Apparatus and method for sputtering carbon
First Claim
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1. A method for sputtering a carbon film for a magnetic thin film recording medium, comprising the steps of:
- a) providing carbon-containing targets positioned side-by-side in an evacuated environment;
b) flowing a gas into the evacuated environment to a pressure capable of sustaining sputtering;
c) cyclically sputtering from the targets, which alternately act as a sputtering cathode and as an anode, to form the carbon film on the medium; and
d) providing an apertured baffle between the targets to enhance the movement of electrons toward a target anode during the sputtering step.
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Abstract
A hydrogenated carbon film for magnetic thin film recording media is manufactured by alternating current magnetron sputtering in an atmosphere containing argon and a hydrocarbon gas. Targets mounted side-by-side cyclically sputter and discharge charge buildup according to an alternating current. Shielding between the targets directs electrons toward the anode at a given time.
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Citations
15 Claims
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1. A method for sputtering a carbon film for a magnetic thin film recording medium, comprising the steps of:
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a) providing carbon-containing targets positioned side-by-side in an evacuated environment; b) flowing a gas into the evacuated environment to a pressure capable of sustaining sputtering; c) cyclically sputtering from the targets, which alternately act as a sputtering cathode and as an anode, to form the carbon film on the medium; and d) providing an apertured baffle between the targets to enhance the movement of electrons toward a target anode during the sputtering step. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A method for sputtering a dielectric film onto a substrate, comprising the steps of:
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a) providing alternating current power to side by side targets so that the targets alternately act as a sputtering cathode and as an anode in accordance with the frequency of the alternating current; and b) moving the substrate past the targets under shielding conditions provided by an apertured baffle positioned between said targets that directs electrons between the targets to enhance the rate of sputtering of the film. - View Dependent Claims (9, 10, 11)
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12. A sputtering apparatus, comprising:
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a) a pair of magnetrons disposed within a sputtering chamber, the magnetrons having side-by-side targets and acting as a common sputtering area for the deposition of a film; b) an alternating current power supply connected to the magnetrons so that each target in the pair alternately functions as a sputtering cathode and then as an anode according to the frequency of the alternating current; and c) a shielding means between the magnetrons, the shielding means having apertures positioned to direct electrons to the anode as the targets alternate as a sputtering cathode and as the anode. - View Dependent Claims (13, 14, 15)
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Specification