High temperature susceptor

• US 5,837,058 A
• Filed: 07/12/1996
• Issued: 11/17/1998
• Est. Priority Date: 07/12/1996
• Status: Expired due to Fees

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Xi, Ming, Wang, Ruiping, Chen, Steven Aihua
• Primary Examiner(s): Breneman, R. Bruce
• Assistant Examiner(s): LUND, JEFFRIE ROBERT
• Application Number:
  US08/680,328
• Time in Patent Office: 858 Days
• Field of Search: 118/725, 118/728, 118/729, 118/730, 118/500, 219/634, 219/638, 219/730, 219/86.25
• US Class Current: 118/728
• CPC Class Codes: C23C 16/4581 characterised by material of construction or surface finish of the means for supporting the substrate

Abstract

A susceptor with improved resistance to thermal cycling and chemical attack between processing and cleaning cycles. The susceptor comprises a top surface is surrounded by a lip, the lip having a beveled inner side, a top side, an outer side, a first rounded edge between the top side and the outer side, a second rounded edge between the top side and the inner side, and a third rounded edge between the inner side and the top surface. The susceptor comprises a body of graphite covered by a coating of aluminum nitride.

Claims

1. An apparatus, comprising:

a planar substrate mounting surface having an area;

a lip surrounding the substrate mounting surface and defining said area;

having a height above the mounting surface and a first rounded edge between an inner edge and the planar surface, the lip further having a top side and an outer side, and a second rounded edge coupling the outer side to the top side.

2. The apparatus of claim 1 wherein the apparatus comprises a susceptor for a chemical vapor deposition chamber.

3. The apparatus of claim 1 wherein the second rounded edge is rounded to a radius circle of about 0.020-0.060 inch.

4. The apparatus of claim 1 wherein the first rounded edge is rounded to a radius circle of about 0.010 to 0.015 inch.

5. The apparatus of claim 1 wherein the apparatus further includes a third rounded edge between the top side and the inner edge, the third rounded edge being rounded to a radius circle of about 0.015 inch.

6. The apparatus of claim 1 wherein the apparatus is comprised of a graphite composite material having an aluminum nitride coating.

7. The apparatus of claim 6 wherein the material has a thermal expansion coefficient closely matched with the thermal expansion coefficient of aluminum nitride.

8. The apparatus of claim 7 wherein the graphite material is bead blasted prior to application of the aluminum nitride coating.

9. The apparatus of claim 8 wherein the coating thickness is about 40-60 microns.

10. A susceptor for a chemical vapor deposition chamber, comprising:

a wafer support surface having a recessed planar surface and a lip, the lip portion having a beveled inner side, a top side and an outer sides and further including a rounded base edge between the inner side and recessed planar surface.

11. The susceptor of claim 10 wherein the rounded base edge is rounded to a radius circle of about 0.010 to 0.015 inch.

12. The susceptor of claim 11 further including a second rounded edge between the outer side and the top side, wherein the second rounded edge is rounded to a radius circle of about 0.020 to 0.060 inch.

13. The susceptor of claim 12 further includes a third rounded edge between the top side and the inner side, the third rounded edge being rounded to a radius circle of about 0.015 inch.

14. The susceptor of claim 10 is comprised of a graphite composite material having an aluminum nitride coating.

15. The susceptor of claim 14 wherein the aluminum nitride coating thickness is about 40-60 micron.

16. The susceptor of claim 14 wherein the graphite material has a thermal expansion coefficient closely matched with the thermal expansion coefficient of aluminum nitride.

17. The susceptor of claim 14 wherein the graphite material is bead blasted prior to application of the aluminum nitride coating.

18. A susceptor for use in chemical vapor deposition, comprising:

a body comprised of graphite material, the body having a top surface defining a substrate holding area, the top surface surrounded by a lip, the lip having a beveled inner side, a top side, an outer side, a first rounded edge between the top side and the outer side, and a second rounded edge between the top side and the inner side, and a third rounded edge between the inner side and the top surface; and

a coating covering the body, the coating comprising a film of aluminum nitride;

wherein the graphite material comprising the body has a thermal coefficient closely matching the thermal coefficient of the AlN coating.

19. The susceptor of claim 18 wherein the AlN coating has a thickness of 40-60 micron.

20. The susceptor of claim 18 wherein the first rounded edge has a radius of 0.020 to 0.060 inch.

21. The susceptor of claim 20 wherein the second rounded edge has a radius of 0.010 to 0.015 inch.

22. The susceptor of claim 21 wherein the third rounded edge has a radius of 0.010 to 0.015 inch.