Process for depositing a carbon-rich coating on a moving substrate

• US 5,888,594 A
• Filed: 11/05/1996
• Issued: 03/30/1999
• Est. Priority Date: 11/05/1996
• Status: Expired due to Term

• Current Assignee: 3M Company
• Original Assignee: 3M Company
• Inventors: David, Moses M., McClure, Donald J., Maki, Stephen P.
• Primary Examiner(s): King, Roy V.
• Application Number:
  US08/744,227
• Time in Patent Office: 875 Days
• Field of Search: 427/577, 427/249, 427/255.5, 427/122, 423/446, 118/729, 118/730
• US Class Current: 427/577
• CPC Class Codes: C23C 16/26 Deposition of carbon only
• CPC Class Codes: C23C 16/545 for coating elongated substrates

Abstract

A process and apparatus for deposition of a carbon-rich coating onto a moving substrate is provided. The process and apparatus involve the creation of an electric field surrounding a rotatable electrode in a carbon-containing gaseous environment. This results in carbon-rich plasma formation, wherein the electrode is negatively biased with respect to the electrode which results in ion acceleration from the plasma toward the electrode. Ion bombardment continuously occurs on a substrate in contact with the electrode producing a continuous carbon-rich coating over the length of the substrate.

Claims

1. A process for depositing a carbon-rich film on a moving substrate comprising the step of:

in an environment conducive to carbon-rich film deposition, said environment comprising an electrode having conductive and non-conductive regions in contact with said moving substrate, applying power to said electrode so as to create from said environment a plasma comprising ions, whereby said electrode becomes negatively biased with respect to said plasma, thereby accelerating said ions toward main electrode, said ions striking said moving substrate in contact with said conductive regions of said electrode resulting in deposition of said carbon-rich film on said substrate.

2. The process for depositing a carbon-rich film as set forth in claim 1 wherein said power comprises a radio frequency power.

3. The process for depositing a carbon-rich film as set forth in claim 1 wherein said environment comprises a chamber including at least one gas comprising molecules that comprise carbon atoms.

4. The process for depositing a carbon-rich film as set forth in claim 3 wherein said chamber includes electrically grounded walls and said electrode positioned within said chamber.

5. The process for depositing a carbon-rich film as set forth in claim 4 wherein said chamber includes a deposition compartment and a substrate storage compartment separated by a divider having a substrate passage therein.

6. The process for depositing a carbon-rich film as set forth in claim 1 wherein said electrode is a rotatable electrode.

7. The process for depositing a carbon-rich film as set forth in claim 6 wherein said rotatable electrode is temperature controlled.

8. The process for depositing a carbon-rich film as set forth in claim 7 wherein said rotatable electrode is cooled.

9. The process for depositing a carbon-rich film as set forth in claim 1 wherein the substrate is a flexible web.

10. The process for depositing a carbon-rich film as set forth in claim 9 wherein a surface of said flexible web comprises a metallized coating.

11. The process for depositing a carbon-rich film as set forth in claim 10 wherein said metallized coating defines an electrical circuit.

12. The process for depositing a carbon-rich film as set forth in claim 9 wherein the flexible web comprises a polymer.

13. The process of claim 3 wherein said gas has an ionization potential of 10 eV or less.

14. A process for depositing a carbon-rich film on a moving substrate comprising the steps of:

a) bringing a length of said substrate into contact with an electrode housed within a vacuum chamber, said electrode having conductive regions and non-conductive regions; and

b) applying power to said electrode so as to deposit said carbon-rich film on said length of said substrate in contact with said conductive regions of said electrode, whereby deposition of said carbon-rich film is substantially confined to said moving substrate.

15. The process for depositing a carbon-rich film as set forth in claim 14 wherein said application step includes:

creating a plasma having ions therein from a hydrocarbon gas within said vacuum chamber by powering said electrode whereby said electrode becomes negatively biased with respect to said plasma.