Sputtering of lithium

• US 5,830,336 A
• Filed: 12/05/1995
• Issued: 11/03/1998
• Est. Priority Date: 12/05/1995
• Status: Expired due to Term

• Current Assignee: Sage Electrochromics, Inc (Compagnie De Saint-Gobain S.A.)
• Original Assignee: Minnesota Mining and Manufacturing Co (3M Company)
• Inventors: Schulz, Stephen C.
• Primary Examiner(s): NGUYEN, NAM X
• Application Number:
  US08/567,781
• Time in Patent Office: 1,064 Days
• Field of Search: 204/192.15, 204/298.12, 204/298.13, 204/298.19
• US Class Current: 204/298.12
• CPC Class Codes: C23C 14/185 by cathodic sputtering
• CPC Class Codes: C23C 14/3414 Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
• CPC Class Codes: C23C 14/3464 using more than one target C23C14/56 takes precedence
• CPC Class Codes: C23C 14/352 using more than one target C23C14/56 takes precedence
• CPC Class Codes: H01J 37/3426 Material

Abstract

Lithium is sputtered from a target with a metallic lithium surface using an alternating sputtering potential with a frequency between about 8 and about 120 kHz, preferably about 10-100 kHz. The process can be used to apply lithium to electrochromic materials such as coatings on window glass.

Claims

1. A sputtering target element comprising a metallic supporting layer and a top layer of metallic lithium overlying a top surface of said supporting layer and metallurgically bonded thereto.

2. A target as claimed in claim 1 wherein said supporting layer is formed from a metal selected from the group consisting of copper and copper-based alloys.

3. A target as claimed in claim 1 further comprising indium disposed at said top surface of said supporting layer, said lithium being bonded to said supporting layer through said top surface.

4. A target as claimed in claim 1 wherein said top surface and said top layer are flat.

5. A target as claimed in claim 1 wherein said top surface defines a depression and a ridge surrounding said depression, said top layer including a relatively thin portion overlying said ridge and a relatively thick portion filling said depression.

6. An assembly including a target as claimed in claim 5, and a target holder including magnetic means for providing a magnetic field in a preselected area and means for securing said supporting layer to said target holder so that said preselected area is aligned with said depression and with said relatively thick portion of said top layer.

7. An assembly including a target as claimed in claim 1, a target holder and means for securing said supporting layer to said target holder.