Aqueous, antimicrobial liquid cleaning formulation

• US 5,837,274 A
• Filed: 10/22/1996
• Issued: 11/17/1998
• Est. Priority Date: 10/22/1996
• Status: Expired due to Fees

• Current Assignee: Kimberly-Clark Worldwide Incorporated (Kimberly-Clark Corporation)
• Original Assignee: Kimberly-Clark Corporation
• Inventors: Wheeler, Claude R. Jr., Shick, Richard L.
• Primary Examiner(s): Levy, Neil S.
• Application Number:
  US08/735,039
• Time in Patent Office: 756 Days
• Field of Search: 424/405, 424/406, 424/78.05, 424/78.07
• US Class Current: 424/406
• CPC Class Codes: A61K 8/347 Phenols
• CPC Class Codes: A61K 8/86 Polyethers
• CPC Class Codes: A61K 8/87 Polyurethanes
• CPC Class Codes: A61P 17/00 Drugs for dermatological disorders
• CPC Class Codes: A61Q 17/005 Antimicrobial preparations
• CPC Class Codes: A61Q 19/10 Washing or bathing preparations

Abstract

An aqueous, antimicrobial liquid cleaning formulation including: 1) a polymeric deposition aid composed of a mixture of liquid, hydroxyl-terminated urethane polymers in polyethylene glycol; 2) a phenol derivative antimicrobial agent; and 3) a surfactant system comprising predominantly nonionic surfactants, amphoteric surfactants or combinations thereof such that the liquid cleaning formulation provides at least about 10 percent greater antimicrobial activity than the same formulation without the polymeric deposition aid.

Claims

1. An aqueous, anti-microbial liquid cleaning formulation for cleansing the skin comprising:

a polymeric deposition aid comprising a mixture of liquid, hydroxyl-terminated urethane polymers in polyethylene glycol;

an antimicrobial agent having a phenol moiety; and

a surfactant system comprising predominantly nonionic surfactants, amphoteric surfactants and/or combinations thereof such that the liquid cleaning formulation provides at least about 10 percent greater antimicrobial activity than the same formulation without the polymeric deposition aid.

2. The liquid cleaning formulation of claim 1, wherein the polymeric deposition aid is a hydroxy terminated urethane compound having the formula:

##STR3## wherein R is selected from an alkylene or alkenylene radical containing from one to about 20 carbon atoms, a cycloalkylene or cycloalkenylene radical containing from about 5 to about 10 carbon atoms, a mononuclear or fused ring arylene radical containing from about 6 to about 10 carbon atoms, unsubstituted or substituted with one or more lower alkyl, lower alkoxy, nitro or amino groups or halogen atoms,

wherein R'"'"' is the same or different alkylene or alkenylene radical,

wherein m is an integer selected to provide an (O--R'"'"') moiety having molecular weight of from about 40 to about 6000, and

wherein n and n'"'"' are the same or different integers of from 0 to about 30 inclusive, correlated with m so as to provide a hydroxy-terminated urethane compound having a molecular weight of up to about 200,000.

3. The liquid cleaning formulation of claim 2, wherein m is an integer selected to provide an (O--R'"'"') moiety having molecular weight of from about 40 to about 60.

4. The liquid cleaning formulation of claim 2, wherein n and n'"'"' are the same or different integers of from 0 to about 30 inclusive, correlated with m so as to provide a hydroxy-terminated urethane compound having a molecular weight of up to about 1,800.

5. The liquid cleaning formulation of claim 1, wherein the polymeric deposition aid is poly(oxy-1,2-ethanediyl),α

-hydro-ω

-hydroxy-, polymer with 1,1'"'"'-methylene-bis-(4,isocyanato-cyclohexane).

6. The liquid cleaning formulation of claim 1, wherein the phenol derivative antimicrobial agent is 2,4,4'"'"'-trichloro-2'"'"'-hydroxy diphenyl ether.

7. The liquid cleaning formulation of claim 1, further comprising at least one formulating component.

8. The liquid cleaning formulation of claim 7, wherein at least one formulating component is selected from the group consisting of carriers, preservatives, humectants, emollients and combinations thereof.

9. The liquid cleaning formulation of claim 1, wherein the formulation provides at least about 10 percent greater antimicrobial activity than formulations containing predominantly anionic surfactants or cationic surfactants or combinations thereof and lacking the polymeric deposition aid.

10. The liquid cleaning formulation of claim 1, wherein the formulation provides at least about 10 percent greater antimicrobial activity in combination with less skin irritation as determined by the Arm Wash Test than formulations containing predominantly anionic surfactants, cationic surfactants or combinations thereof and lacking the polymeric deposition aid.

11. The liquid cleaning formulation of claim 1, wherein the formulation provides at least about 10 percent greater antimicrobial activity in combination with at least about 10 percent less incidence of dermal erythema as determined by the Arm Wash Test than formulations containing predominantly anionic surfactants, cationic surfactants or combinations thereof and lacking the polymeric deposition aid.

12. An aqueous, antimicrobial liquid cleaning formulation for cleansing the skin comprising:

a polymeric deposition aid comprising a mixture of liquid, hydroxyl-terminated urethane polymers in polyethylene glycol;

an antimicrobial agent having a phenol moiety; and

a surfactant system comprising predominantly nonionic surfactants, amphoteric surfactants and/or combinations thereof such that the liquid cleaning formulation provides at least about 10 percent greater antimicrobial activity in combination with less skin irritation as determined by the Arm Wash Test than formulations containing predominantly anionic surfactants, cationic surfactants or combinations thereof and lacking the polymeric deposition aid.

13. The liquid cleaning formulation of claim 12, wherein the polymeric deposition aid is a hydroxy terminated urethane compound having the formula:

##STR4## wherein R is selected from an alkylene or alkenylene radical containing from one to about 20 carbon atoms, a cycloalkylene or cycloalkenylene radical containing from about 5 to about 10 carbon atoms, a mononuclear or fused ring arylene radical containing from about 6 to about 10 carbon atoms, unsubstituted or substituted with one or more lower alkyl, lower alkoxy, nitro or amino groups or halogen atoms,

wherein R'"'"' is the same or different alkylene or alkenylene radical,

wherein m is an integer selected to provide an (O--R'"'"') moiety having molecular weight of from about 40 to about 6000, and

wherein n and n'"'"' are the same or different integers of from 0 to about 30 inclusive, correlated with m so as to provide a hydroxy-terminated urethane compound having a molecular weight of up to about 200,000.

14. The liquid cleaning formulation of claim 13, wherein m is an integer selected to provide an (O--R'"'"') moiety having molecular weight of from about 40 to about 60.

15. The liquid cleaning formulation of claim 13, wherein n and n'"'"' are the same or different integers of from 0 to about 30 inclusive, correlated with m so as to provide a hydroxy-terminated urethane compound having a molecular weight of up to about 1,800.

16. The liquid cleaning formulation of claim 12, wherein the polymeric deposition aid is poly(oxy-1,2-ethanediyl),α

-hydro-ω

-hydroxy-, polymer with 1,1'"'"'-methylene-bis-(4,isocyanato-cyclohexane).

17. The liquid cleaning formulation of claim 12, wherein the phenol derivative antimicrobial agent is 2,4,4'"'"'-trichloro-2'"'"'-hydroxy diphenyl ether.

18. The liquid cleaning formulation of claim 12, further comprising at least one formulating component.

19. The liquid cleaning formulation of claim 18, wherein the at least one formulating component is selected from the group consisting of carriers, preservatives, humectants, emollients and combinations thereof.