Methods and apparatus for sputtering with rotating magnet sputter sources

• US 5,830,327 A
• Filed: 10/02/1996
• Issued: 11/03/1998
• Est. Priority Date: 10/02/1996
• Status: Expired due to Fees

• Current Assignee: Intevac
• Original Assignee: Intevac
• Inventors: Kolenkow, Robert J.
• Primary Examiner(s): Nguyen, Nam
• Application Number:
  US08/724,792
• Time in Patent Office: 762 Days
• Field of Search: 204/192.12, 204/298.19, 204/298.2, 204/298.26, 204/192.2, 204/298.25
• US Class Current: 204/192.12
• CPC Class Codes: C23C 14/35 by application of a magnetic field, e.g. magnetron sputtering C23C14/3457 takes precedence
• CPC Class Codes: H01J 37/3408 Planar magnetron sputtering
• CPC Class Codes: H01J 37/3455 Movable magnets
• CPC Class Codes: H01J 37/347 Thickness uniformity of coated layers or desired profile of target erosion

Abstract

A magnetron sputtering source for forming a sputtered film on a substrate in a magnetron sputtering apparatus includes a target having a surface from which material is sputtered and a magnet assembly that is rotatable about an axis of rotation with respect to the target. The magnet assembly produces on the target an erosion profile that is calculated to yield a desired depositional thickness distribution and inventory. A method for configuring the rotatable magnet assembly includes the steps of determining an optimal erosion profile that yields the desired depositional thickness distribution and inventory, determining a plasma track on the surface of the target that produces an acceptable approximation to the optimal erosion profile, and determining a magnet structure that produces the plasma track.

Claims

1. A magnetron sputtering source for forming a sputtered film on a substrate in a magnetron sputtering apparatus, comprising:

a target having a surface from which material is sputtered; and

a magnet assembly consisting of an array of single magnet bars that is rotatable about an axis of rotation with respect to said target, said magnet assembly producing on said target an erosion profile that approximates a solution to an equation of the form ##EQU9## where e(r'"'"') is the erosion profile, t(r) is a desired radial thickness distribution of the sputtered film, K(r,r'"'"') is a function depending on the sputter geometry and process conditions, r is the radial position on the substrate, r'"'"' is the radial position on the target, and a and b are the radial limits of erosion on the target.

2. A magnetron sputtering source as defined in claim 1 wherein the desired radial thickness distribution of the sputtered film is uniform within a prescribed tolerance range up to ±

5%.

3. A magnetron sputtering source as defined in claim 1 wherein the desired radial thickness distribution of the sputtered film follows a specified variation within a prescribed tolerance range within ±

5%.

4. A magnetron sputtering source as defined in claim 1 wherein the erosion profile on said target covers substantially the entire exposed surface of said target facing the substrate.

5. A magnetron sputtering source as defined in claim 1 wherein said magnet assembly produces on the surface of said target a plasma track having a shape characterized by a pair of symmetrical lobes, a deeply indented first inward cusp located near the axis of rotation and a moderately indented second inward cusp, said first and second cusps being located on opposite sides of said plasma track, each of said lobes having a relatively long section of substantially constant radius with respect to the axis of rotation.

6. A magnetron sputtering source in accordance with claim 1 for forming a sputtered film on a substrate in a magnetron sputtering apparatus in which said magnet assembly is rotatable about an axis of rotation with respect to said target for producing on the surface of said target a plasma track having a shape characterized by a pair of symmetrical lobes, a deeply indented first inward cusp located near the axis of rotation and a moderately indented second inward cusp, said first and second cusps being located on opposite sides of said plasma track, each of said lobes having a relatively long section of at least about 1/2 in angular extent of substantially constant radius with respect to the axis of rotation.

7. A magnetron sputtering source as defined in claim 6 wherein the relatively long section of substantially constant radius has an arc length of about 100°

.

8. A magnetron sputtering source in accordance with claim 1, wherein said target and said substrate being positioned at a distance from each other of less than about 35 millimeters.

