High frequency semiconductor wafer processing apparatus and method

• US 5,849,136 A
• Filed: 11/22/1996
• Issued: 12/15/1998
• Est. Priority Date: 10/11/1991
• Status: Expired due to Term

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Hanawa, Hiroji, Maydan, Dan, Collins, Kenneth S., Somekh, Sasson, Mintz, Donald M.
• Primary Examiner(s): DANG, THI D
• Application Number:
  US08/754,833
• Time in Patent Office: 753 Days
• Field of Search: 156/345, 118/723 E, 315/111.21, 204/298.34, 204/298.01
• US Class Current: 156/345.44
• CPC Class Codes: H01J 37/32082 Radio frequency generated discharge H01J37/32357, H01J37/32366, H01J37/32394 and H01J37/32403 take precedence
• CPC Class Codes: H01J 37/32183 Matching circuits

Abstract

A plasma process apparatus capable of operation significantly above 13.56 MHz can produce reduced self-bias voltage of the powered electrode to enable softer processes that do not damage thin layers that are increasingly becoming common in high speed and high density integrated circuits. A nonconventional match network is used to enable elimination of reflections at these higher frequencies. Automatic control of match network components enables the rf frequency to be adjusted to ignite the plasma and then to operate at a variable frequency selected to minimize process time without significant damage to the integrated circuit.

Claims

1. A plasma process apparatus comprising:

a plasma reactor having a powered electrode on which a wafer is to be placed for processing;

a single rf power supply that produces power at a single rf frequency f in the range greater than 13.56 MHz and up to 200 MHz connected to said powered electrode, said frequency f selected so as to optimize a wafer process to be carried out in said reactor.

2. A plasma process apparatus as in claim 1 further comprising a tunable matching network connecting said rf power supply to the powered electrode, said matching network being detuned so as to allow a plasma to be ignited in said reactor and means to tune said match network so as to substantially eliminate reflected power after ignition of said plasma.

3. A plasma process apparatus as in claim 1 wherein the power supply is tunable over a frequency range, thereby enabling adjustment of frequency to optimize plasma process conditions for a variety of process characteristics and to produce a negative self-bias at the powered electrode of 350 volts or less.

4. A plasma process apparatus as in claim 2 wherein said reactor is rf shielded so as to reduce rf emissions from said apparatus to 15 mV/m or less at 300 m from the apparatus.

5. A plasma process apparatus as in claim 2 wherein the frequency is in the range from 50 MHz up to 70 MHz, whereby this apparatus is used for a plasma etch process.

6. A plasma process apparatus as in claim 2 wherein the frequency is in the range from 137 MHz up to 200 MHz whereby this apparatus is used for wafer cleaning and plasma enhanced chemical vapor deposition processes.

7. A plasma process apparatus as in claim 1 further comprising means for producing within said process apparatus a magnetic field parallel to the wall that reduces desorption from interior walls of said plasma process apparatus.

8. A plasma process apparatus as in claim 7 wherein said magnetic field, at said interior walls, is in the range 1-20 Gauss.

9. A plasma process apparatus as in claim 2 further comprising:

(a) means for maintaining a plasma within the chamber; and

(b) means for selectively controlling the power at a predetermined power level at a single frequency f greater than 13.56 MHz and up to 200 MHz wherein the power is being supplied from a single power supply and the frequency f is selected to produce a power electrode negative self-bias in the range of at least 125 up to 500 volts, for a non-reactive, non-selective inert gas ion, soft plasma etch.

10. A plasma process apparatus as in claim 9 wherein the frequency f is in the range 50 MHz up to 70 MHz.

11. A plasma process apparatus as in claim 9 wherein:

(a) said tunable match network includes means for detuning the match network to produce a self-bias field at the powered electrode so that a cascade of electrons is produced that ignites said plasma; and

(b) means for tuning the match network after the plasma has been ignited to reduce reflected power.