Soft magnetic thin film and thin film magnetic head using same

• US 5,837,392 A
• Filed: 11/07/1996
• Issued: 11/17/1998
• Est. Priority Date: 11/30/1995
• Status: Expired due to Term

• Current Assignee: Sony Corporation (Sony Group Corp.)
• Original Assignee: Sony Corporation (Sony Group Corp.)
• Inventors: Ohmori, Hiroyuki, Katori, Kenji, Onuma, Hiroshi, Shouji, Mitsuharu
• Primary Examiner(s): KILIMAN, LESZEK B
• Application Number:
  US08/745,180
• Time in Patent Office: 740 Days
• Field of Search: 428/694 R, 428/694 T, 428/692, 428/900, 428/694 TS, 428/694 TM, 204/192.2, 360/126
• US Class Current: 428/812
• CPC Class Codes: G11B 5/255 comprising means for protection against wear in thin film structures G11B5/3106
• CPC Class Codes: G11B 5/3109 Details G11B5/3103 takes precedence
• CPC Class Codes: H01F 10/147 with lattice under strain, e.g. expanded by interstitial nitrogen H01F10/26 - H01F10/30 take precedence
• CPC Class Codes: H01F 10/265 Magnetic multilayers non exchange-coupled H01F10/32 takes precedence
• CPC Class Codes: Y10S 428/90 Magnetic feature
• CPC Class Codes: Y10T 428/115 Magnetic layer composition

Abstract

A soft magnetic thin film according to the present invention can exhibit not only good soft magnetic properties but also an excellent anti-corrosion property, a low magnetostriction, a high saturation magnetic flux density and a high bonding ability to a base plate or substrate. The soft magnetic thin film has a composition of (Fe_a M_b Cu_c Ru_d)_e N_f O_g where a, b, c, d, e, f and g represent an atomic % of the respective elements and M represents at least one element selected from the group consisting of Si, Al, Ta, B, Mg, Ca, Sr, Cr, Mn, Zr, Nb, Ti, Mo, V, W, Hf, Ga, Ge and rare earth elements, with the limitations of 0≦b≦5, 0≦c≦8, 0≦d≦5, 0≦c+d≦8, a+b+c+d=100, 0.5≦f≦15, 0.1≦g≦13 and e+f+g=100, the soft magnetic thin film being prepared by reaction-sputtering in which a nitrogen and a steam (H₂ O) are introduced.

Claims

1. A soft magnetic thin film comprising a soft magnetic thin film selected from the group consisting of:

(Fe₉₆ Al₁.1 V₀.4 Nb₀.4 Ru₁.6 Cu₀.5)₉₄ N₄ O₂ ;

(Fe₉₆.6 Al₁.1 V₀.4 Nb₀.4 Ru₁.6)₉₄ N₄ O₂ ;

(Fe₉₇.6 Al₁.1 V₀.4 Nb₀.4 Cu₀.5)₉₄ N₄ O₂ ; and

(Fe₉₈.1 Al₁.1 V₀.4 Nb₀.4) ₉₄ N₄ O₂ ;

said soft magnetic thin film being prepared by a reaction sputtering in which nitrogen and steam (H₂ O) are introduced.

4. A soft magnetic thin film as claimed in claim 1, wherein said soft magnetic thin film is prepared in a magnetic field not less than 1 kA/m but not more than 1,000 kA/m.

5. A soft magnetic thin film as claimed in claim 1, wherein said soft magnetic thin film is heat-treated in a rotating magnetic field after completing the formation thereof.

6. A soft magnetic thin film as claimed in claim 1, further comprising a primer coat layer disposed adjacent to said soft magnetic thin film and comprising at least one metal selected from the group consisting of Ta, Nb, Zr, Ti, Al, Cr, Mo, W, Pt, Au, Pd, Ag and V.

2. A thin film magnetic head comprising:

lower and upper magnetic cores, each comprising a soft magnetic thin film; and

a thin film coil interposed between said lower and upper magnetic cores through insulating layers,

said soft magnetic thin films being selected from the group consisting of;

(Fe₉₆ Al₁.1 V₀.4 Nb₀.4 Ru₁.6 Cu₀.5)₉₄ N₄ O₂ ;

(Fe₉₆.6 Al₁.1 V₀.4 Nb₀.4 Ru₁.6)₉₄ N₄ O₂ ;

(Fe₉₇.6 Al₁.1 V₀.4 Nb₀.4 Cu₀.5)₉₄ N₄ O₂ ; and

(Fe₉₈.1 Al₁.1 V₀.4 Nb₀.4) ₉₄ N₄ O₂ ;

said soft magnetic thin film being prepared by a reaction sputtering in which nitrogen and steam (H₂ O) are introduced.

3. A thin film magnetic head having a laminated structure in which a plurality of soft magnetic thin films are laminated through intermediate layers, each of said soft magnetic thin films being selected from the group consisting of:

(Fe₉₆ Al₁.1 V₀.4 Nb₀.4 Ru₁.6 Cu₀.5)₉₄ N₄ O₂ ;

(Fe₉₆.6 Al₁.1 V₀.4 Nb₀.4 Ru₁.6)₉₄ N₄ O₂ ;

(Fe₉₇.6 Al₁.1 V₀.4 Nb₀.4 Cu₀.5)₉₄ N₄ O₂ ; and

(Fe₉₈.1 Al₁.1 V₀.4 Nb₀.4)₉₄ N₄ O₂ ;

said soft magnetic thin film being prepared by a reaction sputtering in which nitrogen and steam (H₂ O) are introduced.

7. A thin film magnetic head as claimed in claim 3, wherein said intermediate layers are each composed of at least one metal material selected from the group consisting of Ta, Nb, Zr, Ti, Al, Cr, Mo, W, Pt, Au, Pd, Ag and V.