Method of making static random access memory cell having a trench field plate for increased capacitance

• US 5,879,980 A
• Filed: 03/24/1997
• Issued: 03/09/1999
• Est. Priority Date: 03/24/1997
• Status: Expired due to Term

• Current Assignee: GlobalFoundries, Inc.
• Original Assignee: Advanced Micro Devices, Inc.
• Inventors: Selcuk, Asim A., Lee, Raymond T.
• Primary Examiner(s): CHAUDHARI, CHANDRA P
• Application Number:
  US08/823,817
• Time in Patent Office: 715 Days
• Field of Search: 438/238, 438/239, 438/241, 438/386, 438/430, 438/454
• US Class Current: 438/238
• CPC Class Codes: H10B 10/00 Static random access memory [SRAM] devices
• CPC Class Codes: H10B 10/12 comprising a MOSFET load element

Abstract

A static random access memory (SRAM) cell having increased cell capacitance at the storage nodes utilizes a capacitive structure disposed in a trench. The capacitive structure includes an oxide liner disposed underneath a polysilicon or tungsten plug. The polysilicon plugs are each isolated from the drains of lateral transistors associated with the SRAM cell. The capacitive structure is provided between first and second N-channel pull down transistors associated with the SRAM cell. The polysilicon plug can be provided during the formation of local interconnects for the cell. The polysilicon material or plug can be coupled to the semiconductor substrate.

Claims

1. A method of manufacturing a memory cell having a field capacitor between a first storage node and a second storage node, the memory cell including first and second pull down transistors formed on a semiconductor substrate, the method comprising:

forming an isolation trench in the semiconductor substrate at a location between the first and second pull down transistors, the location being proximate the first storage node;

providing a liner within the isolation trench;

anisotropically etching the liner to remove the liner from a bottom of the trench; and

depositing a conductive material in the trench to substantially fill the trench.

2. The method of claim 1 wherein the forming step includes:

etching the isolation trench to remove an oxide material from the isolation trench.

3. The method of claim 1 wherein the liner is an etch stop layer.

4. The method of claim 1 wherein the providing step includes growing an oxide material on a side wall of the trench.

5. A method of manufacturing a memory cell having a field capacitor between a first storage node and a second storage node, the memory cell including a first pull down transistor and a second pull down transistors formed on a substrate, the method comprising:

removing a trench dielectric in a trench separating the first pull down transistor and the second pull down transistor;

providing an etch stop layer, the etch stop layer lining a sidewall of the trench;

providing an insulating layer over the first pull down transistor and the second pull down transistor;

selectively removing the insulating layer from between the first pull down transistor and the second pull down transistor;

anisotropically etching the insulating layer to remove the insulating layer from a bottom of the trench; and

depositing a conductive material in the trench, the conductive material substantially filling the trench.

6. The method of claim 5 wherein the selectively removing step is performed by etching during a local interconnect etching step.

7. The method of claim 5 wherein the etch stop layer is a silicon nitride layer.

8. The method of claim 5 wherein the conductive material is doped polysilicon or tungsten.

9. The method of claim 8 wherein the trench is 0.3 microns deep.

10. The method of claim 8 wherein the etch stop layer is silicon nitride.

11. A method of forming a capacitive structure in a memory cell at a location between two transistors in a semiconductor substrate, the method comprising:

forming a trench in the substrate at the location;

depositing an insulating layer over the substrate and within the trench;

anisotropically etching the insulating layer from a bottom of the trench;

filling the trench with a conductive material; and

etching the insulating layer to remove the insulating layer from the substrate, whereby a capacitive structure is formed between the two transistors.

12. The method of claim 11, wherein the two transistors are formed on the substrate after said forming a trench step.

13. The method of claim 11, wherein the capacitive structure is a field capacitive structure.

14. The method of claim 11, wherein the capacitive structure is a biased capacitive structure.

15. The method of claim 11, wherein said forming a trench includes depositing a buffer oxide layer.

16. The method of claim 15, wherein said forming a trench includes depositing a barrier layer over the buffer oxide layer.

17. The method of claim 16, wherein said forming a trench includes etching a portion of the buffer oxide layer from the trench.

18. The method of claim 11, wherein said filling the trench is done during a local interconnect process.

19. The method of claim 11, wherein the conductive material is tungsten.

20. The method of claim 11, wherein the conductive material is polysilicon.