Pressure actuated sealing diaphragm for chucks

• US 5,870,271 A
• Filed: 02/19/1997
• Issued: 02/09/1999
• Est. Priority Date: 02/19/1997
• Status: Expired due to Fees

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Herchen, Harald
• Primary Examiner(s): FLEMING, FRITZ M
• Application Number:
  US08/808,976
• Time in Patent Office: 720 Days
• Field of Search: 279/128, 279/157, 279/43.9, 279/3, 361/233, 361/234
• US Class Current: 361/234
• CPC Class Codes: H01L 21/6838 with gripping and holding devices using a vacuum; Bernoulli devices
• CPC Class Codes: H02N 13/00 Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect

Abstract

A sealing structure 20 for forming a seal around a chuck 30 used to hold a substrate 45 having a peripheral edge 50. An actuated, position-adjustable, sealing diaphragm 165 is disposed along the peripheral edge of the substrate. The diaphragm has a conformal sealing surface 170 capable of forming a seal when pressed against the peripheral edge of the substrate 45. A diaphragm actuator 175 actuates the sealing diaphragm from (i) a first non-sealing position 180 in which the conformal sealing surface of the diaphragm is spaced apart from the substrate held on the chuck to form a gap 190 therebetween, to (ii) a second sealing position 185 in which the conformal sealing surface of the diaphragm presses against, and forms a seal with, the peripheral edge of the substrate.

Claims

1. A sealing structure for forming a seal around a chuck, the sealing structure comprising:

(a) a chuck for holding a substrate having a peripheral edge;

(b) an actuated, position-adjustable, sealing diaphragm disposed along the peripheral edge of the substrate, the diaphragm having a conformal sealing surface capable of forming a seal when pressed against the peripheral edge of the substrate; and

(c) a diaphragm actuator for actuating the sealing diaphragm from (i) a first non-sealing position in which the conformal sealing surface of the diaphragm is spaced apart from the substrate held on the chuck to form a gap therebetween, to (ii) a second sealing position in which the conformal sealing surface of the diaphragm presses against, and forms a seal with, the peripheral edge of the substrate.

2. The sealing structure of claim 1, wherein the diaphragm actuator comprises an electrical, magnetic, or electromagnetic assembly.

3. The sealing structure of claim 1, wherein the diaphragm actuator comprises (i) one or more gas apertures below the position-adjustable sealing diaphragm, and (ii) a gas controller to regulate a gas pressure in the gas apertures, after the substrate is held on the chuck, to cause the sealing diaphragm to move between the non-sealing and sealing positions.

4. The sealing structure of claim 3, wherein the diaphragm actuator comprises a mass flow controller or a gas pressure regulator.

5. The sealing structure of claim 3, wherein the position adjustable sealing diaphragm comprises a compliant membrane covering the gas apertures, and wherein the gas controller comprises a gas pressure controller for adjusting a gas pressure at the gas apertures from (i) a first pressure at which the sealing member is at the non-sealing position, to (ii) a second pressure at which the compliant membrane flexes and presses its conformal surface against the peripheral edge of the substrate to form a seal without dislodging the substrate from the chuck.

6. The sealing structure of claim 5, wherein the chuck comprises grooves for holding heat transfer fluid below the substrate, and wherein the gas pressure controller adjusts the gas pressure from a first lower pressure to a second higher pressure capable of pressing the conformal surface of the sealing diaphragm against the peripheral edge of the substrate substantially without causing heat transfer fluid to leak out from the grooves.

7. The sealing structure of claim 3, wherein the sealing diaphragm comprises a membrane fabricated from a resilient and compliant material capable of conforming to the substrate to form a seal between the substrate and the chuck.

8. The sealing structure of claim 7, wherein the membrane comprises an area covering the gas apertures that is sized sufficiently large that the force exerted by the gas pressure in the gas apertures causes the membrane to form a seal with the substrate.

9. The sealing structure of claim 8, wherein the membrane comprises an area of at least about 50 cm².

10. The sealing structure of claim 7, wherein the sealing diaphragm comprises an upstanding nipple on the membrane, the nipple having a top surface comprising the conformal sealing surface.

11. The sealing structure of claim 3, wherein the sealing diaphragm comprises a flexible member having (i) a cap portion covering the gas apertures, and (ii) a bending portion held in a point, and

wherein adjustment of a gas pressure through the gas apertures causes the flexible member to bend about the point raising the cap portion to contact the substrate.

12. A gas pressure actuated sealing assembly for reducing corrosion of an electrostatic chuck in a corrosive gas environment, the chuck used to electrostatically hold a substrate having a peripheral edge, the sealing assembly comprising:

(a) a compliant flat annular membrane extending below the peripheral edge of the substrate, the membrane capping one or more gas apertures;

(b) a conformal sealing surface on the compliant membrane, the sealing surface extending continuously below the peripheral edge of the substrate; and

(c) a gas pressure controller for regulating the pressure of gas maintained in the gas apertures below the membrane at (i) a first pressure at which the compliant membrane is in a non-sealing position in which the conformal sealing surface of the compliant membrane is spaced apart from the electrostatically held substrate to form a gap therebetween, and (ii) a second pressure at which the compliant membrane is in a sealing position in which the compliant membrane flexes and presses its conformal surface against the peripheral edge of the substrate to form a seal with the peripheral edge of the electrostatically held substrate without dislodging the substrate from the chuck.

