Processing apparatus and method utilizing a tray assembly and a guide path arrangement

• US 5,899,594 A
• Filed: 10/09/1997
• Issued: 05/04/1999
• Est. Priority Date: 10/09/1997
• Status: Expired due to Fees

• Current Assignee: Eastman Kodak Company
• Original Assignee: Eastman Kodak Company
• Inventors: Piccinino, Ralph L. Jr.
• Primary Examiner(s): Rutledge, D.
• Application Number:
  US08/947,817
• Time in Patent Office: 572 Days
• Field of Search: 396/612, 396/620, 396/626, 396/636
• US Class Current: 396/612
• CPC Class Codes: G03D 3/04 Liquid agitators in general B01F
• CPC Class Codes: G03D 3/065 replenishment or recovery apparatus
• CPC Class Codes: G03D 3/132 fed by roller assembly
• CPC Class Codes: G03D 5/067 Rollers

Abstract

A processing assembly includes a processing tank that has a processing path for photosensitive material. The processing tank includes at least one first processing assembly along a downward portion of the processing path and at least one second processing assembly along an upward portion of the processing path. The processing assemblies include a tray assembly and a guide path or slot which extends from the tray assembly. The guide path or slot receives over flow processing solution from the tray assembly and also guides the photosensitive material.

Claims

1. An apparatus for processing photosensitive material, the apparatus comprising:

at least one processing tank having a processing path for the photosensitive material, said at least one processing tank comprising at least one first processing assembly along a downward portion of the processing path and at least one second processing assembly along an upward portion of the processing path;

wherein each of said first and second processing assemblies comprise;

a tray assembly which receives a processing solution therein;

a conveying roller assembly at least partially submerged in the processing solution contained in the tray assembly; and

a guide path extending from said tray assembly, said guide path receiving an overflow of processing solution from said tray assembly and guiding the photosensitive material and overflow processing solution therethrough such that the processing solution flows in a direction parallel to the direction of travel of the photosensitive material in the downward portion of the processing path and in a direction opposite to the direction of travel of the photosensitive material in the upward portion of the processing path.

2. An apparatus according to claim 1, wherein said guide path comprises a textured surface which agitates said processing solution which overflows from said tray assembly and travels through said guide path, such that said agitated processing solution processes the photosensitive material in said guide path.

3. An apparatus according to claim 1, wherein said guide path comprises at least one nozzle which applies processing solution to the photosensitive material in the guide path.

4. An apparatus according to claim 1, wherein said processing solution is one of a washing solution, a developing solution, a bleaching solution and a fixing solution which is supplied to said tray assembly to create an overflow of processing solution, the overflow of processing solution being led from said tray assembly to said guide path so as to permit a processing of the photosensitive material in the guide path by the overflow processing solution.

5. An apparatus according to claim 1, wherein said conveying roller assembly comprises first and second opposing rollers between which the photosensitive material passes, and said tray assembly comprises a first tray portion positioned under the first roller and a second tray portion positioned under the second roller, said guide path downwardly extending from between the first and second tray portions.

6. An apparatus according to claim 1, wherein said at least one first processing assembly in the downward portion of the processing path is located at an entrance of the processing tank, the guide path of said at least one first processing assembly leading the photosensitive material and the overflow processing solution in the guide path to a nip portion of a conveying roller assembly of an adjacent downstream processing assembly.

7. An apparatus according to claim 1, wherein said at least one second processing assembly in the upward portion of the processing path is located at an exit of the processing tank, the guide path of the at least one second processing assembly receiving a photosensitive material from a nip portion of a conveying roller assembly of an adjacent upstream processing assembly, and the overflow processing solution is led by the guide path of the at least one second processing assembly to the nip portion of the conveying roller assembly of the adjacent upstream processing assembly.

8. An apparatus for processing photosensitive material, the apparatus comprising:

at least one processing tank including at least one processing assembly, said at least one processing assembly comprising a receiving portion for receiving processing solution therein and a guiding portion which guides a photosensitive material and overflow processing solution from the receiving portion therethrough.

