Apparatus and method for regulating pressure in two chambers

• US 5,913,978 A
• Filed: 04/12/1996
• Issued: 06/22/1999
• Est. Priority Date: 04/20/1995
• Status: Expired due to Term

• Current Assignee: Varian Japan K.K. (Applied Materials Incorporated), Tokyo Electron Limited
• Original Assignee: Tokyo Electron Limited, Varian Japan KKT
• Inventors: Ozawa, Masahito, Kato, Susumu, Muraoka, Sunao
• Primary Examiner(s): Breneman, R. Bruce
• Assistant Examiner(s): LUND, JEFFRIE ROBERT
• Application Number:
  US08/629,938
• Time in Patent Office: 1,166 Days
• Field of Search: 118/719, 204/298.25, 204/298.35, 156/345, 414/217, 414/939, 251/326, 251/328, 251/329
• US Class Current: 118/719
• CPC Class Codes: C23C 14/564 Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
• CPC Class Codes: C23C 16/4401 Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
• CPC Class Codes: C23C 16/4408 by purging residual gases from the reaction chamber or gas lines
• CPC Class Codes: C23C 16/54 Apparatus specially adapted for continuous coating
• CPC Class Codes: H01L 21/67017 Apparatus for fluid treatment H01L21/67126, H01L21/6715 take precedence
• CPC Class Codes: H01L 21/67167 surrounding a central transfer chamber
• CPC Class Codes: H01L 21/67201 characterized by the construction of the load-lock chamber
• CPC Class Codes: H01L 21/67253 Process monitoring, e.g. flow or thickness monitoring
• CPC Class Codes: Y10S 156/913 Differential etching apparatus having a horizontal tube reactor
• CPC Class Codes: Y10S 414/139 including wafer charging or discharging means for vacuum chamber

Abstract

A gas is supplied to a second chamber so that the pressure in the second chamber is raised to a predetermined level. A communication passage is provided for internally connecting the first and second chambers. When the pressure in the first chamber attains the predetermined level, the gas is allowed to flow from the second chamber into the first chamber through the communication passage. A gas flow can be checked when an open-close door is opened to connect the chambers. Thus, there is no substantial gas flow, so that particles can be prevented from being flung up.

Claims

1. An apparatus for regulating pressures in first and second chambers which can communicate with each other through an open-close door, whereby the difference in pressure between the chambers is adjusted to approximately zero when the pressure in the second chamber is higher than the pressure in the first chamber, comprising:

gas supply means for supplying a gas to the second chamber, thereby raising the pressure in the second chamber to a selected level;

communication means for internally connecting the first and second chambers; and

release means for allowing the gas to flow from the second chamber into the first chamber through the communication means when the selected level is attained by the pressure in the second chamber, wherein

said communication means includes a pipe located in the open-close door between the first and second chambers and internally connecting the chambers.

2. The pressure regulating apparatus according to claim 1, wherein said release means includes a relief valve inserted in the pipe connecting the chambers and adapted to allow the gas to flow from the second chamber into the first chamber through the pipe when the selected level is attained by the pressure in the second chamber.

3. The pressure regulating apparatus according to claim 1, wherein the pressure in said second chamber is changed as required between the levels of a pressure substantially equivalent to the atmospheric pressure and a vacuum pressure, and said first chamber is always kept substantially at the atmospheric pressure.

4. The pressure regulating apparatus according to claim 1, wherein said first and second chambers are a loader chamber and a load locking chamber, respectively, of an object process apparatus.

5. A method for regulating pressures in first and second chambers which can communicate with each other through an open-close door, whereby the difference in pressure between the chambers is adjusted to approximately zero when the pressure in the second chamber is higher than the pressure in the first chamber, comprising the steps of:

supplying a gas to the second chamber, thereby raising the pressure in the second chamber to a selected level; and

allowing the gas to flow from the second chamber into the first chamber through communication means when the selected level is attained by the pressure in the second chamber, wherein

said gas is allowed to flow from the second chamber into the first chamber through a pipe located in the open-close door between the first and second chambers.

6. The pressure regulating method according to claim 5, wherein said gas is allowed to flow in a stand-by time after the attainment of the selected level by the pressure in the second chamber in said process for allowing the gas to flow from the second chamber into the first chamber.

7. The pressure regulating method according to claim 5, wherein said gas is allowed to flow from the second chamber into the first chamber by a relief valve inserted in the pipe connecting the chambers.

8. The pressure regulating method according to claim 5, wherein the pressure in said second chamber is changed as required between the levels of a pressure substantially equivalent to the atmospheric pressure and a vacuum pressure, and said first chamber is always kept substantially at the atmospheric pressure.

9. The pressure regulating method according to claim 5, wherein said first and second chambers are a loader chamber and a load locking chamber, respectively, of an object process apparatus.

10. A multi-chamber process apparatus comprising:

means defining first and second chambers,

an open-close door through which said chambers can communicate with each other, and

means for regulating pressures in said first and second chambers whereby the difference in pressure between said chambers is adjusted to approximately zero when the pressure in the second chamber is higher than the pressure in the first chamber, said means for regulating pressures including;

gas supply means for supplying a gas to said second chamber, thereby raising the pressure in said second chamber to a selected level;

communication means for internally connecting said first and second chambers; and

release means for allowing the gas to flow from said second chamber into said first chamber through said communication means when said selected level is attained by the pressure in said second chamber, wherein

said communication means includes a pipe located in said open-close door between said first and second chambers and internally connecting said chambers.

11. The multi-chamber process apparatus according to claim 10, wherein said release means includes a relief valve inserted in said pipe connecting said chambers and adapted to allow the gas to flow from said second chamber into said first chamber through said pipe when said selected level is attained by the pressure in said second chamber.

12. The multi-chamber process apparatus according to claim 10, wherein the pressure in said second chamber is changed as required between the levels of a pressure substantially equivalent to atmospheric pressure and vacuum pressure, and said first chamber is always kept substantially at atmospheric pressure.

13. The multi-chamber process apparatus according to claim 10, wherein said first and second chambers are a loader chamber and a load locking chamber, respectively.