Apparatus and method for controlling high throughput sputtering

• US 5,831,851 A
• Filed: 03/21/1995
• Issued: 11/03/1998
• Est. Priority Date: 03/21/1995
• Status: Expired due to Term

• Current Assignee: View Incorporated
• Original Assignee: Seagate Technology plc (Seagate Technology Holdings Plc)
• Inventors: Mass, Leon, Eastburn, Lindsey
• Primary Examiner(s): Gordon, Paul P.
• Application Number:
  US08/407,826
• Time in Patent Office: 1,323 Days
• Field of Search: 364/500, 364/167.01, 364/468.25, 364/468.26, 364/468.27, 364/469.02, 364/468.24, 364/468.2, 364/468.21, 364/469.01
• US Class Current: 700/114
• CPC Class Codes: G05B 19/4184 characterised by fault tolerance, reliability of production system
• CPC Class Codes: G05B 19/41855 by local area network [LAN], network structure
• CPC Class Codes: Y02P 90/02 Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]

Abstract

A control system for a film deposition apparatus having a plurality of processing chambers. The control system includes a plurality of control processors, each of the plurality of processors including a memory, being coupled to a subset of the plurality of chambers and controlling processing in said subset of the plurality of chambers. Each processor includes a data structure, provided in said memory, having configuration data for said plurality of processing chambers, and control routines for controlling processing in the apparatus. In a second aspect, the system includes a facility for determining the position of the substrate in the system. The transport system of the deposition apparatus includes hardware position sensors which indicate the presence or absence of a substrate at said sensor. The facility determines the position of substrates when the output of one or more of the hardware sensors is unavailable. The facility determines substrate position based on the output of one or more other sensors which provide a known position of the substrate, encoder data, and the rate of movement of the substrate at each transport stage of the system.

Claims

1. A control system for a film deposition apparatus having a plurality of processing chambers, comprising:

a plurality of control processors, each of the plurality of processors including a memory, being coupled to a subset of the plurality of chambers, and controlling processing in said subset of the plurality of chambers; and

a data structure provided in said memory including configuration data for each of said plurality of processing chambers;

wherein said apparatus includes deposition processing hardware to deposit films on a plurality of substrates passing through said plurality of processing chambers, said processing hardware being arranged into subsystems, said subsystems including a pumping system, a heating system, a transport system, and a sputtering gas control system; and

wherein each of said plurality of processors controls a portion of said subsystems as the plurality of substrates are processed.

2. The control system of claim 1 further including a network coupling the plurality of processors and including a network hub, said hub and said plurality of control processors being coupled to the network such that each of said plurality of processors and said hub are in communication with all processors coupled to the network.

3. The control system of claim 2 wherein said apparatus processes a plurality of substrates which are transported through the apparatus via the transport system, the transport system including a plurality of transport stages, said transport stage including a plurality of position sensors with each said stage having at least one sensor providing an output which indicate the presence or absence of a substrate at the position sensor, and at least a subset of said plurality of control processors communicate with said sensors to establish the position of the substrate in the deposition apparatus.

4. The control system of claim 3 wherein each processor includes

means for reading the output of the sensor to determine whether a substrate is positioned at the location of the sensor;

and

means for determining the position of the substrate at a given sensor when the output of said given sensor is unavailable, said means determining said position based on the output of one or more other sensors providing and data provided by at least one encoder associated with at least one of the sensors.

5. The control system of claim 4 wherein the control system includes control routines for enabling continued operation of the deposition apparatus when a failure is detected in at least one of the position sensors, such that the position of the substrate is indicated to the control system by the control routines and the position of the substrate can be determined based on the output of the functioning processors.

6. The control system of claim 5 further including at least one encoder provided with each transport stage, providing data on the rotation of wheels supporting each substrate at each said stage, wherein said control routines utilize the encoder data to determine the position of a substrate.

7. The control system of claim 5 wherein said control routines include timing means for determining the position of the substrate based on a rate movement of the substrate in the system.

8. The control system of claim 1 wherein each of said processors operate in parallel to process requests from a user and data input/output from the film deposition apparatus.

9. The control system of claim 1 wherein the control system includes a scanner level of routines for interpreting the output of the apparatus hardware, a permissives level of routines, and a control level of routines, the permissives level interacting with the control level to allow or inhibit control level requests from initiating control functions in the apparatus.

10. The control system of claim 1 wherein the deposition apparatus includes twenty processing chambers, and a first control processor controls processing in a subset comprising chambers 1-4, a second control processor controls processing in a subset comprising chambers 4-8, a third control processor controls processing in a subset comprising chambers 9-12, and a fourth control processor controls processing in a subset comprising chambers 13-20.

11. The control system of claim 1 wherein each processor includes means for reading the output of at least one sensor positioned in each of said plurality of processing chambers to determine whether a substrate is positioned at the location of the sensor;

and

means for determining the position of the substrate at a given sensor when the output of said given sensor is unavailable, said means determining said position based on the output of one or more other sensors providing and actual known position of the substrate and a rate of movement of the substrate at each transport stage of the system, and for outputting a signal.

