping system is in fluid communication with the interior of the deposition chamber. The source of cryogenic fluid is in fluid communication with the interior of the deposition chamber. The gas source is in fluid communication with the interior of the deposition chamber. Optionally, the method or apparatus may include the use of a load lock chamber.
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Citations
53 Claims
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1. A method of depositing a gas onto a surface of a substrate, the substrate being disposed within an interior of a deposition chamber, the method comprising the steps of:
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(a) introducing a cryogenic fluid into the interior of the deposition chamber to cool the surface of the substrate; and (b) introducing the gas into the interior of the chamber to deposit the gas onto the surface of the substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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16. A method of depositing parylene monomer within an interior of a deposition chamber of a parylene deposition system, the method comprising the steps of:
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(a) introducing a cryogenic fluid into the interior of the deposition chamber so that the cryogenic fluid cools at least a surface of a substrate disposed within the interior of the deposition chamber to a reduced temperature; (b) heating walls of the interior of the deposition chamber to a temperature greater than the reduced temperature of the surface of the substrate; and (c) introducing the parylene monomer into the interior of the deposition chamber so that the parylene monomer preferentially deposits onto the surface of the substrate. - View Dependent Claims (17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27)
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28. An apparatus for depositing a gas, comprising:
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a deposition chamber having an interior and an exterior; a pumping system for reducing a pressure of the interior of the deposition chamber, the pumping system being in fluid communication with the interior of the deposition chamber; a support mount for a substrate, the support mount being disposed within the interior of the deposition chamber; a source of cryogenic fluid in fluid communication with the interior of the deposition chamber; and a gas source in fluid communication with the interior of the deposition chamber. - View Dependent Claims (29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39)
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40. An apparatus for depositing parylene monomer, comprising
a first deposition chamber having an interior and an exterior; -
a vacuum pump in fluid communication for reducing a pressure of the interior of the first deposition chamber, the vacuum pump being in fluid communication with the interior of the first deposition chamber; a support mount for mounting a substrate, the support being disposed within the interior of the first deposition chamber; a source of a cryogenic fluid in fluid communication with the interior of the first deposition chamber; and a source of parylene monomer in fluid communication with the interior of the deposition chamber. - View Dependent Claims (41, 42, 43, 44, 45, 46, 47, 48, 49)
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50. A method of depositing a gas onto a surface of a substrate, the substrate being disposed within an interior of a deposition chamber, the method comprising the steps of:
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(a) cooling the surface of the substrate without clamping the substrate to a support; and (b) introducing the gas into the interior of the chamber to deposit the gas onto the surface of the substrate.
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51. A method of depositing a gas onto a surface of a substrate, the substrate being disposed within an interior a load lock chamber, the method comprising the steps of:
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(a) introducing a cryogenic fluid into the interior of the load lock chamber to cool the surface of the substrate to form a cooled substrate; (b) transferring the cooled substrate to an interior of a deposition chamber; and (c) introducing the gas into the interior of the deposition chamber to deposit the gas onto the surface of the substrate. - View Dependent Claims (52, 53)
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Specification