13. The sealing assembly of claim 12, wherein the chuck comprises grooves for holding heat transfer fluid below the substrate, and wherein the gas pressure controller adjusts the gas pressure from a first lower pressure to a second higher pressure capable of pressing the conformal surface of the compliant membrane against the peripheral edge of the substrate substantially without causing heat transfer fluid to leak out from the grooves.

14. The sealing assembly of claim 12, wherein the compliant membrane is fabricated from a polymer that is substantially resistant to erosion by erosive process gas.

15. The sealing assembly of claim 12, wherein the compliant membrane comprises an upstanding nipple having a top surface comprising the conformal sealing surface.

16. The sealing assembly of claim 13, wherein the compliant membrane comprises (i) a cap portion covering the gas apertures, and (ii) a bending portion held in a point, and

wherein adjustment of a gas pressure through the gas apertures causes the flexible member to bend about the point raising the cap portion to contact the substrate.

17. A corrosion-resistant electrostatic chuck assembly for holding a substrate in a process chamber containing corrosive process gas, the assembly comprising:

(a) an electrostatic chuck for electrostatically holding a substrate having a peripheral edge;

(b) a compliant annular diaphragm extending around the peripheral edge of the substrate, the diaphragm having a conformal sealing surface thereon; and

(c) at least one gas aperture below the diaphragm, wherein application of a gas pressure through the gas aperture causes the diaphragm to flex and press the conformal sealing surface of the diaphragm against the substrate.

18. The electrostatic chuck assembly of claim 17, comprising means to flow gas through the gas aperture, after the substrate is electrostatically held on the chuck, to cause the diaphragm to flex.

19. The electrostatic chuck assembly of claim 18, wherein the means to flow gas through the gas aperture comprises a gas pressure controller for adjusting a gas pressure at the gas apertures from (i) a pressure at which the diaphragm is at the non-sealing position, to (ii) a second pressure at which the diaphragm flexes and presses its conformal surface against the peripheral edge of the substrate to form a seal, without dislodging the substrate from the chuck.

20. The electrostatic chuck assembly of claim 17, wherein the sealing diaphragm is fabricated from a polymer that is substantially resistant to erosion by erosive process gas.

21. The electrostatic chuck assembly of claim 17, wherein the sealing diaphragm comprises an upstanding nipple having a top surface comprising the conformal sealing surface.

22. The electrostatic chuck assembly of claim 17, wherein the sealing diaphragm comprises (i) a cap portion covering the gas apertures, and (ii) a bending portion held in a point, and

wherein adjustment of a gas pressure through the gas apertures causes the flexible member to bend about the point raising the cap portion to contact the substrate.

23. A method of forming a seal around a chuck in a process zone, the chuck used to hold a substrate having a peripheral edge, the method comprising the steps of:

(a) positioning a gas pressure actuated sealing diaphragm along the peripheral edge of the substrate, the diaphragm capping one or more gas apertures, and the diaphragm comprising a conformal sealing surface extending continuously below the peripheral edge of the substrate; and

(b) applying a gas pressure through the gas apertures below the diaphragm to cause at least a portion of the diaphragm to move and press its conformal sealing surface against the peripheral edge of the substrate to form a seal with the substrate.

24. The method of claim 23, wherein in step (a) the sealing diaphragm comprises a compliant annular membrane covering the gas apertures, the membrane being sufficiently compliant to flex under the gas pressure exerted through the gas apertures.

25. The method of claim 23, wherein in step (a) the sealing diaphragm comprises a flexible member having a cap portion covering the gas apertures, and a bending portion held between a point, and

wherein in step (b), adjustment a gas pressure through the gas apertures causes the flexible member to bend about the point raising the cap portion toward the substrate to cause the conformal sealing surface to press against and form a seal with the substrate.

26. The method of claim 23, further comprising the step of adjusting the gas pressure applied through the gas apertures to lower the diaphragm upon completion of processing of the substrate.

27. A method of enhancing the erosion resistance of an electrostatic chuck in an erosive environment, the chuck comprising (i) an insulated electrode capable of electrostatically holding a substrate, and (ii) a support for supporting the insulated electrode, the support comprising gas apertures for providing a gas pressure, the method comprising the steps of:

(a) positioning an annular sealing diaphragm covering the gas aperture holes on the support so that the diaphragm is circumferentially disposed about the insulated electrode, the sealing diaphragm having a conformal sealing surface capable of forming a seal with a substrate;

(b) placing a substrate on the insulated electrode and applying a voltage to the insulated electrode to electrostatically attract the substrate onto the insulated electrode so that a peripheral edge of the substrate is positioned above the sealing diaphragm to form a gap therebetween; and

(c) regulating a pressure of gas through the gas apertures below the sealing diaphragm to cause the conformal sealing surface of the diaphragm to press against the peripheral edge of the substrate forming a seal that reduces exposure of the electrostatic chuck to the erosive environment.