Method of making static random access memory cell having a trench field plate for increased capacitance
First Claim
1. A method of manufacturing a memory cell having a field capacitor between a first storage node and a second storage node, the memory cell including first and second pull down transistors formed on a semiconductor substrate, the method comprising:
- forming an isolation trench in the semiconductor substrate at a location between the first and second pull down transistors, the location being proximate the first storage node;
providing a liner within the isolation trench;
anisotropically etching the liner to remove the liner from a bottom of the trench; and
depositing a conductive material in the trench to substantially fill the trench.
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0 Petitions
Accused Products
Abstract
A static random access memory (SRAM) cell having increased cell capacitance at the storage nodes utilizes a capacitive structure disposed in a trench. The capacitive structure includes an oxide liner disposed underneath a polysilicon or tungsten plug. The polysilicon plugs are each isolated from the drains of lateral transistors associated with the SRAM cell. The capacitive structure is provided between first and second N-channel pull down transistors associated with the SRAM cell. The polysilicon plug can be provided during the formation of local interconnects for the cell. The polysilicon material or plug can be coupled to the semiconductor substrate.
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Citations
20 Claims
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1. A method of manufacturing a memory cell having a field capacitor between a first storage node and a second storage node, the memory cell including first and second pull down transistors formed on a semiconductor substrate, the method comprising:
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forming an isolation trench in the semiconductor substrate at a location between the first and second pull down transistors, the location being proximate the first storage node; providing a liner within the isolation trench; anisotropically etching the liner to remove the liner from a bottom of the trench; and depositing a conductive material in the trench to substantially fill the trench. - View Dependent Claims (2, 3, 4)
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5. A method of manufacturing a memory cell having a field capacitor between a first storage node and a second storage node, the memory cell including a first pull down transistor and a second pull down transistors formed on a substrate, the method comprising:
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removing a trench dielectric in a trench separating the first pull down transistor and the second pull down transistor; providing an etch stop layer, the etch stop layer lining a sidewall of the trench; providing an insulating layer over the first pull down transistor and the second pull down transistor; selectively removing the insulating layer from between the first pull down transistor and the second pull down transistor; anisotropically etching the insulating layer to remove the insulating layer from a bottom of the trench; and depositing a conductive material in the trench, the conductive material substantially filling the trench. - View Dependent Claims (6, 7, 8, 9, 10)
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11. A method of forming a capacitive structure in a memory cell at a location between two transistors in a semiconductor substrate, the method comprising:
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forming a trench in the substrate at the location; depositing an insulating layer over the substrate and within the trench; anisotropically etching the insulating layer from a bottom of the trench; filling the trench with a conductive material; and etching the insulating layer to remove the insulating layer from the substrate, whereby a capacitive structure is formed between the two transistors. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18, 19, 20)
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Specification