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Method of detecting end point of plasma processing and apparatus for the same

  • US 5,928,532 A
  • Filed: 11/03/1997
  • Issued: 07/27/1999
  • Est. Priority Date: 11/11/1996
  • Status: Expired due to Term
First Claim
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1. A method of detecting an end point of plasma processing, comprising the steps of:

  • detecting, when processing using a plasma is performed for an object to be processed, emission intensities respectively having specific wavelengths of first and second active species in a designated period and after the designated period during the plasma processing, and outputting emission detection information;

    obtaining an approximate expression A of the first active species and an approximate expression B of the second active species in a relationship between the emission intensity and time on the basis of the emission detection information;

    obtaining an affine approximate expression A'"'"' of the first active species by using the approximate expression A of the first active species and the approximate expression B of the second active species;

    obtaining a ratio (A/A'"'"') of the approximate expression A of the first active species to the affine approximate expression A'"'"' of the first active species and a derivative (d(A/A'"'"')/dt) of the ratio;

    obtaining average values and variances of the ratio (A/A'"'"') and the derivative (d(A/A'"'"')/dt) of the ratio in the designated period;

    setting a predetermined region from a predetermined value of the ratio (A/A'"'"') and a predetermined value of the derivative (d(A/A'"'"')/dt) of the ratio calculated from information of the variances in a graph in which the ratio (A/A'"'"') is plotted on an abscissa, the derivative (d(A/A'"'"')/dt) of the ratio is plotted on an ordinate, and an intersection between the average value of the ratio (A/A'"'"') and the average value of the derivative (d(A/A'"'"')/dt) of the ratio in the designated period is an origin; and

    obtaining the ratio (A/A'"'"') and the derivative (d(A/A'"'"')/dt) of the ratio by using the emission detection information of the first and second active species during the processing after the designated period, and determining an end point of the plasma processing when a position of the ratio (A/A'"'"') and the derivative (d(A/A'"'"')/dt) of the ratio thus obtained deviates from the predetermined region in the graph.

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