Reduced residue hard surface cleaner
First Claim
1. An aqueous, all temperature hard surface cleaner with significantly improved residue removal and substantially reduced filming/streaking, said cleaner consisting essentially of:
- (a) about 1-50% of at least one water soluble or water-miscible organic solvent with a vapor pressure of at least 0.001 mm Hg at 25°
C., and mixtures of such solvents;
(b) about 0.001-10% of at least one semi-polar nonionic surfactant, said surfactant having the structure;
##STR9## wherein R1 is C5-20 alkyl, R2 and R3 are both C1-4 alkyl or --(CH2)p --OH, although R2 and R3 do not have to be equal, and p is 1-6;
(c) an effective amount of a buffering system which comprises a nitrogenous buffer which will result in a pH of greater than 6.5, said buffer selected from the group consisting of monoethanolamine, ammonitan bicarbonate, ammonium carbonate and ammonium hydroxide, in the absence of inorganic builders, such as silicates and phosphates, which leave a residue; and
(d) the remainder as substantially all water.
1 Assignment
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Accused Products
Abstract
The invention provides an aqueous, hard surface cleaner with significantly improved residue removal and substantially reduced filming/streaking, said cleaner comprising:
(a) an effective amount of at least one organic solvent with a vapor pressure of at least 0.001 mm Hg at 25° C., and mixtures of such solvents;
(b) an effective amount of at least one semi-polar nonionic surfactant, said surfactant having the structure: ##STR1## wherein R1 is C5-20 alkyl, R2 and R3 are both C1-4 alkyl, or --(CH2)p --OH, although R2 and R3 do not have to be equal, and p is 1-6;
(c) an effective amount of a buffering system which comprises a nitrogenous buffer which will result in a pH of greater than 6.5; and
(d) the remainder as substantially all water.
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Citations
14 Claims
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1. An aqueous, all temperature hard surface cleaner with significantly improved residue removal and substantially reduced filming/streaking, said cleaner consisting essentially of:
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(a) about 1-50% of at least one water soluble or water-miscible organic solvent with a vapor pressure of at least 0.001 mm Hg at 25°
C., and mixtures of such solvents;(b) about 0.001-10% of at least one semi-polar nonionic surfactant, said surfactant having the structure;
##STR9## wherein R1 is C5-20 alkyl, R2 and R3 are both C1-4 alkyl or --(CH2)p --OH, although R2 and R3 do not have to be equal, and p is 1-6;(c) an effective amount of a buffering system which comprises a nitrogenous buffer which will result in a pH of greater than 6.5, said buffer selected from the group consisting of monoethanolamine, ammonitan bicarbonate, ammonium carbonate and ammonium hydroxide, in the absence of inorganic builders, such as silicates and phosphates, which leave a residue; and (d) the remainder as substantially all water. - View Dependent Claims (3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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2. An aqueous hard surface cleaner with significantly improved residue removal and substantially reduced filming/streaking in challenging environmental conditions (high and low temperature), said cleaner consisting essentially of:
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(a) about 1-50% of at least one water soluble or water-miscible organic solvent with a vapor pressure of at least 0.001 mm Hg at 25°
C., and mixtures of such solvents;(b) about 0.001-10% of at least one semi-polar nonionic surfactant, said surfactant having the structure;
##STR10## wherein R1 is C5-20 alkyl, R2 and R3 are both C1-4 alkyl, or --(CH2)p --OH, although R2 and R3 do not have to be equal, and p is 1-6;(c) an effective amount of a buffering system which comprises a nitrogenous buffer which will result in a pH of greater than 6.5, said buffer selected from the group consisting of ammonium carbamate, monoethanolamine, ammonium bicarbonate, ammonium carbonate and ammonium hydroxide, in the absence of inorganic builders, such as silicates and phosphates, which leave a residue; and (d) the remainder as substantially all water.
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Specification