Process for producing a semiconductor device having a single thermal oxidizing step
First Claim
1. A process for producing a semiconductor device, comprising:
- laminating a first conductive type high-resistance layer formed of a single crystal silicon carbide of a hexagonal system on a first conductive type low-resistance layer formed of a single crystal silicon carbide of a hexagonal system to form a semiconductor substrate;
forming, on the surface of said semiconductor substrate, a second conductive type semiconductor layer of a single crystal silicon carbide of a hexagonal system, and forming a first conductive type semiconductor region in a predetermined region of said semiconductor layer;
forming a trench extending through said semiconductor region and said semiconductor layer into said semiconductor substrate, said trench having a side face and a bottom face, said bottom face having a flat surface of a (0001) carbon face;
performing a single thermal oxidizing step to thermally oxidize the inner wall of said trench to form a gate oxide layer as a gate insulating layer, the thickness of said gate oxide layer on the bottom face of said trench being larger than the thickness of said gate oxide layer on the side face of said trench, the thicker gate oxide layer on the bottom face being formed in the same oxidizing step as the thinner gate oxide layer on the side face; and
forming a gate electrode layer on the surface of said gate oxide layer, formed by thermal oxidation, within said trench, forming a first electrode layer on the surface of said semiconductor layer and on the surface of said semiconductor region, and forming a second electrode layer on the back surface of said semiconductor substrates,wherein rounded corners are formed at an intersection of said side face and said bottom face of said trench during said single thermal oxidizing step.
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Abstract
A semiconductor device, which has an oxide laver with the thickness thereof being varied from portion to portion of the inner surface of a trench and can be easily produced, and a process of producing the same. An n+ type single crystal SiC substrate is formed of SiC of hexagonal system having a carbon face with a (0001) face orientation as a surface, and an n type epitaxial layer and a p type epitaxial layer are successively laminated onto the substrate. An n+ source region is provided within the p type epitaxial layer, and the trench extends through the source region and the epitaxial layer into the semiconductor substrate. The side face of the trench is almost perpendicular to the surface of the epitaxial layer with the bottom face of the trench having a plane parallel to the surface of the epitaxial layer. The thickness of a gate oxide layer, formed by thermal oxidation, on the bottom face of the trench is larger than the thickness of the gate oxide layer on the side face of the trench. A gate electrode layer is provided on the surface of the oxide layer, formed by thermal oxidation, within the trench, a source electrode layer is provided on the epitaxial layer and the source region, and a drain electrode layer is provided on the back surface of the semiconductor substrate.
214 Citations
13 Claims
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1. A process for producing a semiconductor device, comprising:
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laminating a first conductive type high-resistance layer formed of a single crystal silicon carbide of a hexagonal system on a first conductive type low-resistance layer formed of a single crystal silicon carbide of a hexagonal system to form a semiconductor substrate; forming, on the surface of said semiconductor substrate, a second conductive type semiconductor layer of a single crystal silicon carbide of a hexagonal system, and forming a first conductive type semiconductor region in a predetermined region of said semiconductor layer; forming a trench extending through said semiconductor region and said semiconductor layer into said semiconductor substrate, said trench having a side face and a bottom face, said bottom face having a flat surface of a (0001) carbon face; performing a single thermal oxidizing step to thermally oxidize the inner wall of said trench to form a gate oxide layer as a gate insulating layer, the thickness of said gate oxide layer on the bottom face of said trench being larger than the thickness of said gate oxide layer on the side face of said trench, the thicker gate oxide layer on the bottom face being formed in the same oxidizing step as the thinner gate oxide layer on the side face; and forming a gate electrode layer on the surface of said gate oxide layer, formed by thermal oxidation, within said trench, forming a first electrode layer on the surface of said semiconductor layer and on the surface of said semiconductor region, and forming a second electrode layer on the back surface of said semiconductor substrates, wherein rounded corners are formed at an intersection of said side face and said bottom face of said trench during said single thermal oxidizing step. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A process for producing a vertical MOSFET using silicon carbide, comprising the steps of:
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forming a trench in a silicon carbide substrate having rounded corners and a flat bottom face with a (0001) carbon face; and forming a gate oxide layer in the trench so as to form a thinner oxide layer on a trench side face in which a channel region is formed upon operation of the vertical MOSFET and a thicker oxide layer having a greater thickness than the thinner oxide layer on a trench bottom face, wherein the thinner oxide layer and the thicker oxide layer are formed in a single step.
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10. A process for producing a semiconductor device, comprising:
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laminating a first conductive type high-resistance layer formed of a single crystal silicon carbide of a hexagonal system on a first conductive type low-resistance layer formed of a single crystal silicon carbide of a hexagonal system to form a semiconductor substrate; forming, on the surface of said semiconductor substrate, a second conductive type semiconductor layer of a single crystal silicon carbide of a hexagonal system, and forming a first conductive type semiconductor region in a predetermined region of said semiconductor layer; forming a trench extending through said semiconductor region and said semiconductor layer into said semiconductor substrate, said trench having a side face and a bottom face, said bottom face having a surface with a first inclination of 30°
or less to a (0001) carbon face and said side face of said trench having a second inclination greater than 45° and
less than 90°
with respect to said (0001) carbon face;thermally oxidizing an inner wall of said trench to form a gate oxide layer as a gate insulating layer in a single step, wherein a first oxidation speed of said side face is smaller than a second oxidation speed of said bottom face, the thickness of said gate oxide layer on the bottom face of said trench being larger than the thickness of said gate oxide layer on the side face of said trench, the difference between the thickness of said gate oxide layer on said bottom face of said trench to the thickness of said gate oxide layer on said side face of said trench varying with said second inclination, and the thicker gate oxide layer on the bottom face being formed in the same oxidizing step as the thinner gate oxide layer on the side face; and forming a gate electrode layer on the surface of said gate oxide layer, formed by thermal oxidation, within said trench, forming a first electrode layer on the surface of said semiconductor layer and on the surface of said semiconductor region, and forming a second electrode layer on the back surface of said semiconductor substrate. - View Dependent Claims (11, 12, 13)
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Specification