Microelectromechanical television scanning device and method for making the same
First Claim
1. A two-axis gimbal comprising a planar microelectromechanical ("MEMs") film substrate, the film substrate including a first cut-out region rotatably connected to an outer region of the film substrate in a manner to permit controlled free out-of-plane rotation of the first region relative to the outer region, and a second cut-out region rotatably connected to and nested within the first cut-out region in a manner to permit controlled free out-of-plane rotation of the second region relative to the first region, and wherein the axis of rotation of the first cut-out region is oriented substantially 90 degrees with respect to the axis of rotation of the second cut-out region, and wherein the cutout regions are rotated by applying an independent rotational force to each respective cut-out region.
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Reexamination
Accused Products
Abstract
A single reflector, two-axis MEMS scanner made of a substrate. The substrate has nested, cut-out regions. Each region is independently rotatable about one of the axes. The axes of the regions are substantially orthogonal.
175 Citations
9 Claims
- 1. A two-axis gimbal comprising a planar microelectromechanical ("MEMs") film substrate, the film substrate including a first cut-out region rotatably connected to an outer region of the film substrate in a manner to permit controlled free out-of-plane rotation of the first region relative to the outer region, and a second cut-out region rotatably connected to and nested within the first cut-out region in a manner to permit controlled free out-of-plane rotation of the second region relative to the first region, and wherein the axis of rotation of the first cut-out region is oriented substantially 90 degrees with respect to the axis of rotation of the second cut-out region, and wherein the cutout regions are rotated by applying an independent rotational force to each respective cut-out region.
- 4. A two-axis gimbal comprising a planar microelectromechanical ("MEMs") film substrate, the film substrate including a first cut-out region rotatably connected to an outer region of the film substrate in a manner to permit controlled free out-of-plane rotation of the first region relative to the outer region, and a second cut-out region rotatable connected to and nested within the first cut-out region in a manner to permit controlled free out-of-plane rotation of the second region relative to the first region, wherein the second cut-out region carries a photoelectric device, and wherein the axis of rotation of the first cut-out region is oriented substantially 90 degrees with respect to the axis of rotation of the second cut-out region.
- 5. A two-axis gimbal comprising a planar microelectromechanical ("MEMs") film substrate, the film substrate including a first cut-out region rotatably connected to an outer region of the film substrate in a manner to permit controlled free out-of-plane rotation of the first region relative to the outer region, and a second cut-out region rotatably connected to and nested within the first cut-out region in a manner to permit controlled free out-of-plane rotation of the second region relative to the first region, wherein the second cut-out region carries a reflector, and wherein the axis of rotation of the first cut-out region is oriented substantially 90 degrees with respect to the axis of rotation of the second cut-out region, and wherein the cut-out regions are rotated by applying an independent rotational force to each respective cut-out region.
- 6. A two-axis gimbal comprising a planar microelectromechanical ("MEMs") film substrate, the film substrate including a first cut-out region rotatably connected to an outer region of the film substrate in a manner to permit controlled free out-of-plane rotation of the first region relative to the outer region, and a second cut-out region rotatably connected to and nested within the first cut-out region in a manner to permit controlled free out-of-plane rotation of the second region relative to the first region, wherein the second cut-out region carries an emitter element, and wherein the axis of rotation of the first cut-out region is oriented substantially 90 degrees with respect to the axis of rotation of the second cut-out region.
Specification