Method for detecting etching endpoint, and etching apparatus and etching system using the method thereof
First Claim
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1. A method for detecting an etching endpoint, comprising steps of:
- receiving plasma light generated during a plasma etching process;
producing time series data including a plurality of data values of a signal corresponding to an amount of receiving light;
performing an arithmetic operation on the time series data and thereby digitally correcting the time series data according to changes in a quality of the received plasma light; and
detecting an etching endpoint from the corrected time series data.
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Abstract
A method for detecting an etching endpoint and a plasma etching apparatus and a plasma etching system using such a device are disclosed, in which time series data of a signal corresponding to the amount of light of the plasma light generated during the plasma etching process are arithmetically processed, so that the change of light amount is corrected and an etching endpoint is detected from the time series data after the correction.
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8 Claims
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1. A method for detecting an etching endpoint, comprising steps of:
- receiving plasma light generated during a plasma etching process;
producing time series data including a plurality of data values of a signal corresponding to an amount of receiving light; performing an arithmetic operation on the time series data and thereby digitally correcting the time series data according to changes in a quality of the received plasma light; and detecting an etching endpoint from the corrected time series data. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
- receiving plasma light generated during a plasma etching process;
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