Ceramic electrostatic chuck and method of fabricating same

• US 5,909,355 A
• Filed: 12/02/1997
• Issued: 06/01/1999
• Est. Priority Date: 12/02/1997
• Status: Expired due to Fees

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Parkhe, Vijay
• Primary Examiner(s): FLEMING, FRITZ M
• Application Number:
  US08/982,679
• Time in Patent Office: 546 Days
• Field of Search: 361/234, 279/128
• US Class Current: 361/234
• CPC Class Codes: H01L 21/6831 using electrostatic chucks
• CPC Class Codes: H01L 21/6833 Details of electrostatic chucks
• CPC Class Codes: H02N 13/00 Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect
• CPC Class Codes: Y10T 279/23 with magnetic or electrostatic means

Abstract

Multi-layered, ceramic electrostatic chuck for retaining a substrate in a process chamber is provided. The chuck comprises a first layer having a top surface, a second layer disposed on the top surface of the first layer, and a third layer disposed on top of the second layer. The second layer alters the resistivity of the third layer during the fabrication process of the chuck. As such, the resistivity of the chuck is reduced to a value that facilitates establishment of the Johnsen-Rahbek effect and promotes wafer processing at room temperature.

Claims

1. A multi-layered ceramic electrostatic chuck for retaining a substrate in a process chamber comprising:

a first layer having an upper surface,

an electrode disposed within said first layer,

a second layer disposed upon the upper surface of the first layer, and

a third layer disposed on top of the second layer wherein the second layer alters a resistivity of the first layer.

2. The apparatus of claim 1 wherein the first layer is aluminum nitride.

3. The apparatus of claim 2 wherein the second layer is a dopant.

4. The apparatus of claim 3 wherein the dopant is sputtered onto a bottom surface of the third layer.

5. The apparatus of claim 4 wherein the dopant is carbon.

6. The apparatus of claim 5 wherein the third layer is aluminum nitride.

7. The apparatus of claim 6 wherein the first layer of aluminum nitride is in a pre-sintered state and the third layer of aluminum nitride is in a post-sintered state.

8. The apparatus of claim 7 wherein the multi-layered electrostatic chuck is sintered at a temperature in the range of approximately 1900°

-2000°

C.

9. A method for fabricating a multi-layered ceramic electrostatic chuck for retaining a substrate in a process chamber, the chuck having a first layer having an upper surface, a second layer disposed upon the upper surface of the first layer, and a third layer disposed on top of the second layer wherein the second layer alters a resistivity of the first layer, the method comprising the steps of:

providing the first layer,

disposing an electrode within said first layer

disposing the second layer on a bottom surface of the third layer,

debinderizing the first layer,

disposing the third layer with disposed second layer upon the debinderized first layer, and

sintering the multi-layered chuck.

10. The method of claim 9 wherein the step of disposing the third layer with disposed second layer upon the first layer further comprises orienting the third layer so that the bottom surface of the third layer contacts the upper surface of the first layer.

11. The method of claim 10 wherein the first layer is aluminum nitride.

12. The method of claim 11 wherein the second layer is disposed onto the bottom surface of the third layer by sputtering.

13. The method of claim 12 wherein the second layer is a dopant.

14. The method of claim 13 wherein the dopant is carbon.

15. The method of claim 14 wherein the third layer is aluminum nitride.

16. The method of claim 15 wherein the first layer of aluminum nitride is in a pre-sintered state and the third layer of aluminum nitride is in a post-sintered state.

17. The method of claim 16 wherein the multi-layered electrostatic chuck is sintered at a temperature in the range of approximately 1900°

-2000°

C.

18. The method of claim 17 wherein the debinderization step further comprises conducting a burnout of the first layer in air at a temperature of approximately 500°

C. for approximately one hour.

19. A multi-layered ceramic electrostatic chuck for retaining a substrate in a process chamber of a semiconductor wafer process system comprising:

a first layer of pre-sintered aluminum nitride having an upper surface,

an electrode disposed within said first layer,

a second dopant layer of carbon contacting the upper surface of the first layer of pre-sintered aluminum nitride, and

a third layer of post-sintered aluminum nitride in the form of a disc disposed on top of the second dopant layer of carbon wherein the second dopant layer of carbon is sputtered onto a bottom surface of the third layer post-sintered aluminum nitride disc and alters a resistivity of the first layer of pre-sintered aluminum nitride when the chuck is sintered at a temperature in the range of approximately 1900°

-2000°

C.