Low work function electrode

• US 5,874,039 A
• Filed: 09/22/1997
• Issued: 02/23/1999
• Est. Priority Date: 09/22/1997
• Status: Expired due to Fees

• Current Assignee: Borealis Technical Limited (Borealis Exploration Ltd.)
• Original Assignee: Borealis Technical Limited (Borealis Exploration Ltd.)
• Inventors: Edelson, Jonathan Sidney
• Primary Examiner(s): Bell, Bruce F.
• Application Number:
  US08/935,196
• Time in Patent Office: 519 Days
• Field of Search: 313/310, 313/311, 313/498, 313/503, 313/504, 313/505, 204/290 R, 204/290 F, 204/282, 204/403, 204/418, 427/77, 427/78
• US Class Current: 313/310
• CPC Class Codes: F25B 2321/003 by using thermionic electron cooling effects
• CPC Class Codes: H01J 1/02 Main electrodes
• CPC Class Codes: H01J 1/14 characterised by the material

Abstract

A substrate is coated with a compound comprised of a cation completed by a heterocyclic multidentate ligand, which provides a surface having a low work-function and facilitates the emission of electrons.

Claims

1. A low work function electrode, comprising a substrate coated with a thin layer of a compound comprising cations completed by a heterocyclic multidentate ligand coated upon said substrate.

2. The low work function electrode of claim 1 wherein said layer of a compound is a monolayer.

3. The low work function electrode of claim 1 wherein said layer of a compound is substantially a single molecular layer.

4. The low work function electrode of claim 1 wherein said cation is a cationic form of a metal.

5. The low work function electrode of claim 1 wherein said cation is a cationic form of a metal chosen from the group consisting of alkali metals, alkaline earth metals, lanthanides, and actinides.

6. The low work function electrode of claim 1 wherein said cation is a cationic form of a transition metal.

7. The low work function electrode of claim 1 wherein said heterocyclic multidentate ligand is chosen from the group consisting of crown-ethers, cryptands, aza-crown-ethers, cyclic-silicones, and thio-crown-ethers.

8. The low work function electrode of claim 1 wherein said heterocyclic multidentate ligand is chosen from the group consisting of 15-Crown-5, 18-Crown-6, Cryptand 2.2.2! and hexamethyl hexacyclen.

9. The low work function electrode of claim 1 wherein said substrate is composed of a material selected from the group consisting of quartz, glass, silicon, silica sapphire and diamond.

10. The low work function electrode of claim 1 wherein said substrate is composed of a material selected from the group consisting of polycarbonate, polystyrene, polypropylene and polyethylene.

11. The low work function electrode of claim 1 wherein said compound is an electride or alkalide.

12. A vacuum thermionic device selected from the group consisting of vacuum diode heat pumps, vacuum diode thermionic converters, photoelectric converters, vacuum electronic devices, flat panel displays, integrated vacuum microcircuits, and vacuum microelectronic mechanical systems, in which an electrode comprising a substrate coated with a thin layer of a compound comprising cations complexed by a heterocyclic multidentate ligand coated upon said substrate forms part of said vacuum thermionic device.

13. The vacuum thermionic device of claim 12 wherein said cation is a cationic form of a metal.

14. The vacuum thermionic device of claim 12 wherein said cation is a cationic form of a metal chosen from the group consisting of alkali metals, alkaline earth metals, lanthanides, and actinides.

15. The vacuum thermionic device of claim 12 wherein said cation is a cationic form of a transition metal.

16. The vacuum thermionic device of claim 12 wherein said heterocyclic multidentate ligand is chosen from the group consisting of crown-ethers, cryptands, aza-crown-ethers, cyclic-silicones, and thio-crown-ethers.

17. The vacuum thermionic device of claim 12 wherein said heterocyclic multidentate ligand is chosen from the group consisting of 15-Crown-5, 18-Crown-6, Cryptand 2.2.2! and hexamethyl hexacyclen.

18. The vacuum thermionic device of claim 12 wherein said layer of a compound is a monolayer.

19. The vacuum thermionic device of claim 12 wherein said substrate is composed of a material selected from the group consisting of quartz, glass, silicon, silica sapphire and diamond.

20. The vacuum thermionic device of claim 12 wherein said substrate is composed of a material selected from the group consisting of polycarbonate, polystyrene, polypropylene and polyethylene.

21. The vacuum thermionic device of claim 12 wherein said compound is an electride or alkalide.

22. A method for making a low work function electrode comprising the steps of:

a) providing a substrate,

b) forming a layer of a heterocyclic multidentate ligand on the surface of said substrate,

c) providing a source of cations,

d) causing said cations to be complexed by said layer of a heterocyclic multidentate ligand.

23. The method of claim 22 in which the step of forming said layer of ligand comprises the step of:

depositing said layer by vacuum deposition means.

24. The method of claim 22 in which the step of forming said layer of ligand comprises the step of:

depositing said layer by solution deposition means.

25. The method of claim 22 in which said source of cations is a metal, an alloy or a non-metal.

26. The method of claim 22 in which the step of causing said cations to be complexed by said ligand comprises reacting said cations and said ligand, said reaction occurring in a solid state.