12. The control system of claim 11 wherein each transport stage includes three sensors per processing chamber, and the means for determining the positioning of the substrate provides an output to the processors to enable other control routines operating in the system to function.

13. The control system of claim 11 wherein the means for determining is selectively enabled and disabled by the system operator.

14. A control system for a film deposition apparatus having a plurality of processing chambers, comprising:

a network hub;

a plurality of control processors, communicating via the hub, each of said plurality of processors including non-volatile memory and being coupled to a subset of the plurality of chambers and controlling processing in said subset of the plurality of chambers; and

a data structure provided in said non-volatile memory including configuration data for each of said plurality of processing chambers.

15. The control system of claim 14 wherein said apparatus processes a plurality of substrates, each of said processing chambers includes a transport apparatus and at least one sensor associated with the transport apparatus, each transport apparatus for transporting one of said plurality of substrates through said chamber.

16. The control system of claim 15 including an encoder associated with each transport apparatus, and the control system includes means for determining the position of a substrate relative to a transport apparatus based on the encoder.

17. The control system of claim 15 including means for determining the position of a substrate relative to the film deposition apparatus based on a rate of movement of the substrate.

18. A control system for a film deposition apparatus, the apparatus processing including a plurality of substrates which are transported through the apparatus via a transport system, the transport system including a plurality of transport stages, each said stage having at least one sensor providing an output, the system including:

means for reading the output of each sensor to determine whether a substrate is positioned at the location of the sensor; and

means for determining the position of the substrate at a given sensor when the output of said given sensor is unavailable, said means determining said position based on the output of at least one functioning sensor providing an actual known position of the substrate and the rate of movement of the substrate at each transport stage of the system;

wherein each transport stage includes three sensors per processing chamber, and the means for determining the positioning of the substrate provides an output to the processors to enable other control routines operating in the system to function.

19. The control system of claim 18 wherein the film deposition apparatus including a plurality of process chambers, and the means for determining includes

a plurality of control processors, each of the plurality of processors including a memory, being coupled to a subset of the plurality of chambers, and controlling processing in said subset of the plurality of chambers;

and

a data structure provided in said memory including configuration data for each of said plurality of processing chambers.

20. The control system of claim 19 wherein said plurality of processors are coupled to receive the output of the sensor, and wherein said means for determining includes determining the position of the substrate relative to the rate of the substrate and the time the substrate has moved.

21. The control system of claim 19 wherein said plurality of processors are coupled to receive the output of the sensor, and wherein said means for determining further includes an encoder associated with each of said transport stages, said means determining the position of the substrate relative to data provided by said encoder.

22. The control system of claim 18 wherein the means for determining is selectively enabled and disabled by the system operator.

23. The control system of claim 18 wherein said sensors are provided at the input, midpoint and endpoint of each of said plurality of transport stages.

24. An apparatus for controlling an in-line sputtering machine having an input end, an output end, a plurality of processing chambers between the input end and the output end, a pumping system, a heating system, a transport system, and a sputtering gas control system, the transport system including a plurality of position sensors, each said system cooperating to process a plurality of substrates as the substrates pass from the input end to the output end, comprising:

a network, including a network hub; and

a plurality of processors including non-volatile storage means for storing configuration data for said apparatus, coupled to the hub and network, each of said plurality of processors being coupled to a subset of the plurality of chambers and controlling a portion of each of said pumping, heating, transport and sputtering gas systems of the sputtering machine relative to said subset of chambers, such that each said processor controls processing in a subset of said chambers of the sputtering apparatus, at least one of said processors including

means for reading the output of said sensors to determine whether a substrate is positioned at the sensor; and

means for determining the position of the substrate at a given sensor when the output of one of said sensors is unavailable, said means determining said position based on the output of at least one functioning sensor providing an actual known position of the substrate and the rate of movement of the substrate at each transport stage of the system, and for outputting a signal.

25. The control system of claim 24 wherein each of said plurality of processors controls a portion of said systems as the plurality of substrates are processed.

26. The control system of claim 24 wherein the control system includes a scanner level of routines for interpreting the output of the apparatus hardware, a permissives level of routines, and a control level routines, the permissive level interacting with the control level to allow or inhibit operator or control level requests from initiating control functions in the apparatus.

27. The control system of claim 24 wherein said plurality of position sensors indicate the presence or absence of a substrate at the position sensors, and a subset of said plurality of processors communicate with each said sensor to establish the position of the substrate in the deposition apparatus.

28. The control system of claim 24 wherein the control system includes control routines for enabling continued operation of the deposition apparatus when a failure is detected in at least one of the position sensors, such that the position of the substrate is indicated to the control system by the control routines and the position of the substrate can be determined based on the output of the functioning processors.