9. A method for configuring a rotatable magnet assembly for use in a magnetron sputtering apparatus including a target having a surface from which material is sputtered to form a sputtered film on a substrate, comprising the steps of:

determining an erosion profile on said target that approximates a solution to an equation of the form ##EQU10## where e(r'"'"') is the erosion profile, t(r) is a desired radial thickness distribution of the sputtered film, K(r,r'"'"') is a function depending on the sputter geometry and process conditions, r is the radial position on the substrate, r'"'"' is the radial position on the target, and a and b are the radial limits of erosion on the target; and

determining a magnet structure for said rotatable magnet assembly that produces an acceptable approximation to the erosion profile e(r'"'"').

10. A method as defined in claim 9 wherein the step of determining a magnet structure includes:

determining a plasma track on the surface of said target that produces the erosion profile e(r'"'"'); and

determining the magnet structure that produces said plasma track.

11. A method as defined in claim 10 wherein said plasma track has a shape characterized by a pair of symmetrical lobes, a deeply indented first inward cusp located near the axis of rotation and a moderately indented second inward cusp, said first and second cusps being located on opposite sides of said plasma track, each of said lobes having a relatively long section of substantially constant radius with respect to the axis of rotation.

12. A method as defined in claim 9 wherein the step of determining an erosion profile includes determining an erosion profile on said target that covers substantially the entire exposed surface of said target facing the substrate.

13. A method as defined in claim 9 wherein the step of determining an erosion profile includes determining an erosion profile wherein said desired radial thickness distribution is uniform within a prescribed tolerance range up to ±

5%.

14. A method as defined in claim 9 wherein the step of determining an erosion profile includes determining an erosion profile wherein said desired radial thickness distribution follows a specified variation within a prescribed tolerance range within ±

5%.

15. A magnetron sputtering apparatus comprising:

a first magnetron sputtering source for forming a sputtered film on a first surface of a substrate, said first magnetron sputtering source including a first target having a surface from which material is sputtered and a first magnet assembly consisting of an array of single magnet bars that is rotatable about an axis of rotation with respect to said first target, said magnet assembly producing on said target an erosion profile that approximates a solution to an equation of the form ##EQU11## where e(r'"'"') is the erosion profile, t(r) is a desired radial thickness distribution of the sputtered film, K(r,r'"'"') is a function depending on the sputter geometry and process conditions, r is the radial position on the substrate, r'"'"' is the radial position on the target, and a and b are the radial limits of erosion on the target;

a second magnetron sputtering source for forming a sputtered film on a second surface of said substrate, said second magnetron sputtering source including a second target having a surface from which material is sputtered and a second magnet assembly consisting of an array of single magnet bars that is rotatable about an axis of rotation with respect to said second target, said magnet assembly producing on said target an erosion profile that approximates a solution to an equation of the form ##EQU12## where e(r'"'"') is the erosion profile, t(r) is a desired radial thickness distribution of the sputtered film, K(r,r'"'"') is a function depending on the sputter geometry and process conditions, r is the radial position on the substrate, r'"'"' is the radial position on the target, and a and b are the radial limits of erosion on the target, said first and second magnet assemblies producing on the surfaces of said first and second targets plasma tracks, each having a shape characterized by a pair of symmetrical lobes, a deeply indented first inward cusp located near the axis of rotation and a moderately indented second inward cusp, said first and second cusps being located on opposite sides of said plasma track, each of said lobes having a relatively long section of substantially constant radius with respect to the axis of rotation; and

a vacuum system for producing a vacuum in regions between each target surface and the substrate.

16. A magnetron sputtering apparatus as defined in claim 15 wherein said first and second magnetron sputtering sources each produce on the substrate a radial thickness distribution of the sputtered film that is uniform within a prescribed tolerance range up to ±

5%.

17. A magnetron sputtering apparatus as defined in claim 15 wherein a source-to-substrate distance for each of said first and second magnetron sputtering sources is less than about 35 millimeters and wherein each of said first and second magnetron sputtering sources produces a radial thickness distribution of the sputtered film on the substrate that is uniform to better than about ±

5%.