Mask supporting device and correction method therefor, and exposure apparatus and device producing method utilizing the same

• US 5,854,819 A
• Filed: 02/06/1997
• Issued: 12/29/1998
• Est. Priority Date: 02/07/1996
• Status: Expired due to Fees

• Current Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Original Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Inventors: Hara, Shinichi, Miyachi, Takeshi, Kasumi, Kazuyuki, Chiba, Yuji, Mizusawa, Nobutoshi
• Primary Examiner(s): Porta, David P.
• Application Number:
  US08/797,467
• Time in Patent Office: 691 Days
• Field of Search: 378/34, 378/35, 378/208, 250/492.1
• US Class Current: 378/34
• CPC Class Codes: G03F 7/707 Chucks, e.g. chucking or un-chucking operations or structural details
• CPC Class Codes: G03F 7/70708 being electrostatic; Electrostatically deformable vacuum chucks
• CPC Class Codes: G03F 7/70783 Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight
• CPC Class Codes: G03F 7/708 Construction of apparatus, e.g. environment aspects, hygiene aspects or materials

Abstract

There is disclosed a mask supporting device comprising a chuck mechanism for supporting a mask substrate provided with a rectangular window in which a mask pattern is formed, and a frame for reinforcing the mask substrate, and a mechanism for applying, to said frame of the mask, loads from mutually orthogonal directions. The mechanism for applying loads includes a fixed reference contacting two positions on the external periphery of the mask frame and two pressing mechanism for applying loads to the mask frame from two directions respectively opposed to the two contact positions.

Claims

1. A mask supporting device comprising:

a chuck mechanism for supporting an X-ray mask having a mask substrate provided with a rectangular window on which a mask pattern is formed and a frame for reinforcing said mask substrate; and

a mechanism for applying loads to said frame of the mask from mutually orthogonal directions in a plane parallel with a surface of the mask pattern for deforming and correcting the mask pattern.

2. A mask supporting device according to claim 1, wherein said frame has a rectangular external periphery.

3. A mask supporting device according to claim 1, wherein said frame has a circular external periphery.

4. A mask supporting device according to claim 1, further comprising a detection mechanism for detecting the applied loads.

5. A mask supporting device according to claim 4, further comprising means for adjusting the applied loads on the detection of said detection mechanism.

6. A mask supporting device according to claim 1, wherein said chuck mechanism includes a mechanical damper for clamping said frame in plural positions.

7. A mask supporting device according to claim 1, wherein said chuck mechanism includes a vacuum, magnetic or electrostatic suction mechanism.

8. A mask supporting device according to claim 1, wherein said mechanism for applying loads includes a fixed reference contacting two positions on the external periphery of the mask frame and two pressing mechanisms for applying loads to the mask frame from two directions respectively opposed to said two contact positions.

9. A mask supporting device according to claim 1, wherein said mechanism for applying loads includes four pressing mechanisms for applying loads to the mask frame, toward the center of the mask, from the directions of extensions of mutually orthogonal two lines passing through the center of the mask.

10. A mask supporting device according to claim 1, wherein said mechanism for applying loads is capable of both pushing and pulling the external periphery of the frame.

11. A mask correcting method comprising the steps of:

preparing an X-ray mask including a mask substrate provided with a rectangular window in which a mask pattern is formed, and a ring-shaped frame for reinforcing said mask substrate; and

correcting the mask pattern by applying loads to the external periphery of said frame from mutually orthogonal directions in a plane parallel with a surface of the mask pattern, for deforming and correcting the mask pattern.

12. A device producing method comprising the steps of:

correcting a mask by i) preparing an X-ray mask including a mask substrate provided with a rectangular window in which a mask pattern is formed, and a ring-shaped frame for reinforcing said mask substrate, and ii) correcting the mask pattern by applying loads to the external periphery of said frame from mutually orthogonal directions in a plane parallel with a surface of the mask pattern, for deforming and correcting the mask pattern; and

transferring the mask onto a wafer, by irradiating a mask corrected by the mask correcting step with an exposure energy.

13. An X-ray mask comprising:

a mask substrate provided with a rectangular window in which a mask pattern is formed;

a frame for reinforcing said mask substrate; and

a plurality of strain gauges provided on said mask substrate for detecting loads respectively applied to said frame of the mask from mutually orthogonal directions in a plane parallel with a surface of the mask pattern.

14. An exposure apparatus comprising:

a mask supporting device comprising, i) a chuck mechanism for supporting an X-ray mask having a mask substrate provided with a rectangular window on which a mask pattern is formed and a frame for reinforcing said mask substrate, and ii) a mechanism for applying loads to said frame of the mask from mutually orthogonal directions in a plane parallel with the surface of the mask pattern for deforming and correcting the mask pattern; and

means for irradiating the supported mask with an exposure energy.