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Apparatus and method for sputtering carbon

  • US 5,830,331 A
  • Filed: 09/23/1994
  • Issued: 11/03/1998
  • Est. Priority Date: 09/23/1994
  • Status: Expired due to Fees
First Claim
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1. A method for sputtering a carbon film for a magnetic thin film recording medium, comprising the steps of:

  • a) providing carbon-containing targets positioned side-by-side in an evacuated environment;

    b) flowing a gas into the evacuated environment to a pressure capable of sustaining sputtering;

    c) cyclically sputtering from the targets, which alternately act as a sputtering cathode and as an anode, to form the carbon film on the medium; and

    d) providing an apertured baffle between the targets to enhance the movement of electrons toward a target anode during the sputtering step.

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