Gas injection slit nozzle for a plasma process reactor
First Claim
1. A plasma reactor comprising:
- a reactor chamber having a sidewall;
a pedestal for holding a wafer to be processed; and
a gas injection system, comprising,plural gas supplies, each containing at least one process gas,a gas distribution apparatus disposed in said chamber sidewall, said gas distribution apparatus comprising plural gas distribution nozzles each with an annular slotted aperture facing an interior of the chamber, andplural gas feed lines wherein ones of the gas distribution nozzles are connected to ones of the gas supplies by ones of the gas feed lines.
3 Assignments
0 Petitions
Accused Products
Abstract
A gas injection system for injecting gases into a plasma reactor having a vacuum chamber with a sidewall, a pedestal for holding a semiconductor wafer to be processed, and a RF power applicator for applying RF power into the chamber. The gas injection system includes at least one gas supply containing gas, a gas distribution apparatus which has at least one slotted aperture facing the interior of the chamber, and one or more gas feed lines connecting the gas supply or supplies to the gas distribution apparatus. A preferred embodiment of a radial gas distribution apparatus in accordance with the present invention is disposed in the chamber sidewall and includes plural gas distribution nozzles each with a slotted aperture facing an interior of the chamber. Gas feed lines are employed to respectively connect each gas distribution nozzle to separate ones of the gas supplies.
-
Citations
30 Claims
-
1. A plasma reactor comprising:
-
a reactor chamber having a sidewall; a pedestal for holding a wafer to be processed; and a gas injection system, comprising, plural gas supplies, each containing at least one process gas, a gas distribution apparatus disposed in said chamber sidewall, said gas distribution apparatus comprising plural gas distribution nozzles each with an annular slotted aperture facing an interior of the chamber, and plural gas feed lines wherein ones of the gas distribution nozzles are connected to ones of the gas supplies by ones of the gas feed lines. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24)
-
-
25. A plasma reactor comprising:
-
a reactor chamber having a sidewall; a pedestal for holding a wafer to be processed; a gas injection system, comprising, a gas supply containing at least one process gas, a gas distribution apparatus disposed in said chamber sidewall, said gas distribution apparatus comprising plural gas distribution nozzles each with an annular slotted aperture facing an interior of the chamber, and plural gas feed lines wherein each one of the gas distribution nozzles is connected to the gas supply by a one of the gas feed lines. - View Dependent Claims (26, 27, 28)
-
-
29. In a plasma reactor comprising a reactor chamber having a sidewall, a pedestal for holding a wafer to be processes, and a gas injection system comprising plural gas supplies and a gas distribution apparatus having plural distribution nozzles each with an annular slotted aperture facing an interior of the chamber ones of which are connected to ones of the plural gas supplies, a method of employing the gas injection system comprising the step of:
providing a gas flow from each of the gas distribution nozzles having said annular slotted aperture, said gas flow capable of being at a different flow rate for each of the nozzles.
-
30. In a plasma reactor comprising a reactor chamber having a sidewall, a pedestal for holding a wafer to be processes, and a gas injection system comprising plural gas supplies and a gas distribution apparatus having plural distribution nozzles each with an annular slotted aperture facing an interior of the chamber ones of which are connected to ones of the plural gas supplies, a method of employing the gas injection system comprising the step of:
emitting a gas from each of the gas distribution nozzles having said annular slotted aperture, said gas capable of being one of (I) a different gaseous species, and (ii) a different mixture of gaseous species, for each of the nozzles.
Specification