Method of forming thin film resistors on organic surfaces
First Claim
1. A method for fabricating a thin film resistor, comprising the steps of:
- applying a tantalum nitride layer over an organic dielectric layer;
applying a metallization layer over the tantalum nitride layer;
patterning the metallization layer with a first portion of the metallization layer situated apart from a second portion of the metallization layer and both the first and second portions being at least partially situated on the tantalum nitride layer;
determining a resistance value between the first and second portions of the metallization layer;
comparing the determined resistance value with a predetermined resistance value; and
etching at least one of the first and second portions to obtain a modified resistance value between the first and second portions that is closer to the predetermined resistance value than the determined resistance value.
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Abstract
A method for fabricating a thin film resistor comprises applying a tantalum nitride layer over a dielectric layer, applying a metallization layer over the tantalum nitride layer, and patterning the metallization layer with a first portion of the metallization layer situated apart from a second portion of the metallization layer and both the first and second portions being at least partially situated on the tantalum nitride layer. In one embodiment, after patterning the metallization layer, the resistance value between the first and second portions of the metallization layer is determined and compared to a predetermined resistance value, and at least one of the first and second portions is trimmed to obtain a modified resistance value between the first and second portions that is closer to the predetermined resistance value than the determined resistance value.
202 Citations
5 Claims
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1. A method for fabricating a thin film resistor, comprising the steps of:
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applying a tantalum nitride layer over an organic dielectric layer; applying a metallization layer over the tantalum nitride layer; patterning the metallization layer with a first portion of the metallization layer situated apart from a second portion of the metallization layer and both the first and second portions being at least partially situated on the tantalum nitride layer; determining a resistance value between the first and second portions of the metallization layer; comparing the determined resistance value with a predetermined resistance value; and etching at least one of the first and second portions to obtain a modified resistance value between the first and second portions that is closer to the predetermined resistance value than the determined resistance value. - View Dependent Claims (2, 3, 4, 5)
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Specification