Method for the optimum utilization of base material in the manufacture of optoelectronic components with variable-period grating

• US 5,834,158 A
• Filed: 05/30/1996
• Issued: 11/10/1998
• Est. Priority Date: 05/30/1995
• Status: Expired due to Term

• Current Assignee: CommScope Technologies, LLC (CommScope Holding Company, Inc.)
• Original Assignee: Deutsche Telekom AG
• Inventors: Hillmer, Hartmut
• Primary Examiner(s): Baxter, Janet C.
• Assistant Examiner(s): Ashton, Rosemary
• Application Number:
  US08/655,502
• Time in Patent Office: 894 Days
• Field of Search: 430/296, 430/312, 430/5, 359/573, 385/10, 385/37
• US Class Current: 430/296
• CPC Class Codes: G02B 2006/12107 Grating
• CPC Class Codes: G02B 6/124 Geodesic lenses or integrated gratings
• CPC Class Codes: G03F 7/70425 Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
• CPC Class Codes: G03F 7/70475 Stitching, i.e. connecting image fields to produce a device field, the field occupied by a device such as a memory chip, processor chip, CCD, flat panel display
• CPC Class Codes: H01S 5/02 Structural details or components not essential to laser action
• CPC Class Codes: H01S 5/0201 Separation of the wafer into individual elements, e.g. by dicing, cleaving, etching or directly during growth
• CPC Class Codes: H01S 5/0207 Substrates having a special shape
• CPC Class Codes: H01S 5/1028 Coupling to elements in the cavity, e.g. coupling to waveguides adjacent the active region, e.g. forward coupled [DFC] structures
• CPC Class Codes: H01S 5/1032 Coupling to elements comprising an optical axis that is not aligned with the optical axis of the active region
• CPC Class Codes: H01S 5/12 the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers comprising a photonic bandgap structure H01S5/11; surface-emitting lasers H01S5/18
• CPC Class Codes: H01S 5/125 Distributed Bragg reflector [DBR] lasers

Abstract

Disclosed is a method for the optimum utilization of disk-shaped base material in the manufacture of optoelectronic components with variable-period grating. The method helps avoid material losses by arranging optoelectronic components on a disk-shaped base material in an optimum manner and is based on obtaining variants of nominally identical individual component patterns by mathematical rotation and mirroring, forming a unit cell through shifting of the individual component pattern variants, and reproducing the unit cell in the x and y directions until the active surface of the mask or the entire surface of the disk-shaped base material is tightly covered. The method may be used for the manufacture of photonic components based on DFB, DBR, or sampled grating structures.

Claims

1. A method of optimizing the use of a base material in manufacturing optoelectronic components with variable-period grating, the optoelectronic components having edges corresponding to an x direction and a y direction, the method comprising the steps of:

choosing at least one individual component pattern, obtaining a first geometric variant of the at least one individual component pattern by performing a 180 degree rotation around an axis that is perpendicular to a surface of the individual component pattern and obtaining a second geometric variant of the at least one individual component pattern by mirroring; and

creating a unit cell for forming a waveguide on the base material, the unit cell being formed from at least one of the first geometric variant, the second geometric variant and the at least one individual component pattern, the continuity and differentiability of the waveguide to be formed by the unit cell being ensured.

2. The method as recited in claim 1 wherein an incidence angle α

of the waveguide on a left edge of the unit cell coincides with an exit angle β

of the waveguide on a right edge of the unit cell.

3. The method as recited in claim 1 wherein a computer is used to select the individual component patterns.

4. The method as recited in claim 1 wherein a computer is used for generally ensuring the continuity and differentiability of the waveguide to be formed.

5. The method as recited in claim 1 further comprising the step of choosing a second individual component pattern.

6. The method as recited in claim 5 further comprising forming a further geometric variant by either mirroring or rotating the second component pattern.

7. The method as recited in claim 5 wherein the unit cell is created from at least the at least one individual component pattern, the first geometric variant, the second geometric variant and the second individual component pattern.

8. The method as recited in claim 1 wherein the continuity of the waveguide to be formed is slightly interrupted in at least one case, a lateral waveguide offset being less than 1/20 of a lateral width of the waveguide.

9. The method as recited in claim 1 wherein the differentiability of the waveguide to be formed is slightly interrupted in at least one case, the resulting angular offset still being less than 1°

.

10. The method as recited in claim 1 wherein the unit cell is reproduced in at least one case by rotation around one of its axes.

11. The method as recited in claim 10 wherein the unit cell is reproduced to form a mask which generally covers the base material.

12. The method as recited in claim 1 wherein the unit cell is reproduced by translation using a shift vector.

13. The method as recited in claim 1 wherein a lateral position y₁ of the waveguide to be formed on a left edge of the unit cell is equal to a lateral position y₂ of the waveguide to be formed on a right edge of the unit cell.

14. The method as recited in claim 1 wherein a lateral position y₁ of the waveguide to be formed on a left edge of the unit cell is not equal to a lateral position y₂ of the waveguide to be formed on a right edge of the unit cell.

15. The method as recited in claim 1 the optoelectronic components are formed on the base material using electron or ion beam lithography.

16. The method as recited in claim 1 further comprising the step of reproducing the unit cell in the x and y directions.

17. The method as recited in claim 1 wherein the unit cell is created from at least two of the first geometric variant, the second geometric variant and the at least one individual component pattern.

18. A method of optimizing the use of a base material in manufacturing optoelectronic components with variable-period grating, the optoelectronic components having edges corresponding to an x direction and a y direction, the method comprising the steps of:

choosing at least one individual component pattern, obtaining a first geometric variant of the at least one individual component pattern by performing a 180 degree rotation around an axis that is perpendicular to a surface of the individual component pattern and obtaining a second geometric variant of the at least one individual component pattern by mirroring; and

creating a unit cell for forming a waveguide on the base material, the unit cell being formed from at least one of the first geometric variant, the second geometric variant and the at least one individual component pattern, the continuity and differentiability of the waveguide to be formed by the unit cell being ensured;

wherein the at least one individual component pattern, the first geometric variant and the second geometric variant are used to obtain a set of masks for lithographic component manufacturing.

19. A method of optimizing the use of a base material in manufacturing optoelectronic components with variable-period grating, the optoelectronic components having edges corresponding to an x direction and a y direction, the method comprising the steps of:

rotating an original individual component pattern 180 degrees to form a rotated pattern;

mirroring the rotated pattern to form a mirrored pattern;

creating a unit cell from at least one of the original individual component pattern, the rotated pattern and the mirrored pattern the unit cell for forming a waveguide, the continuity and differentiability of the waveguide to be formed by the unit cell being ensured; and

reproducing the unit cell to form a mask.

20. The method as recited in claim 19 further comprising the step of rotating the mirrored pattern by 180 degrees.