Method for removing etching residues and contaminants
First Claim
1. A photoresist strip and etch residue removal process comprising the steps of:
- (a) providing an etched substrate having a photoresist layer and etchant residues;
(b) disposing the substrate in a reactor for applying a gas plasma over the surface of the substrate;
(c) etching the surface of the substrate using a mixture of gases to remove the photoresist layer and alter the composition of the etchant residues so that the residues are soluble in water, wherein the etching is performed with the temperature of the substrate maintained at less than about 100 degrees Centigrade; and
(d) rinsing the substrate with deionized water.
12 Assignments
0 Petitions
Accused Products
Abstract
A gas plasma process for removing photoresist and etch residues and other contaminants involved in etching vias in integrated circuit devices is disclosed. The process involves placing the substrate having etched vias or contact holes in a suitable low bias reactor; applying to the substrate surface a mixture of gases at low bias selected from the group consisting of oxygen, nitrogen, fluorine, hydrofluorocarbon and fluorinated methane and amine gases to both remove the photoresist layer and alter the composition of the residues such that the residues are soluble in water; and rinsing the substrate with deionized water. The plasma process should be carried out at temperatures of less than about 100 degrees C to avoid mobile ion contamination problems and oxidation of the etch residues.
275 Citations
17 Claims
-
1. A photoresist strip and etch residue removal process comprising the steps of:
-
(a) providing an etched substrate having a photoresist layer and etchant residues; (b) disposing the substrate in a reactor for applying a gas plasma over the surface of the substrate; (c) etching the surface of the substrate using a mixture of gases to remove the photoresist layer and alter the composition of the etchant residues so that the residues are soluble in water, wherein the etching is performed with the temperature of the substrate maintained at less than about 100 degrees Centigrade; and (d) rinsing the substrate with deionized water. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
-
-
9. An improved method for removing photoresist and etch residues in a process of fabricating post vias and contact holes in a substrate for use in coupling interconnect layers of integrated circuit devices, the process being of the type where a photoresist layer is applied to selected portions of the substrate surface, leaving exposed portions, and a reactive etchant is applied to form vias or contact holes at the exposed portions of the substrate surface, the improvement comprising the steps of:
-
(a) disposing the substrate in a reactor for applying a gas plasma over the surface of the substrate; (b) etching the surface of the substrate with a mixture of gases to remove the photoresist layer and alter the composition of the etchant residues so the residues are soluble in water, wherein the etching is performed with the temperature of the substrate maintained at about less than 100°
C.; and(c) rinsing the substrate with deionized water. - View Dependent Claims (10, 11, 12, 13, 14, 15, 16, 17)
-
Specification