Selective chemical vapor deposition of polymers

• US 5,869,135 A
• Filed: 10/03/1997
• Issued: 02/09/1999
• Est. Priority Date: 10/03/1997
• Status: Expired due to Fees

• Current Assignee: Massachusetts Institute of Technology
• Original Assignee: Massachusetts Institute of Technology
• Inventors: Vaeth, Kathleen M., Jensen, Klavs F.
• Primary Examiner(s): Beck, Shrive
• Assistant Examiner(s): MEEKS, TIMOTHY HOWARD
• Application Number:
  US08/909,690
• Time in Patent Office: 494 Days
• Field of Search: 427/255, 427/255.6, 427/256, 427/259, 427/261, 427/287, 427/301, 427/304, 427/327
• US Class Current: 427/255.14
• CPC Class Codes: B05D 1/283 Transferring monomolecular layers or solutions of molecules adapted for forming monomolecular layers from carrying elements
• CPC Class Codes: B05D 1/60 Deposition of organic layers from vapour phase vapour phase deposition in general C23C14/00, C23C16/00
• CPC Class Codes: B82Y 10/00 Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
• CPC Class Codes: B82Y 30/00 Nanotechnology for materials or surface science, e.g. nanocomposites
• CPC Class Codes: B82Y 40/00 Manufacture or treatment of nanostructures
• CPC Class Codes: C09K 11/06 containing organic luminescent materials
• CPC Class Codes: C23C 16/04 Coating on selected surface areas, e.g. using masks
• CPC Class Codes: H10K 50/11 characterised by the electroluminescent [EL] layers
• CPC Class Codes: H10K 71/10 Deposition of organic active material
• CPC Class Codes: H10K 85/114 Poly-phenylenevinylene; Derivatives thereof

Abstract

A system for selective chemical vapor deposition of polymers onto a substrate. A substrate is provided which comprises a plurality of surface regions, wherein the surface of at least one region provides a more favorable nucleation site for at least one of a polymer or polymer precursor than at least one other region. This may be an intrinsic characteristic of the substrate or may be accomplished through surface treatment of a substrate. The substrate is subjected to chemical vapor deposition of a reactive monomer, producing a polymer coating which is substantially thicker in the regions of favorable nucleation than in the regions of unfavorable nucleation.

Claims

1. A method of selective inhibition of growth by chemical vapor deposition of a precursor polymer of poly(p-phenylene vinylene) or a poly(p-phenylene vinylene) derivative on a substrate, the method comprising surface treatment of the CVD substrate before deposition, the surface treatment adapted to inhibit nucleation of the precursor in one or more regions of the substrate without the use of plasma processing.

2. The method of claim 1, wherein the surface treatment comprises stamping self-assembled monolayers.

3. The method of claim 2, wherein the stamping is followed by solution processing to effect ion exchange on at least a portion of the substrate surface.

4. The method of claim 1, wherein the surface treatment comprises exposing the substrate surface to at least one of the group consisting of metal shavings and metal salts.

5. The method of claim 4, wherein the surface treatment comprises exposing the substrate surface to at least one of the group consisting of iron shavings, iron sulfate, copper sulfate, and silver sulfate.

6. The method of claim 1, wherein the surface treatment comprises scraping the surface with a metal tool.

7. The method of claim 1, wherein the substrate surface is selected from the group consisting of indium-tin oxide, glass, silicon, silver, gold, and aluminum.

8. A method of selective inhibition of growth by chemical vapor deposition of a precursor polymer of poly(p-phenylene vinylene) or a poly(p-phenylene vinylene) derivative on a substrate, the method comprising surface treatment of the CVD substrate before deposition, the surface treatment adapted to inhibit nucleation of the precursor in one or more regions of the substrate.

9. The method of claim 8, wherein the surface treatment comprises stamping self-assembled monolayers.

10. The method of claim 8, wherein the surface treatment comprises exposing the substrate surface to at least one of the group consisting of metal shavings and metal salts.

11. The method of claim 10, wherein the surface treatment comprises exposing the substrate surface to at least one of the group consisting of iron shavings, iron sulfate, and copper sulfate.

12. The method of claim 8, wherein the surface treatment comprises scraping the surface with a metal tool.

13. The method of claim 8, wherein the substrate surface is selected from the group consisting of indium-tin oxide, glass, silicon, silver, gold, and aluminum.

14. A method of selective enhancement of growth by chemical vapor deposition of a precursor polymer of poly(p-phenylene vinylene) or a poly(p-phenlylene vinylene) derivative on a substrate, the method comprising surface treatment of the CVD substrate before deposition, the surface treatment adapted to promote nucleation of the precursor in one or more regions of the substrate.

15. The method of claim 14, wherein the surface treatment comprises priming the substrate with an organic layer.

16. The method of claim 15, wherein the organic layer comprises COOH.

17. The method of claim 15, wherein the organic layer comprises poly(vinyl carbazole).

18. The method of claim 14, wherein the substrate surface is selected from the group consisting of indium-tin oxide, glass, silicon, silver, gold, and aluminum.

19. A method of making an electronic device comprising electroluminescent polymers, the method comprising one or more of

(i) selective enhancement of the growth by chemical vapor deposition of a precursor polymer of poly(p-phenylene vinylene) or a poly(p-phenylene vinylene) derivative on a substrate by surface treatment of the CVD substrate, the surface treatment adapted to promote nucleation of the precursor in one or more regions of the substrate, and

(ii) selective inhibition of the growth by chemical vapor deposition of a precursor polymer of poly(p-phenylene vinylene) or a poly(p-phenylene vinylene) derivative on a substrate by surface treatment of the CVD substrate, the surface treatment adapted to inhibit nucleation of the precursor in one or more regions of the substrate.

20. The method of claim 19, wherein the method further comprises a thermal conversion step adapted to transform the precursor polymer into poly(p-phenylene vinylene) or a poly(p-phenylene vinylene) derivative.

21. The method of claim 19, wherein the surface treatment comprises stamping a self-assembled monolayer.