Stabilized multi-layered structure of color filters on a silicon chip and a method for making
First Claim
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1. A photo chromatic filtering system comprising:
- an electroactive substrate; and
a multi-layered structure of contiguous light filters respectively positioned on at least a portion of the electroactive substrate, wherein each light filter includes a phenolic resin and can respectively filter light having a first predetermined wavelength, a second predetermined wavelength, and a third predetermined wavelength, and wherein at least one of the contiguous light filters has been patterned, reacted with a polyfunctional organosilicon material, and hard baked such that the reacted light filter is of itself a transparent cross-linked stabilizing layer.
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Abstract
There is provided, a stabilized multi-layered colored filter structure useful in a digital color camera and method for making same. The method involves effecting reaction between a polyfunctional organosilicon material, such as a hexaorganosilazane with at least one phenolic resist containing an organic dye color forming filter, in a multi-layered structure of color filters on a silicon chip.
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Citations
17 Claims
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1. A photo chromatic filtering system comprising:
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an electroactive substrate; and a multi-layered structure of contiguous light filters respectively positioned on at least a portion of the electroactive substrate, wherein each light filter includes a phenolic resin and can respectively filter light having a first predetermined wavelength, a second predetermined wavelength, and a third predetermined wavelength, and wherein at least one of the contiguous light filters has been patterned, reacted with a polyfunctional organosilicon material, and hard baked such that the reacted light filter is of itself a transparent cross-linked stabilizing layer. - View Dependent Claims (2, 3)
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4. A photo chromatic filtering system comprising:
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an electroactive substrate; a first stable transparent resin permanently formed on a portion of said substrate to filter light having a first predetermined wavelength; a second stable transparent resin permanently formed on a portion of said substrate and a portion of said first stable transparent resin to filter light having a second predetermined wavelength; and a third stable transparent resin permanently formed on a portion of said substrate and a portion of said first stable transparent resin and a portion of said second transparent resin to filter light having a third predetermined wavelength, wherein at least one of the transparent resins was patterned, reacted with a polyfunctional organosilicon material, and hard baked such that the reacted resin is of itself a cross-linked stabilizing layer to render each transparent resin a stable transparent resin.
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5. A digital color camera having a charge-coupled device and a color filter exhibiting improved stability, which color filter comprises an electroactive silicon chip having solvent coated multi-contiguous color resist layers, wherein at least one of the solvent coated color resist layers had been patterned, reacted with a polyfunctional organosilicon material, and hard baked such that the reacted color resist layer is of itself a transparent stabilizing layer.
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6. A method for making a stabilized multi-layered structure of color filters on a silicon substrate comprising the steps of:
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(1) (a) initially exposing a surface of the silicon substrate with an organodisilazane to render it hydrophobic, (b) applying a phenolic resist having a first color filter onto the surface of the silicon substrate and thereafter patterning and baking the applied phenolic resist; (2) (c) exposing the surface of the treated silicon substrate with an organodisilazane to render it hydrophobic; (d) applying a resist having a second color filter onto the treated silicon substrate, exposing the applied resist to pattern it, and thereafter developing the patterned resist, (e) treating the surface of the patterned resist with a hexaorganocyclotrisilazane, and (f) thereafter rinsing the treated silicon substrate with an organic resist solvent followed by baking, (3) (g) applying a resist having a third color filter onto the resulting treated silicon substrate, (h) and thereafter, exposing, developing and baking the applied resist. - View Dependent Claims (7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
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Specification