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Vertical interconnect process for silicon segments

  • US 5,837,566 A
  • Filed: 04/24/1997
  • Issued: 11/17/1998
  • Est. Priority Date: 06/23/1994
  • Status: Expired due to Term
First Claim
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1. A method for forming a stack of segments, comprising the steps of:

  • providing a wafer having a plurality of die;

    creating a plurality of segments, each one of said plurality of segments formed by grouping a plurality of adjacent ones of said die on said wafer,interconnecting said plurality of adjacent die on said each one of said plurality of segments;

    separating said each one of said plurality of segments from said wafer;

    placing said plurality of segments on top of one another to create a stack of segments, said stack having external vertical sides;

    electrically interconnecting said stack of segments;

    providing internal electrically conductive contact points on each of said plurality of die;

    providing external electrically conductive contact points said each one of said plurality of segments;

    providing a layer of metal traces on said each one of said plurality of segments, said metal traces extending between said internal electrically conductive contact points on said plurality of die and said external electrically conductive contact points on said each one of said plurality of segments; and

    applying electrically conductive epoxy to more than one of said external vertical sides of said stack such that said electrically conductive epoxy is in contact with said external electrically conductive contact points on said each one of said segments in said stack, to thereby electrically interconnect said plurality of segments in said stack.

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