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Substrate heating equipment for use in a semiconductor fabricating apparatus

  • US 5,850,071 A
  • Filed: 08/09/1996
  • Issued: 12/15/1998
  • Est. Priority Date: 02/16/1996
  • Status: Expired due to Term
First Claim
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1. A substrate heating equipment for use in a semiconductor fabricating apparatus, comprising a heater support frame disposed within a vacuum vessel, a plurality of opposed panel heaters individually temperature controlled and disposed in a plural shelved fashion within said heater support frame, and support means for supporting a substrate to be treated between an adjacent pair of said opposed panel heaters.

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