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Methods of forming active matrix display devices with reduced susceptibility to image-sticking and devices formed thereby

  • US 5,917,564 A
  • Filed: 10/14/1997
  • Issued: 06/29/1999
  • Est. Priority Date: 11/13/1996
  • Status: Expired due to Term
First Claim
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1. A method of forming a display device, comprising the steps of:

  • forming a gate electrode on a face of a substrate;

    forming a first insulating layer on the gate electrode and on the face;

    forming a first amorphous semiconductor layer on the first insulating layer, opposite the gate electrode;

    forming a channel protection layer on the first amorphous semiconductor layer, opposite the gate electrode; and

    etching the first insulating layer to expose the face of the substrate while simultaneously etching a portion of the channel protection layer extending opposite the gate electrode.

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