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Vapor deposition of polymer films for photolithography

  • US 5,925,494 A
  • Filed: 02/16/1996
  • Issued: 07/20/1999
  • Est. Priority Date: 02/16/1996
  • Status: Expired due to Fees
First Claim
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1. A plasma synthesized polymer film disposed on a semiconductor wafer, the film having C--C bonds, C--H bonds, and plasma synthesized O--H bonds, the film having a level of oxygen constituency that is selected to provide a ratio of O--H bond concentration to C--H bond concentration that yields substantially a prespecified concentration of reactive silylation sites in the film.

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