Vertical dual loadlock chamber
First Claim
Patent Images
1. An apparatus for loading wafers into a processing system, comprising:
- (a) a chamber disposed adjacent to the processing system, the chamber comprising;
(i) an enclosure;
(ii) a transfer region which communicates between the enclosure and the processing system through an aperture formed in a sidewall of the chamber;
(iii) a first and second loading/unloading port formed in the sidewall of the chamber; and
(iv) one or more exhaust ports;
(b) a first and a second isolatable compartment movably disposed in the chamber, each compartment positionable in communication with the aperture while the other compartment is in communication with one of the loading/unloading ports, each compartment comprising;
(i) a top platform;
(ii) a bottom platform substantially parallel to the top platform; and
(iii) a support member interposed between the top platform and the bottom platform;
(c) one or more actuators coupled to the first and second compartments to provide movement of the first and second compartments through the chamber; and
(d) one or more exhaust pumps connected to the one or more exhaust ports for adjusting a pressure condition in the first and second isolatable compartments.
1 Assignment
0 Petitions
Accused Products
Abstract
A vacuum loadlock is provided for housing a pair of wafers in proper alignment for concurrent processing. In one embodiment, a single chamber loadlock is provided with a gas diffuser disposed therein to decrease venting times within the loadlock. In another embodiment, a dual chamber loadlock is provided having first and second isolatable regions disposed adjacent a transfer region to increase throughput of the system.
137 Citations
19 Claims
-
1. An apparatus for loading wafers into a processing system, comprising:
-
(a) a chamber disposed adjacent to the processing system, the chamber comprising; (i) an enclosure; (ii) a transfer region which communicates between the enclosure and the processing system through an aperture formed in a sidewall of the chamber; (iii) a first and second loading/unloading port formed in the sidewall of the chamber; and (iv) one or more exhaust ports; (b) a first and a second isolatable compartment movably disposed in the chamber, each compartment positionable in communication with the aperture while the other compartment is in communication with one of the loading/unloading ports, each compartment comprising; (i) a top platform; (ii) a bottom platform substantially parallel to the top platform; and (iii) a support member interposed between the top platform and the bottom platform; (c) one or more actuators coupled to the first and second compartments to provide movement of the first and second compartments through the chamber; and (d) one or more exhaust pumps connected to the one or more exhaust ports for adjusting a pressure condition in the first and second isolatable compartments. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
-
-
10. A processing apparatus comprising:
-
(a) a front end environment; (b) a processing system comprising; (i) a transfer chamber; (ii) one or more processing chambers attached to the transfer chamber; and (iii) a transfer chamber robot located in the transfer chamber, the transfer chamber robot adapted to handle one or more wafers; and (iv) a load lock interposed between the front end environment and the processing system, the loadlock being in selective communication with the front end environment and the processing system, the loadlock comprising; (i) a chamber body comprising an upper loading/unloading end, a lower loading/unloading end, and a transfer region; (ii) an upper access port and a lower access port formed in the chamber body adapted for wafer transfer into and out of the upper and lower loading/unloading ends respectively; (iii) a movable first compartment disposed within the chamber body having access to the upper port; (iv) a movable second compartment disposed within the chamber body having access to the lower port;
one of the first or second movable compartments positionable in communication with the aperture while the other compartment is in communication with one of the access ports;(v) one or more actuators to move the first and second compartments into the transfer region; (vi) one or more sealing members to isolate the compartments; (vii) an aperture formed in the chamber body providing access for wafer transfer between the first and second movable compartments and the processing system; and (viii) one or more exhaust pumps in selective communication with the first and second movable compartments to adjust a pressure condition therein. - View Dependent Claims (11, 12, 13, 14)
-
-
15. A load lock, comprising:
-
(a) a chamber body having an upper loading/unloading end, a lower loading/unloading end, and a central transfer region accessible by the upper and lower loading/unloading ends; (b) access ports disposed in the upper and lower loading/unloading ends; (c) loading doors to selectively seal the access ports; (d) a movable first compartment disposed within the chamber body; (e) a movable second compartment disposed within the chamber body; (f) one or more actuators mounted to move the first compartment between the upper loading/unloading end and the central transfer region and the second compartment between the lower loading/unloading end and the transfer region; (g) one or more sealing members to selectively isolate the compartments; (h) one or more pumps in communication with the first and second chambers to adjust a pressure condition therein; and (i) an aperture formed in the chamber body communicating with the central transfer region; wherein the first compartment is positionable in the upper loading/unloading end while the second compartment is disposed in the transfer region and wherein the second compartment is disposed in the lower loading/unloading end while the first compartment is disposed in transfer region. - View Dependent Claims (16, 17, 18, 19)
-
Specification