Method for treating gas containing organohalogen compounds, and catalyst for decomposing the organohalogen compounds

• US 5,877,391 A
• Filed: 03/04/1997
• Issued: 03/02/1999
• Est. Priority Date: 03/05/1996
• Status: Expired due to Fees

• Current Assignee: Hitachi, Ltd.
• Original Assignee: Hitachi, Ltd.
• Inventors: Ikeda, Shinzo, Kato, Akira, Yasuda, Takeshi, Arato, Toshiaki, Tamata, Shin, Kanno, Shuichi, Yamashita, Hisao, Azuhata, Shigeru, Kawagoshi, Hiroshi
• Primary Examiner(s): Straub, Gary P.
• Assistant Examiner(s): NAVE, EILEEN ENAD
• Application Number:
  US08/811,512
• Time in Patent Office: 728 Days
• Field of Search: 588/206, 588/205, 588/213, 423/240 R, 423/240 S, 423/245.3
• US Class Current: 588/316
• CPC Class Codes: B01D 2255/20707 Titanium
• CPC Class Codes: B01D 2255/20776 Tungsten
• CPC Class Codes: B01D 53/8662 Organic halogen compounds
• CPC Class Codes: B01J 23/30 Tungsten

Abstract

A method for treating a gas flow containing organohalogen compounds including the steps of contacting the gas flow with a catalyst at a temperature below 500° C. in the presence of an effective amount of steam, wherein the catalyst contains titania, tungsten oxide, and silica, the Ti and W are present in the range of 20-95 mol % Ti and 5-80 mol % W based on Ti and W, and the amount of silica is in the range of 0.5-15% by weight silica to 100% by weight titania. Accordingly, the organohalogen compound can be decomposed effectively to carbon monoxide, carbon dioxide, and hydrogen halide.

Claims

1. A method for treating gas containing organohalogen compounds, comprising the step of:

making a catalyst, containing titania and tungsten oxide, and contacting said catalyst with the gas containing an organohalogen compound at a temperature lower than 500°

C. in the presence of steam to decompose the organohalogen compound into carbon monoxide, carbon dioxide, and hydrogen halides, wherein

said catalyst contains titania, silica, and tungsten oxide, and the surface of titania in said catalyst is coated with porous layers made of silica and tungsten oxide,

content of silica in said catalyst is approximately 0.5-15 parts by weight to 100 parts by weight titania, and

the Ti and W are present in the amount of 20 mol %-95 mol % Ti and 80 mol %-5 mol % W based on Ti and W.

2. A method for treating gas containing an organohalogen compound as claims in claim 1, wherein

the surface of titania in said catalyst is coated with a porous layer made of silica, and

surface of said porous layer made of silica is coated with a porous layer made of tungsten oxide.

3. A method for treating gas containing an organohalogen compound as claimed in claim 1, wherein

the surface of titania in said catalyst is coated with a porous layer made of tungsten oxide, and

surface of said porous layer made of tungsten oxide is coated with a porous layer made of silica.

4. A method for treating gas containing an organohalogen compound is claimed in claim 2, wherein

said catalyst is prepared by a method comprising the steps of:

impregnating a solution containing silicon into said catalyst from the surface of titania particles,

calcining the impregnating catalyst,

subsequently impregnating a solution containing tungsten into said catalyst, and

calcining the impregnated catalyst.

5. A method for treating gas containing an organohalogen compound as claimed in claim 3, wherein

said catalyst is prepared by a method comprising the steps of:

impregnating a solution containing tungsten into said catalyst from the surface of titania particles,

calcining the impregnated catalyst,

subsequently impregnating a solution containing silicon into said catalyst, and

calcining the impregnated catalyst.

6. A method for treating gas containing an organohalogen compound as claimed in claim 2, wherein

the content of silica in said catalyst is approximately 0.5 to less than 2 parts by weight to 100 parts by weight titania.

7. A method for treating gas containing an organohalogen compound as claimed in claim 3, wherein

the content of silica in said catalyst is approximately 2-15 parts by weight to 100 parts by weight titania.

8. A method for treating gas containing an organohalogen compound as claimed in claim 1, wherein

the content of silica in said catalyst is approximately 0.5 to less than 2 parts by weight to 100 parts by weight titania, and

a particle diameter of said titania particle is in the range of 2-4 mm.

9. A method for treating gas containing an organohalogen compound as claimed in claim 1, wherein

the content of silica in said catalyst is approximately 2-15 parts by weight to 100 parts by weight titania, and

a particle of said titania particle is in the range of 0.5-1 mm.

10. A method for treating gas containing an organohalogen compound as claimed in claim 1, wherein

said catalyst contains at least one element selected from the group consisting of S, P, Mo, and V, and

a content of respective of the elements is in the range of 0.001-10 mol % based on Ti.