Reduced residue hard surface cleaner
First Claim
1. A method of cleaning soil, without substantial residue remaining, from a hard surface, comprising applying to said surface an aqueous, hard surface cleaner with significantly improved residue removal and substantially reduced filming/streaking, said cleaner comprising:
- (a) about 1-50% of at least one organic solvent with a vapor pressure of at least 0.001 mm Hg at 25°
C., and mixtures of such solvents;
(b) about 0.001-2% of at least one semi-polar nonionic surfactant, said surfactant having the structure;
##STR13## wherein R1 is C5-20 alkyl, R2 and R3 are both C1-4 alkyl, ##STR14## or --(CH2)p -OH, although R2 and R3 do not have to be equal, and n is 1-5, and p is 1-6;
(c) about 0.01-2% of a buffering system which comprises ammonium or alkaline earth carbamate, wherein the total amount of semi-polar nonionic surfactant and any optional surfactants does not exceed 2%; and
(d) the remainder as substantially all water; and
(e) removing said soil and soil cleaner from said surface.
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Accused Products
Abstract
The invention provides an aqueous, hard surface cleaner with significantly improved residue removal and substantially reduced filming/streaking, said cleaner comprising:
(a) an effective amount of at least one organic solvent with a vapor pressure of at least 0.001 mm Hg at 25° C., and mixtures of such solvents;
(b) an effective amount of at least one semi-polar nonionic surfactant, said surfactant having the structure: ##STR1## wherein R1 is C5-20 alkyl, R2 and R3 are both C1-4 alkyl, ##STR2## OR --(CH2)p -OH, although R2 and R3 do not have to be equal, and n is 1-5, and p is 1-6;
(c) an effective amount of a buffering system which comprises a nitrogenous buffer which will result in a pH of greater than 6.5; and
(d) the remainder as substantially all water.
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Citations
11 Claims
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1. A method of cleaning soil, without substantial residue remaining, from a hard surface, comprising applying to said surface an aqueous, hard surface cleaner with significantly improved residue removal and substantially reduced filming/streaking, said cleaner comprising:
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(a) about 1-50% of at least one organic solvent with a vapor pressure of at least 0.001 mm Hg at 25°
C., and mixtures of such solvents;(b) about 0.001-2% of at least one semi-polar nonionic surfactant, said surfactant having the structure;
##STR13## wherein R1 is C5-20 alkyl, R2 and R3 are both C1-4 alkyl, ##STR14## or --(CH2)p -OH, although R2 and R3 do not have to be equal, and n is 1-5, and p is 1-6;(c) about 0.01-2% of a buffering system which comprises ammonium or alkaline earth carbamate, wherein the total amount of semi-polar nonionic surfactant and any optional surfactants does not exceed 2%; and (d) the remainder as substantially all water; and (e) removing said soil and soil cleaner from said surface. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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Specification