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Mechanical fastener to hold a polishing pad on a platen in a chemical mechanical polishing system

  • US 5,931,724 A
  • Filed: 07/11/1997
  • Issued: 08/03/1999
  • Est. Priority Date: 07/11/1997
  • Status: Expired due to Fees
First Claim
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1. A chemical mechanical polishing apparatus, comprising:

  • a pad support plate having a projection extending from a bottom surface thereof;

    a polishing pad attachable to a top surface of the pad support plate;

    a rotatable platen configured to support the pad support pad plate, the platen including an aperture to receive the projection; and

    a fastener coined to the rotatable platen, the fastener configured to engage the projection and secure the pad support plate to the platen.

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