Method and apparatus for determining surface roughness

• US 5,838,445 A
• Filed: 02/21/1997
• Issued: 11/17/1998
• Est. Priority Date: 06/07/1995
• Status: Expired due to Term

• Current Assignee: Micron Technology, Inc.
• Original Assignee: Micron Technology, Inc.
• Inventors: Sandhu, Gurtej S., Hudson, Guy
• Primary Examiner(s): Rosenberger, Richard A.
• Application Number:
  US08/804,526
• Time in Patent Office: 634 Days
• Field of Search: 356/138, 356/371, 356/150
• US Class Current: 356/600
• CPC Class Codes: G01B 13/22 for measuring roughness or irregularity of surfaces

Abstract

A method for monitoring surface roughness by applying a controlled amount of liquid onto a specimen surface to form a liquid protrusion. The diameter or area of the a liquid protrusion is measured and correlated to surface roughness. In an alternative embodiment, the contact angle between the specimen surface and the liquid protrusion is measured. Surface roughness is computed from the contact angle measurement and several known physical constants of the liquid and specimen surface.

Claims

1. A method for determining surface roughness of a semiconductor substrate, said method comprising the steps of:

(a) applying a controlled amount of liquid onto a surface of said semiconductor substrate to form a drop, said drop having an area and a contact angle;

(b) measuring the area of the drop; and

(c) correlating the area of the drop to roughness of said surface without determining the contact angle of the drop.

2. The method of claim 1 wherein the liquid comprises a substance that is chemically inert with respect to the surface.

3. The method of claim 2 wherein the liquid comprises glycol.

4. The method of claim 1 wherein steps (a) and (b) are performed on production wafers having integrated circuit components formed thereon.

5. The method of claim 1 wherein step (a) comprises the step of:

using a flow controller coupled to a delivery tube to apply said controlled amount of liquid onto said semiconductor substrate.

6. The method of claim 1 wherein step (b) comprises the step of:

viewing said drop with a microscope to measure said area of said drop.

7. The method of claim 1 wherein step (b) comprises the steps of:

digitally capturing an image of said drop; and

digitally processing said image to determine said area of said drop.

8. The method of claim 1 wherein step (c) comprises the step of:

determining whether said area falls within a given range.

9. A method for monitoring surface roughness comprising the steps of:

(a) applying a drop of liquid onto a specimen surface to form a drop on the surface, said drop having a diameter and a contact angle;

(b) measuring said diameter of said drop;

(c) calculating an area of said specimen surface covered by said drop; and

(d) correlating said area to roughness of said specimen surface without determining the contact angle of the drop.

10. The method of claim 9 wherein the liquid comprises a substance that is chemically inert with respect to said specimen surface.

11. The method of claim 9 wherein the liquid comprises glycol.

12. The method of claim 9 wherein steps (a) and (b) are performed on production wafers having integrated circuit components formed thereon.

13. The method of claim 9 wherein step (a) comprises the step of:

using a flow controller coupled to a delivery tube to apply said controlled amount of liquid onto said semiconductor substrate.

14. The method of claim 9 wherein step (b) comprises the step of:

viewing said drop with a microscope to measure said diameter of said drop.

15. The method of claim 9 wherein step (b) comprises the steps of:

digitally capturing an image of said drop; and

digitally processing said image to determine said diameter of said drop.

16. The method of claim 9 wherein step (c) comprises the step of:

calculating said area using a formula A=π

r², where A is said area and r is one half of said diameter.

17. The method of claim 9 wherein step (d) comprises the step of:

determining whether said area falls within a given range.

18. An apparatus for measuring surface roughness of a specimen comprising:

a support for supporting said specimen;

a liquid dispenser for applying a predetermined quantity of liquid onto a surface of said specimen to form a drop;

means for determining an area of said surface covered by said drop; and

means for correlating said area directly to roughness of said surface.

19. The apparatus of claim 18 wherein the means for determining comprises a microscope.

20. The apparatus of claim 18 wherein the means for determining comprises:

a digital camera aimed to view the drop; and

an image processor coupled to receive a digital signal from the digital camera, wherein the image processor is programmed to acquire an image of the drop, extract an edge image from the image of the drop, and compute the area of the drop from the edge image.