Apparatus for the quantitative analysis of sample liquid

• US 5,869,001 A
• Filed: 10/21/1996
• Issued: 02/09/1999
• Est. Priority Date: 09/17/1993
• Status: Expired due to Fees

• Current Assignee: Roche Diagnostics GmbH (Roche Holding AG)
• Original Assignee: Boehringer Mannheim GmbH (Roche Holding AG)
• Inventors: Backhaus, Juergen, Mischler, Reinhold
• Primary Examiner(s): Warden, Jill
• Assistant Examiner(s): CARRILLO, BIBI SHARIDAN
• Application Number:
  US08/734,662
• Time in Patent Office: 841 Days
• Field of Search: 436/46, 436/34, 436/87, 436/164, 436/165, 436/169, 436/170, 436/171, 436/177, 250/339.11, 250/339.12, 356/36, 356/445, 356/446, 422/68.1, 422/82.05, 422/58, 422/60
• US Class Current: 422/82.05
• CPC Class Codes: B01L 3/5085 for multiple samples, e.g. microtitration plates
• CPC Class Codes: G01N 2001/4027 evaporation leaving a concentrated sample
• CPC Class Codes: G01N 21/3563 for analysing solids; Preparation of samples therefor
• CPC Class Codes: G01N 21/3577 for analysing liquids, e.g. polluted water
• CPC Class Codes: G01N 21/47 Scattering, i.e. diffuse reflection G01N21/25, G01N21/41 take precedence G01N21/55 takes precedence
• CPC Class Codes: G01N 2201/129 Using chemometrical methods
• CPC Class Codes: Y10T 436/112499 with sample on test slide
• CPC Class Codes: Y10T 436/25375 Liberation or purification of sample or separation of material from a sample [e.g., filtering, centrifuging, etc.]

Abstract

A method and apparatus for the quantitative analysis of sample liquids. A sample is dried and irradiated with visible and/or infrared light. Light that is diffusely or specularly reflected from the sample and sample carrier is detected. and analysed.

Claims

1. A system for quantitative analysis of a sample liquid including

a radiation source whose radiation is in a range of 300 nm to 25 μ

m, said radiation source providing a beam of incident radiation, said beam having a first width;

a sample carrier disposed opposite said radiation source, said sample carrier having at least one area for supporting a sample liquid and diffusely or specularly reflecting the incident radiation from said beam of said radiation source;

a dosing device for applying a predetermined amount of the sample liquid onto the at least one area of the sample carrier, said sample liquid drying to form a dried sample residue on said at least one area of said sample carrier, said dried sample residue having a second width which is less than said first width of said beam, such that said dried sample residue is completely covered by said beam from said radiation source;

a detection device for detecting radiation reflected from the dried sample residue;

said detection device generating output signals; and

an analyzing device coupled to said detection device for analyzing the output signals, wherein said output signals are used for the quantitative analysis of said sample liquid.

2. The system of claim 1, wherein at least a portion of the sample carrier is coated with a metal layer.

3. The system of claim 1, wherein a first surface of the sample carrier which supports the dried sample residue is transparent to said incident radiation, and wherein a second surface of the sample carrier opposite to said s surface is provided with a layer that diffusely or specularly reflects said incident radiation.

4. The system of claim 1, wherein a surface of the sample carrier has an average depth of roughness of less than 200 μ

m.

5. The system of claim 1, wherein the sample carrier has at least one depression positioned in said at least one area for holding said sample liquid therein.

6. The system of claim 1, wherein the detection device comprises at least one semiconductor detector.

7. The system of claim 1, wherein the detection device comprises an infrared microscope.

8. The system of claim 1, wherein the sample carrier has a plurality of sample application sites.

9. The system of claim 1, wherein said sample carrier comprises at least one sample site having reagents located therein.

10. The system of claim 4, wherein the average depth of roughness is 0.5 to 50 μ

m.

11. The system of claim 4, wherein the surface of the sample carrier has an average depth of roughness of less than 0.5 μ

m.