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System and method for performing real time data acquisition, process modeling and fault detection of wafer fabrication processes

  • US 5,859,964 A
  • Filed: 10/25/1996
  • Issued: 01/12/1999
  • Est. Priority Date: 10/25/1996
  • Status: Expired due to Term
First Claim
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1. A system for detecting faults in a process tool, comprising:

  • means for receiving process event signals generated by the process tool;

    a data acquisition device configured to acquire a sample of process parameter signals during operation of the process tool;

    a model configured to receive said sample and generate a prediction error in response to said sample; and

    a fault detector in communication with said model configured to receive said sample from said data acquisition device and said process event signals from said receiving means, provide said sample to said model, receive said prediction error from said model, and use said prediction error to detect a fault in the process tool.

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