9. A method of processing photosensitive material, the method comprising the steps of:

providing at least one processing assembly in a processing tank along the downward portion of the processing tank and at least one process assembly along the upper portion of the processing path, said at least one processing assembly comprising a tray assembly and a guide path extending from the tray assembly;

supplying a processing solution to the at least one processing assembly so as to overflow the tray assembly and be led into the guide path such that the processing solution in the downward portion travels substantially in the same direction as the photosensitive material and travels substantially in the opposite direction to the photosensitive material in the upward portion of the processing path; and

conveying a photosensitive material through the guide path of the processing assembly, such that the overflowing processing solution treats the photosensitive material in the guide path.

10. A method according to claim 9, wherein said guide path of the at least one processing assembly extends to a further processing assembly so as to lead the photosensitive material to the further processing assembly.

11. An apparatus for processing photosensitive material, the apparatus comprising:

at least one processing tank having a processing path for the photosensitive material, said at least one processing tank comprising at least one first processing assembly along a downward portion of the processing path and at least one second processing assembly along an upward portion of the processing path;

wherein each of said first and second processing assemblies comprise;

a tray assembly which receives a processing solution therein;

a conveying roller assembly at least partially submerged in the processing solution contained in the tray assembly; and

a guide path extending from said tray assembly, said guide path receiving an overflow of processing solution from said tray assembly and guiding the photosensitive material and overflow processing solution therethrough wherein said guide path comprises at least one nozzle which applies processing solution to the photosensitive material in the guide path.

12. An apparatus for processing photosensitive material, the apparatus comprising:

at least one processing tank having a processing path for the photosensitive material, said at least one processing tank comprising at least one first processing assembly along a downward portion of the processing path and at least one second processing assembly along an upward portion of the processing path;

wherein each of said first and second processing assemblies comprise;

a tray assembly which receives a processing solution therein;

a conveying roller assembly at least partially submerged in the processing solution contained in the tray assembly; and

a guide path extending from said tray assembly, said guide path receiving an overflow of processing solution from said tray assembly and guiding the photosensitive material and overflow processing solution therethrough wherein said at least one first processing assembly in the downward portion of the processing path is located at an entrance of the processing tank, the guide path of said at least one first processing assembly leading the photosensitive material and the overflow processing solution in the guide path to a nip portion of a conveying roller assembly of an adjacent downstream processing assembly.

13. An apparatus for processing photosensitive material, the apparatus comprising:

at least one processing tank having a processing path for the photosensitive material, said at least one processing tank comprising at least one first processing assembly along a downward portion of the processing path and at least one second processing assembly along an upward portion of the processing path;

wherein each of said first and second processing assemblies comprise;

a tray assembly which receives a processing solution therein;

a conveying roller assembly at least partially submerged in the processing solution contained in the tray assembly; and

a guide path extending from said tray assembly, said guide path receiving an overflow of processing solution from said tray assembly and guiding the photosensitive material and overflow processing solution therethrough wherein said at least one second processing assembly in the upward portion of the processing path is located at an exit of the processing tank, the guide path of the at least one second processing assembly receiving a photosensitive material from a nip portion of a conveying roller assembly of an adjacent upstream processing assembly, and the overflow processing solution is led by the guide path of the at least one second processing assembly to the nip portion of the conveying roller assembly of the adjacent upstream processing assembly.

14. An apparatus for processing photosensitive material, the apparatus comprising:

at least one processing tank having a processing path for the photosensitive material, said at least one processing tank having an upper portion and a lower portion, said at least one processing tank comprising at least one processing assembly along a downward portion of the processing path and at least one second processing assembly along the upward portion of the processing path, and a turn-around portion disposed in the lower portion of the tank below said first;

wherein each of said first and second processing assemblies comprise;

a tray assembly which receives a processing solution therein;

a conveying roller assembly at least partially submerged in the processing solution contained in the tray assembly; and

a guide path extending from said tray assembly, said guide path receiving an overflow of processing solution from said tray assembly and guiding the photosensitive material and overflow processing solution therethrough, said processing solution being provided to said tray assembly at a rate such that processing solution accumulates only in the lower portion of the processing tank.