Trench random access memory cell and method of formation
First Claim
1. A method for forming a memory cell comprising the steps of:
- providing a substrate, the substrate having a top surface segmented into a first top surface region, a second top surface region, a third top surface region, a fourth top surface region, a fifth top surface region, and a sixth top surface region, the substrate being made of a single crystalline semiconductive material;
forming a first transistor from the first top surface region, the first transistor having a substantially vertical current flow through a first channel region that is formed within the single crystalline semiconductive material of the substrate;
forming a second transistor from the second top surface region, the second transistor having a substantially vertical current flow through a second channel region that is formed within the single crystalline semiconductive material of the substrate;
forming a third transistor from the third top surface region, the third transistor having a substantially vertical current flow through a third channel region that is formed within the single crystalline semiconductive material of the substrate;
forming a fourth transistor from the fourth top surface region, the fourth transistor having a substantially vertical current flow through a fourth channel region that is formed within the single crystalline semiconductive material of the substrate;
forming a fifth transistor from the fifth top surface region, the fifth transistor having a substantially vertical current flow through a fifth channel region that is formed within the single crystalline semiconductive material of the substrate; and
forming a sixth transistor from the sixth top surface region, the sixth transistor having a substantially vertical current flow through a sixth channel region that is formed within the single crystalline semiconductive material of the substrate,wherein the first through sixth vertical transistors are intercoupled to form the memory cell which retains a binary value.
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Accused Products
Abstract
A method for forming a random access memory cell within four separate trench regions (106, 108, 110, and 112). One half of the memory cell has a first N-type transistor, which is a latch transistor (500), has a current electrode (101), a current electrode (126), and a gate electrode (114). A second N-type transistor, which is a word-line select transistor (504), has a first current electrode (101), a second current electrode (128), and a gate electrode (116). A P-channel pull up transistor (502) has a first current electrode (103), a second current electrode (124), and a gate electrode (114). The coupling of the electrodes (101 and 103) form a storage node of the one half of the memory cell which is contacted electrically by a conductive contact (140).
194 Citations
50 Claims
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1. A method for forming a memory cell comprising the steps of:
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providing a substrate, the substrate having a top surface segmented into a first top surface region, a second top surface region, a third top surface region, a fourth top surface region, a fifth top surface region, and a sixth top surface region, the substrate being made of a single crystalline semiconductive material; forming a first transistor from the first top surface region, the first transistor having a substantially vertical current flow through a first channel region that is formed within the single crystalline semiconductive material of the substrate; forming a second transistor from the second top surface region, the second transistor having a substantially vertical current flow through a second channel region that is formed within the single crystalline semiconductive material of the substrate; forming a third transistor from the third top surface region, the third transistor having a substantially vertical current flow through a third channel region that is formed within the single crystalline semiconductive material of the substrate; forming a fourth transistor from the fourth top surface region, the fourth transistor having a substantially vertical current flow through a fourth channel region that is formed within the single crystalline semiconductive material of the substrate; forming a fifth transistor from the fifth top surface region, the fifth transistor having a substantially vertical current flow through a fifth channel region that is formed within the single crystalline semiconductive material of the substrate; and forming a sixth transistor from the sixth top surface region, the sixth transistor having a substantially vertical current flow through a sixth channel region that is formed within the single crystalline semiconductive material of the substrate, wherein the first through sixth vertical transistors are intercoupled to form the memory cell which retains a binary value. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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16. A method for forming a random access memory comprising the steps of:
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providing a substrate made of single crystalline material, the substrate having a top surface; forming two N-type select transistors within the single crystalline material of the substrate wherein each of the two N-type select transistors have a vertical current flow through a vertically-oriented channel region, each of the two N-type select transistors being formed substantially below the top surface of the substrate and being electrically coupled to allow for reading of both a bit value and a complementary bit value from the random access memory; forming two N-type latch transistors within the single crystalline material of the substrate wherein each of the two N-type latch transistors have a vertical current flow through a vertically-oriented channel region, each of the two N-type latch transistors being formed substantially below the top surface of the substrate and being electrically coupled as part of a circular-coupled pair of inverters wherein the circular-coupled pair of inverters is used to store the bit value and the complementary bit value; and forming two P-type pull-up transistors within the single crystalline material of the substrate wherein each of the two P-type pull-up transistors have a vertical current flow through a vertically-oriented channel region, each of the two P-type pull-up transistors being formed substantially below the top surface of the substrate and being electrically coupled as part of the circular-coupled pair of inverters wherein the circular-coupled pair of inverters is used to store the bit value and the complementary bit value, one of the two P-type pull-up transistors and one of the N-type latch transistors being formed together in a trench, where the trench has a contiguous sidewall periphery made of the single crystalline material from the substrate and where a first portion of this contiguous sidewall periphery is used to form the one of the two P-type pull-up transistors and a second portion of the contiguous sidewall periphery is used to form the one of the two N-type latch transistors. - View Dependent Claims (17, 18, 19, 20, 21, 22, 23)
