Pattern transfer mask, mask inspection method and a mask inspection apparatus

• US 5,923,034 A
• Filed: 10/15/1997
• Issued: 07/13/1999
• Est. Priority Date: 01/07/1997
• Status: Expired due to Fees

• Current Assignee: Kabushiki Kaisha Toshiba (Toshiba Corporation)
• Original Assignee: Kabushiki Kaisha Toshiba (Toshiba Corporation)
• Inventors: Ogasawara, Munehiro, Murooka, Ken-ichi
• Primary Examiner(s): ANDERSON, BRUCE C
• Application Number:
  US08/950,802
• Time in Patent Office: 636 Days
• Field of Search: 250/311, 250/303, 250/397
• US Class Current: 250/311
• CPC Class Codes: H01J 2237/2817 Pattern inspection
• CPC Class Codes: H01J 37/26 Electron or ion microscopes; Electron or ion diffraction tubes

Abstract

A mask inspection apparatus of the present invention includes an electron gun for irradiating an electron beam onto a mask with a pattern formed thereon, an electron lens for magnifying an electro-optic mask image passed through the mask, a fluorescent screen for converting the magnified electro-optic mask image to an optical mask image, an optical lens for optically magnifying the optical mask image, a detector for detecting the magnified optical mask image, and a comparator for inspection a defect in the pattern on the basis of the image. By doing so, it is possible to suppress aberrations resulting from the electro-optic magnification and, in addition, inspect the pattern with a high resolution through optical magnification. It is also possible to inspect the mask at its area and to inspect a defect at high speeds.

Claims

1. A mask inspection apparatus comprising:

a charged particle beam generating source for irradiating a charged particle beam;

a shaped mask for shaping the charged particle beam to generate a shaped charged particle beam, the shaped charged particle beam being applied onto a mask formed with a pattern;

an electron lens for electro-optically magnifying an electro-optic mask image transmitted through the mask;

a fluorescent screen for converting the magnified electro-optic mask image to an optical mask image;

optically magnifying means for optically magnifying the optical mask image;

a camera for detecting a magnified optical mask image to obtain an image signal; and

means for inspecting the pattern for a defect on the basis of the image signal.

2. The mask inspection apparatus according to claim 1, wherein the electron lens magnifies the electro-optic mask image until the minimum size of a picked defect on the electro-optic mask image is brought to an extent at least greater than the wavelength of light.

3. The mask inspection apparatus according to claim 1, wherein the electron lens and optically magnifying means magnify the electro-optic mask image and optical mask image until the minimum size of a picked defect on the magnified optical mask image is brought to an extent greater than a resolution of the camera.

4. The mask inspection apparatus according to claim 1, wherein the optically magnifying means magnifies the optical mask image until the minimum size of a picked defect on the optical mask image is brought to an extent greater than a resolution of the camera.

5. The mask inspection apparatus according to claim 1, further comprising an aperture arranged between the electron lens and the fluorescent screen to eliminate at least a portions of a scattering component contained in the electro-optic mask image.

6. The mask inspection apparatus according to claim 5, wherein the aperture is arranged at a focal position of the electronic lens.

7. The mask inspection apparatus according to claim 1, further comprising a deflection coil for deflecting the charged particle beam to allow the mask to be scanned with the charged particle beam.

8. The mask inspection apparatus according to claim 1, further comprising a mechanism for moving the mask to allow the mask to be scanned with the charged particle beam.

9. The mask inspection apparatus according to claim 1, wherein the inspection means has means for spatially differentiating the image signal to enhance the edge of the pattern.

10. The mask inspection apparatus according to claim 9, wherein the differentiating means has means for shifting the image signal and means for subtracting a frame of the shifted image signal from a frame of the non-shifted image signal.

11. The mask inspection apparatus according to claim 1, further comprising an optical filter arranged between the optically magnifying means and the camera to enhance the edge of the pattern in the magnified optical mask image.

12. The mask inspection apparatus according to claim 1, wherein the optical filter is arranged at a focal position of the optically magnifying means.

13. The mask inspection apparatus according to claim 1, wherein the charged particle beam generating means, the mask and the electron lens are held in a vacuum and the fluorescent screen is used for a vacuum barrier.

14. The mask inspection apparatus according to claim 1, wherein the optically magnifying means is comprised of an optical lens.

15. The mask inspection apparatus according to claim 1, wherein the optically magnifying means is comprised of an optical fiber bundle formed thicker at a rear end than at a forward end.

16. The mask inspection apparatus according to claim 15, wherein the forward end surface of the optical fiber bundle is coated with a fluorescent substance.

17. The mask inspection apparatus according to claim 15, wherein the charged particle beam generating source, the mask, the electron lens and the fluorescent screen are held in a vacuum and the optical fiber bundle is used for a vacuum barrier.

18. A mask inspection apparatus comprising:

a charged particle beam generating source for irradiating a charged particle beam;

a shaped mask for shaping the charged particle beam to generate a shaped charged particle beam, the shaped charged particle beam being applied onto a mask formed with a pattern;

an aperture for eliminating at least a portion of a scattering beam from an electro-optic mask image, passed through the mask, with a shade corresponding to the pattern formed there; and

means for inspecting a defect in the pattern on the basis of the eliminated electro-optic mask image.