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Reflective reduction imaging optical system for X-ray lithography

  • US 5,917,879 A
  • Filed: 03/17/1997
  • Issued: 06/29/1999
  • Est. Priority Date: 03/15/1996
  • Status: Expired due to Fees
First Claim
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1. A reflective reduction imaging optical system for X-ray lithography, for transferring patterns from a mask to a wafer, the system employing an X-ray source and comprised by coaxially placing, in the following sequence from said source and the mask, a first concave mirror, a plane mirror, a convex mirror, and a second concave mirror, with said concave mirrors and said convex mirror formed with mirror surfaces having aspherical shapes, said convex mirror being placed at a pupil plane, and wherein the system becomes telecentric on an image side of said wafer.

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