Wipes having a substrate with a discontinuous pattern of a high internal phase inverse emulsion disposed thereon and process of making
First Claim
1. A wipe comprising a substrate and a high internal phase inverse emulsion disposed thereon, said emulsion being disposed in a pattern comprising stripes whereby said substrate has first regions coated with said emulsion and second regions free of said emulsion, said emulsion having a surface area to volume ratio of less than 200 inches-1.
1 Assignment
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Accused Products
Abstract
A wipe comprising a high internal phase inverse emulsion disposed in a discontinuous pattern on a substrate. The pattern provides areas coated with the emulsion and areas free of the emulsion. Preferably the emulsion is disposed so that the surface area to volume ratio of the emulsion is minimized. The emulsion locally expresses water during use upon the application of pressure to the wipe. The water is useful for cleaning. The discontinuous pattern of the emulsion provides regions of the substrate which are wetted during use and regions which may remain dry. The wetted regions transfer water to the surface to be cleaned. The dry regions then remove the water from the surface for more efficacious cleaning.
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Citations
20 Claims
- 1. A wipe comprising a substrate and a high internal phase inverse emulsion disposed thereon, said emulsion being disposed in a pattern comprising stripes whereby said substrate has first regions coated with said emulsion and second regions free of said emulsion, said emulsion having a surface area to volume ratio of less than 200 inches-1.
- 11. A wipe comprising a substrate and a high internal phase inverse emulsion disposed thereon, said wipe having a machine direction and a cross-machine direction orthogonal thereto, said substrate comprising a first plurality of regions having a relatively high basis weight and a second plurality of regions having a relatively low basis weight, said emulsion being disposed on said substrate in a discontinuous pattern of stripes, said stripes being generally parallel said machine direction and having a generally cylindrical shape, whereby said substrate has first regions coated with said emulsion and second regions free of said emulsion, and said emulsion is juxtaposed with said second plurality of regions having said relatively low basis weight.
- 15. A wipe comprising a substrate and a high internal phase inverse emulsion disposed thereon, said emulsion having a surface area to volume ratio of less than 200 inches-1, said emulsion being disposed in a discontinuous pattern whereby, in use, said substrate has first regions which are wetted in use by release of a liquid from said emulsion and second regions which are dry in use.
- 19. A wipe comprising a substrate having two exposed surfaces, a first exposed surface and a second exposed surface opposed thereto, said wipe further comprising a high internal phase inverse emulsion disposed on one of said exposed surfaces, said substrate having a first basis weight, said emulsion having a coating weight, said coating weight being at least 50 percent of said basis weight, said emulsion having a surface area to volume ratio of less than 200 inches-1.
Specification