LSI mask pattern edit apparatus with contour line intensity distribution display method of resolution for lithography

• US 5,861,866 A
• Filed: 03/13/1997
• Issued: 01/19/1999
• Est. Priority Date: 03/14/1996
• Status: Expired due to Term

• Current Assignee: Kabushiki Kaisha Toshiba (Toshiba Corporation)
• Original Assignee: Kabushiki Kaisha Toshiba (Toshiba Corporation)
• Inventors: Tanaka, Satoshi, Inoue, Soichi
• Primary Examiner(s): Brier, Jeffery
• Assistant Examiner(s): Bell, Paul A.
• Application Number:
  US08/816,676
• Time in Patent Office: 677 Days
• Field of Search: 430/4, 430/5, 430/30, 430/269, 430/311, 430/322, 430/323, 430/396, 356/394, 378/34, 378/35, 702/167, 250/493.1, 345/139, 345/133
• US Class Current: 345/643
• CPC Class Codes: B82Y 10/00 Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
• CPC Class Codes: B82Y 40/00 Manufacture or treatment of nanostructures
• CPC Class Codes: G03F 7/70433 Layout for increasing efficiency or for compensating imaging errors, e.g. layout of exposure fields for reducing focus errors; Use of mask features for increasing efficiency or for compensating imaging errors
• CPC Class Codes: G03F 7/70441 Optical proximity correction [OPC]
• CPC Class Codes: G03F 7/705 Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions
• CPC Class Codes: H01J 2237/31769 Proximity effect correction
• CPC Class Codes: H01J 37/3174 Particle-beam lithography, e.g. electron beam lithography

Abstract

An intensity distribution display method of displaying a intensity distribution of electromagnetic waves or charged particle beams fallen on a sample, is characterized by comprising the step of displaying the intensity distribution with the use of contour lines defined by Ie/(1+a·n/100), where Ie is a desired intensity value, a is a constant rate (%), and n is an integer.

Claims

1. An intensity distribution display method of displaying a intensity distribution of electromagnetic waves or charged particle beams fallen on a sample, comprising the step of:

displaying the intensity distribution with the use of contour lines defined by Ie/(1+a·

n/100), where Ie is a desired intensity value, a is a constant rate (%), and n is an integer.

2. An intensity distribution display method according to claim 1, wherein the sample is exposed to have a pattern of lines thereon corresponding to a desired LSI mask pattern.

3. An intensity distribution display method according to claim 1, wherein the desired intensity value is subjected to the sensitivity of a photosensitive layer of the sample.

4. An intensity distribution display method of displaying a intensity distribution of electromagnetic waves or charged particle beams fallen on a sample, comprising the step of:

displaying an inverse of the intensity distribution with the use of contour lines spaced at a constant rate relative to a desired exposure setting value.

5. An intensity distribution display method according to claim 4, wherein the sample is exposed to have a pattern of lines thereon corresponding to a desired LSI mask pattern.

6. An intensity distribution display method according to claim 4, wherein the intensity is subjected to the sensitivity of a photosensitive layer of the sample.

7. A mask pattern edit apparatus comprising:

means for inputting and editing the position of an LSI mask pattern;

intensity distribution calculation means for determining a intensity distribution fallen through the LSI mask pattern on a photosensitive layer of a sample;

display means for displaying the mask pattern and the intensity distribution at a time; and

contour line calculation means for calculating and displaying the intensity distribution on the displaying means with the use of contour lines defined by Ie/(1+a·

n/100), where Ie is a desired intensity value, a is a constant rate (%), and n is an integer.

8. A mask pattern edit apparatus comprising:

means for inputting and editing the position of an LSI mask pattern;

intensity distribution calculation means for determining a intensity distribution fallen through the LSI mask pattern on a photosensitive layer of a sample;

display means for displaying the mask pattern and the intensity distribution at a time;

contour line calculation means for calculating and displaying the intensity distribution on the displaying means with the use of contour lines defined by Ie/(1+a·

n/100), where Ie is a desired intensity value, a is a constant rate (%), and n is an integer; and

display switching means for selectively displaying either the contour lines determined by the contour line calculation means or the contour lines assigned at equal intervals of an intensity level.

9. A mask pattern edit apparatus comprising:

means for inputting and editing the position of an LSI mask pattern;

intensity distribution calculation means for determining a intensity distribution fallen through the LSI mask pattern on a photosensitive layer of a sample;

display means for displaying the mask pattern and the intensity distribution at a time; and

contour line calculation means for calculating and displaying an inverse of the intensity distribution on the displaying means with the use of contour lines spaced at a constant rate relative to a desired exposure setting value.

10. A mask pattern edit apparatus comprising:

means for inputting and editing the position of an LSI mask pattern;

intensity distribution calculation means for determining a intensity distribution fallen through the LSI mask pattern on a photosensitive layer of a sample;

display means for displaying the mask pattern and the intensity distribution at a time;

contour line calculation means for calculating and displaying an inverse of the intensity distribution on the displaying means with the use of contour lines spaced at a constant rate relative to a desired exposure setting value; and

display switching means for selectively displaying either the contour lines determined by the contour line calculation means or the contour lines assigned at equal intervals of an intensity level.