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24. A method for forming a memory cell comprising the steps of:
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providing a substrate; forming a first trench region within the substrate, the first trench region defining a first semiconductor substrate sidewall portion and a second semiconductor sidewall portion wherein the first semiconductor sidewall portion is opposite the second semiconductor sidewall portion, the first trench region being used to form a first N-channel transistor within the first semiconductor substrate sidewall portion and a first P-channel transistor of the memory cell within the second semiconductor substrate sidewall portion; forming a second trench region within the substrate, the second trench region defining a third semiconductor substrate sidewall portion and a fourth semiconductor sidewall portion wherein the third semiconductor sidewall portion is opposite the fourth semiconductor sidewall portion, the second trench region being used to form a second N-channel transistor within the third semiconductor substrate sidewall portion and a second P-channel transistor of the memory cell within the fourth semiconductor substrate sidewall portion; forming a third trench region within the substrate, the third trench region being used to form a third N-channel transistor of the memory cell; forming a fourth trench region within the substrate, the fourth trench region being used to form a fourth N-channel transistor of the memory cell; and electrically intercoupling the first N-channel transistor, the second N-channel transistor, the third N-channel transistor, the fourth N-channel transistor, the first P-channel transistor, and the second P-channel transistor to form the memory cell which stores a binary value of information. - View Dependent Claims (25, 26, 27, 28, 29, 30, 31)
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32. A method for forming a portion of a memory cell comprising the steps of:
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providing a substrate; forming a first trench region within the substrate, the first trench region having a sidewall, a top portion, a bottom portion, a first half of the first trench region, and a second half of the first trench region; forming a first N-type current electrode at the bottom portion of the first trench region; forming a second N-type current electrode at the top portion of the first trench region and adjacent the first half of the first trench region wherein a first channel region lies between the first N-type current electrode and the second N-type current electrode; forming a first annular sidewall spacer within the first trench region and laterally adjacent the sidewall of the first trench region, the first annular sidewall spacer controlling a current flow through the first channel region; forming a first P-type current electrode adjacent and in electrical contact with the first N-type current electrode wherein the first P-type current electrode is located at the bottom portion of the first trench region; forming a second P-type current electrode at the top portion of the first trench region and adjacent the second half of the first trench region, the second P-type current electrode being isolated from the second N-type current electrode by the first trench region, wherein a second channel region lies between the first P-type current electrode and the second P-type current electrode where the second channel region has a current flow controlled by the first annular sidewall spacer; forming a second trench region within the substrate, the second trench region having a sidewall, a top portion, a bottom portion, a first half of the second trench region, and a second half of the second trench region, the second trench region being formed so that the first N-type current electrode is adjacent the bottom portion of the second trench region; forming a third N-type current electrode at the top portion of the second trench region and within the first half of the second trench region, a third channel region being defined adjacent the sidewall of the second trench region and between the first N-type current electrode and the third N-type current electrode; and forming a second annular sidewall spacer adjacent the sidewall of the second trench region wherein the second sidewall spacer controls a current flow through the third channel region. - View Dependent Claims (33, 34, 35, 36, 37, 38, 39, 40, 41)
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42. A method for forming an SRAM memory cell circuit, the method comprising:
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providing a substrate having a top surface; forming an N-type select transistor having a vertical channel region which is designed to generate vertical transistor current flow through a first single-crystalline silicon-containing region in a direction substantially perpendicular to the top surface of the substrate; forming an N-type latch transistor having a vertical channel region which is designed to generate vertical transistor current flow through a second single-crystalline silicon-containing region in a direction substantially perpendicular to the top surface of the substrate; and forming a P-type pull-up device having a vertical channel region which is designed to generate vertical device current flow through a third single-crystalline silicon-containing region in a direction substantially perpendicular to the top surface of the substrate, wherein the P-type pull-up device, the N-type latch transistor, and the N-type select transistor are coupled together at a common circuit node, the P channel transistor located entirely between the N-type latch transistor and the N-type select transistor. - View Dependent Claims (43, 44, 45, 46)
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47. A method for forming a memory cell circuit, the method comprising the steps of:
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providing a substrate having a plurality of trenches in the substrate to define a plurality of sidewalls of the substrate; forming a first N-type transistor from a first sidewall of the substrate; forming a second N-type transistor from a second sidewall of the substrate; forming a first P-type transistor from a third sidewall of the substrate; and forming a doped PN junction node within the substrate to which at least two of the first N-type transistor, second N-type transistor, and the P-type transistor are coupled. - View Dependent Claims (48)
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49. A method for forming a memory cell, the method comprising the steps of:
forming six transistors within a single-crystalline contiguous substrate to form the memory cell wherein each of the six transistors is a vertical MOS transistor having a channel region formed within the an outer periphery of a trench region formed within the single-crystalline contiguous substrate and wherein both the source and drain for each transistor in the six transistors are also formed within the single-crystalline contiguous substrate. - View Dependent Claims (50)
Specification