High resolution optical multiplexing and demultiplexing device in optical communication system

• US 5,917,625 A
• Filed: 02/21/1997
• Issued: 06/29/1999
• Est. Priority Date: 09/09/1993
• Status: Expired due to Fees

• Current Assignee: Kabushiki Kaisha Toshiba (Toshiba Corporation)
• Original Assignee: Kabushiki Kaisha Toshiba (Toshiba Corporation)
• Inventors: Oshima, Shigeru, Ogusu, Masahiro
• Primary Examiner(s): Boudreau, Leo H.
• Assistant Examiner(s): MEHTA, BHAVESH M
• Application Number:
  US08/804,344
• Time in Patent Office: 858 Days
• Field of Search: 359/114-115, 359/127-131, 385/129, 385/131, 385/132, 385/49, 385/24, 385/35, 385/37
• US Class Current: 385/24
• CPC Class Codes: G02B 6/2931 Diffractive element operating in reflection

Abstract

An optical multiplexing and demultiplexing device of a type using a lens and a diffraction grating, which incorporates a waveguide array having waveguide channels with narrow spacings for facilitating high resolution, where the narrow spacings are realized by forming an etching groove between each adjacent waveguide channels and providing a measure for preventing optical coupling among the waveguide channels in the form of an air gap, or a layer having a refractive index lower than a cladding layer, or a layer for absorbing/reflecting light, which is provided in the etching groove. The device also incorporates a reflection mirror for reflecting the initially diffracted lights from the diffraction grating back to the diffraction grating, such that the diffracting grating diffracts the diffracted lights reflected back from the reflection mirror again to produce wavelength division multiplexed/demultiplexed optical signals in high resolution.

Claims

1. An optical multiplexing and demultiplexing device comprising:

a waveguide array for entering optical signals to be multiplexed/demultiplexed, in a layered structure with a waveguide layer formed by silica glass and having a plurality of waveguide channels for propagating the optical signals, adjacent waveguide channels being separated by an etching groove formed therebetween in the waveguide layer, and means provided in at least a part of the etching grooves formed among the waveguide channels for preventing optical coupling among the waveguide channels;

a lens for collimating the optical signals from the waveguide array and the multiplexed/demultiplexed optical signals to the waveguide array; and

a diffraction grating for diffracting the optical signals entered by the waveguide array and collimated by the lens to obtain wavelength division multiplexed/demultiplexed optical signals.

2. The device of claim 1, wherein the means for preventing optical coupling comprises an air gap provided in each etching groove.

3. The device of claim 1, wherein the means for preventing optical coupling comprises a coupling preventing layer having a refractive index lower than a cladding layer formed around the waveguide channels and which is provided in each etching groove.

4. The device of claim 3, further comprising a layer for absorbing/reflecting lights formed over the coupling preventing layer.

5. The device of claim 1, wherein the means for preventing optical coupling comprises a layer for absorbing/reflecting lights which is provided in each etching groove.

6. The device of claim 1, wherein the waveguide channels of the waveguide array are arranged at narrower spacings on one side of the waveguide array facing toward the lens and the diffraction grating, and at wider spacings on another side of the waveguide array facing toward an optical fiber array for transmitting the optical signals to and from the waveguide array.

7. The device of claim 1, wherein the waveguide array is fabricated by forming a first cladding layer and a waveguide layer on a substrate by a flame deposition method, selectively etching a part of the waveguide layer to form the waveguide channels as a remaining part of the waveguide layer, and then forming a thin second cladding layer over the first cladding layer and the waveguide layer by the flame deposition method, so as to leave the etching groove between each adjacent waveguide channels.