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Vertical dual loadlock chamber

  • US 5,909,994 A
  • Filed: 11/18/1996
  • Issued: 06/08/1999
  • Est. Priority Date: 11/18/1996
  • Status: Expired due to Term
First Claim
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1. An apparatus for loading wafers into a processing system, comprising:

  • (a) a chamber disposed adjacent to the processing system, the chamber comprising;

    (i) an enclosure;

    (ii) a transfer region which communicates between the enclosure and the processing system through an aperture formed in a sidewall of the chamber;

    (iii) a first and second loading/unloading port formed in the sidewall of the chamber; and

    (iv) one or more exhaust ports;

    (b) a first and a second isolatable compartment movably disposed in the chamber, each compartment positionable in communication with the aperture while the other compartment is in communication with one of the loading/unloading ports, each compartment comprising;

    (i) a top platform;

    (ii) a bottom platform substantially parallel to the top platform; and

    (iii) a support member interposed between the top platform and the bottom platform;

    (c) one or more actuators coupled to the first and second compartments to provide movement of the first and second compartments through the chamber; and

    (d) one or more exhaust pumps connected to the one or more exhaust ports for adjusting a pressure condition in the first and second isolatable compartments.

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